检索结果-内蒙古大学图书馆

World Conference on Photovoltaic Energy Conversion

作者： Go Okada Katsuya Hirachi Shigeyasu Nakagawa Electric and Control System Engineering Course Maizuru National College of Technology Maizuru Kyoto Japan

ISBN: (纸本)1424400163

This study is about a new high-speed system measuring a maximum power point (MPP) of photovoltaic (PV) modules by using the microprocessor, and the short circuit, and the capacitance for the load. Perturb and observe method is well known and common; however, by using the method, it takes a few seconds to accord a power point with the MPP, and when a solar cell has partial shade, there is possibility not to track the MPP. Therefore, it causes a mismatch power loss, which is due to mismatch between an MPP and a power point. In order to solve the problems, our system measures a V-I curve (voltage-current characteristic curve) rapidly and determines the MPP. The results of the experiments show that the system measured a V-I curve in 10 ms and determined the MPP by the accuracy of 0.5% of mismatch power loss. Therefore, the system tracks an MPP in millisecond order and improves mismatch power loss

关键词： Power measurement Photovoltaic cells Circuits Solar power generation Pulse width modulation Capacitance measurement Voltage Power generation electric variables measurement control systems

来源：评论

学校读者我要写书评

暂无评论

Micro-organic light-emitting devices fabricated by room-temperature curing nanoimprint lithography using diamond molds

Micro-organic light-emitting devices fabricated by room-temp...

引用

2011 MRS Fall Meeting

作者： Ishikawa, Ippei Okuno, Taisuke Kiyohara, Shuji Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Shiroya Maizuru Kyoto 625-8511 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Department of Mechanical System Engineering University of Yamanashi 4-3-11 Takeda Kofu Yamanashi 400-8511 Japan

ISBN: (纸本)9781605113722

Organic light-emitting devices (OLEDs) have attracted a lot of attention as a next generation display. In this study, we fabricated the micro-OLEDs by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds. The diamond has superior durability and was used as mold material for RTC-NIL. The diamond molds have been fabricated by electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in the electron beam (EB) lithography technology. We fabricated the diamond mold pattern with 10 μm-square dot. The diamond molds have been used to form an insulating layer in micro-OLEDs. The optimum thickness of N,N′-Diphenyl-N,N′-di(m- tolyl)benzidine (TPD) [hole transport layer], Tris(8-quinolinolato)aluminum (Alq3) [electron transport layer] and aluminum (Al) [cathode] were 40 nm, 40 nm and 200 nm, respectively. We succeeded in formation of insulating layer in micro-OLEDs and operation of micro-OLEDs with 10 μm-square-dot by RTC-NIL using diamond molds. © 2012 Materials Research Society.

关键词： Silicones

来源：评论

学校读者我要写书评

暂无评论

Micro-organic Light-emitting Devices Fabricated by Room-temperature Curing Nanoimprint Lithography Using Diamond Molds

引用

MRS Online Proceedings Library 2011年第1期1395卷 33-38页

作者： Ippei Ishikawa Taisuke Okuno Shuji Kiyohara Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology Maizuru Kyoto Japan Application and Technical Section ELIONIX INC. Hachioji Tokyo Japan Department of Mechanical System Engineering University of Yamanashi Kofu Yamanashi Japan

Organic light-emitting devices (OLEDs) have attracted a lot of attention as a next generation display. In this study, we fabricated the micro-OLEDs by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds. The diamond has superior durability and was used as mold material for RTC-NIL. The diamond molds have been fabricated by electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in the electron beam (EB) lithography technology. We fabricated the diamond mold pattern with 10 µm-square dot. The diamond molds have been used to form an insulating layer in micro-OLEDs. The optimum thickness of N,N’-Diphenyl-N,N’-di(m-tolyl)benzidine (TPD) [hole transport layer], Tris(8-quinolinolato)aluminum (Alq3) [electron transport layer] and aluminum (Al) [cathode] were 40 nm, 40 nm and 200 nm, respectively. We succeeded in formation of insulating layer in micro-OLEDs and operation of micro-OLEDs with 10 µm-square-dot by RTC-NIL using diamond molds.

关键词： diamond optoelectronic microelectronics

来源：评论

学校读者我要写书评

暂无评论

Fabrication of diamond nanopit arrays by room-temperature curing nanoimprint lithography using glass-like carbon molds

Fabrication of diamond nanopit arrays by room-temperature cu...

引用

2011 MRS Fall Meeting

作者： Kiyohara, Shuji Ito, Chigaya Ishikawa, Ippei Takikawa, Hirofumi Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi Aichi 441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Department of Mechanical System Engineering University of Yamanashi 4-3-11 Takeda Kofu Yamanashi 400-8511 Japan

ISBN: (纸本)9781605113722

We have proposed the use of glass-like carbon (GC), as mold material because the 27-maximum etching selectivity of polysiloxane film against GC, which was approximately six times larger than that of polysiloxane film against chemical vapor deposited (CVD) diamond film. We have investigated the fabrication of diamond nanopit arrays by room-temperature curing nanoimprint lithography (RTC-NIL) using GC mold, as applications to the emitter and the micro-gear. The polysiloxane has in the state of sticky liquid at room-temperature and negative-exposure characteristic. Therefore, the polysiloxane was used as RTC-imprint resist material, and also used as electron beam (EB) resist (oxide mask) material in EB lithography. We have fabricated the cylindrical GC nanodot mold with 500 nm-diameter, 600 nm-height and 2 μm-pitch. We carried out RTC-NIL using GC mold under the following optimum conditions: time from spin-coating to imprint of 1 min, imprinting pressure of 0.5 MPa and imprinting time of 5 min. Then, we have processed the diamond film with an electron cyclotron resonance (ECR) oxygen ion shower. We have fabricated diamond nanopit array with 250 nm-depth and 500 nm-diameter. The diameter of diamond nanopit pattern was in good agreement with that of GC mold. Moreover, the depth of the diamond nanopit patterns fabricated by RTC-NIL using cylindrical GC mold was three times larger than that using conical diamond mold. © 2012 Materials Research Society.

关键词： Chemical vapor deposition

来源：评论

学校读者我要写书评

暂无评论

Diamond nanopit arrays fabricated by room-temperature nanoimprinting using diamond molds

Diamond nanopit arrays fabricated by room-temperature nanoim...

引用

2010 MRS Fall Meeting

作者： Kiyohara, Shuji Kumagai, Masaya Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Takikawa, Hirofumi Advanced Faculty of Electric and Control System Engineering Course Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Application and Technical Section ELIONIX Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Department of Mechanical System Engineering University of Yamanashi 4-3-11 Takeda Kofu Yamanashi 400-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi Aichi 441-8580 Japan

ISBN: (纸本)9781605112596

We have investigated the nanopatterning of chemical vapor deposited (CVD) diamond films in room-temperature nanoimprint lithography (RT-NIL), using a diamond nanodot mold. We have proposed the use of polysiloxane as an electron beam (EB) mask and RT-imprint resist materials. The diamond molds of cylinder dot using the RT-NIL process were fabricated with polysiloxane oxide mask in EB lithography technology. The dot in minimum diameter is 500 nm. The pitch between the dots is 2 μm, and dot has a height of about 600 nm. It was found that the optimum imprinting conditions for the RT-NIL : time from spin-coating to imprinting t1 of 1 min , pressure time t2 of 5 min, imprinting pressure P of 0.5 MPa. The imprint depth obtained after the press under their conditions was 500 nm. We carried out the RT-NIL process for the fabrication of diamond nanopit arrays, using the diamond nanodot molds that we developed. The resulting diamond nanopit arrays with 500 nm-diameter and 200 nm-depth after the electron cyclotron resonance (ECR) oxygen ion beam etching were fabricated. The diameter of diamond nanopit arrays was in good agreement with that of the diamond nanodot mold. © 2011 Materials Research Society.

关键词： Silicones

来源：评论

学校读者我要写书评

暂无评论

Fabrication of Diamond Nanopit arrays by Room-temperature Curing Nanoimprint Lithography Using Glass-like Carbon Molds

引用

MRS Online Proceedings Library 2011年第1期1395卷 27-32页

作者： Shuji Kiyohara Chigaya Ito Ippei Ishikawa Hirofumi Takikawa Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology Maizuru Kyoto Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi Aichi Japan Application and Technical Section ELIONIX INC. Hachioji Tokyo Japan Department of Mechanical System Engineering University of Yamanashi Kofu Yamanashi Japan

We have proposed the use of glass-like carbon (GC), as mold material because the 27-maximum etching selectivity of polysiloxane film against GC, which was approximately six times larger than that of polysiloxane film against chemical vapor deposited (CVD) diamond film. We have investigated the fabrication of diamond nanopit arrays by room-temperature curing nanoimprint lithography (RTC-NIL) using GC mold, as applications to the emitter and the micro-gear. The polysiloxane has in the state of sticky liquid at room-temperature and negative-exposure characteristic. Therefore, the polysiloxane was used as RTC-imprint resist material, and also used as electron beam (EB) resist (oxide mask) material in EB lithography. We have fabricated the cylindrical GC nanodot mold with 500 nm-diameter, 600 nm-height and 2 µm-pitch. We carried out RTC-NIL using GC mold under the following optimum conditions: time from spin-coating to imprint of 1 min, imprinting pressure of 0.5 MPa and imprinting time of 5 min. Then, we have processed the diamond film with an electron cyclotron resonance (ECR) oxygen ion shower. We have fabricated diamond nanopit array with 250 nm-depth and 500 nm-diameter. The diameter of diamond nanopit pattern was in good agreement with that of GC mold. Moreover, the depth of the diamond nanopit patterns fabricated by RTC-NIL using cylindrical GC mold was three times larger than that using conical diamond mold.

关键词： diamond nanostructure ion-beam processing

来源：评论

学校读者我要写书评

暂无评论

Nanofabrication of three-dimensional imprint diamond molds by ECR oxygen ion beams using polysiloxane

Nanofabrication of three-dimensional imprint diamond molds b...

引用

作者： Shuji, Kiyohara Tomoyuki, Kashiwagi Hirofumi, Takikawa Yuichi, Kurashima Yoshio, Taguchi Yoshinari, Sugiyama Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Engineering Toyohashi University of Technology Toyohashi Aichi 441-8580 Japan Department of Mechanical Systems Engineering University of Yamanashi 4-3-11 Takeda Kofu Yamanashi 400-8511 Japan Application and Technical Section ELIONIX INC 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan

We have investigated the nanofabrication of three-dimensional (3D) chemical vapor deposited (CVD) diamond molds in Electron Cyclotron Resonance (ECR) oxygen ion beam etching technologies using polysiloxane [-R2SiO-]n as an electron beam (EB) mask and a room-temperature (RT)-imprint resist material. The polysiloxane exhibited a negative-exposure characteristic and its sensitivity was 5:5 × 10 -5 C/cm2. The maximum etching selectivity of polysiloxane film against diamond film was 4.7, which was obtained under the following ECR oxygen ion etching conditions: ion energy of 400 eV, ion incidence angle of 0 ° , microwave power of 100 W, gas pressure of 1:4 × 10 -2 Pa and stage temperature of 24 ° C. The diamond molds of cone and tetragonal pyramid dots were fabricated with polysiloxane mask in EB lithography technology using the RT-nanoimprint lithography (NIL) process. The dots are 500, 600, 700, 800, 900 nm in diameter and width respectively. The pitch between the dots is 2 μm, and each dot has a height of about 1 μm. It was found that the optimum imprinting pressure and its depth obtained after the press for 5 min were 0.5 MPa and 0.5 μm respectively. The resulting diameter of each imprinted polysiloxane pattern was in good agreement with that of the 3D-diamond mold. We carried out the RT-NIL process for the fabrication of diamond nanopatterns, using the 3D-diamond molds that we developed. © 2009 The Surface Science Society of Japan.

关键词： Room temperature

来源：评论

学校读者我要写书评

暂无评论

Fabrication of micro-OLEDs by room-temperature curing nanocontact-print lithography using DLC molds

Fabrication of micro-OLEDs by room-temperature curing nanoco...

引用

2012 MRS Fall Meeting

作者： Ishikawa, Ippei Sakurai, Keisuke Kiyohara, Shuji Okuno, Taisuke Tanoue, Hideto Suda, Yoshiyuki Takikawa, Hirofumi Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

ISBN: (纸本)9781632661043

The microfabrication technologies for organic light-emitting devices (OLEDs) are essential to the fabrication of the next generation of light-emitting devices. The micro-OLEDs fabricated by room-temperature curing nanoimprint lithography (RTC-NIL) using diamond molds have been investigated. However, light emissions from 10 μm-square-dot OLEDs fabricated by the RTC-NIL method have not been uniform. Therefore, we proposed the fabrication of micro-OLEDs by room-temperature curing nanocontact-print lithography (RTC-NCL) using the diamond-like carbon (DLC) mold. The DLC molds used in RTC-NCL were fabricated by an electron cyclotron resonance (ECR) oxygen ion shower with polysiloxane oxide mask in electron beam (EB) lithography technology. The mold patterns are square and rectangle dots which has 10 μm-width, 10 μm-width and 50 μm-length, respectively. The height of the patterns is 500 nm. The DLC molds were used to form the insulating layer of polysiloxane in RTC-NCL. We carried out the RTC-NCL process using the DLC mold under the following optimum conditions: 0.1 MPa-pressure for coating DLC mold with polysiloxane film, 2.1 MPa-pressure for transferring polysiloxane from DLC mold pattern to indium tin oxide (ITO) glass substrate. We deposited N,N′-Diphenyl -N,N′-di (m-tolyl)benzidine (TPD) [40 nm-thickness] as hole transport layer / Tris(8-quinolinolato)aluminum (Alq3) [40 nm-thickness] as electron transport layer / A1 [200 nm-thickness] as cathode on ITO glass substrate as anode in this order. We succeeded in formation of the insulating layer with square and rectangle dots which has 10 μm-width, 10 μm-width and 50 μm-length, and operation of micro-OLEDs by RTC-NIL using DLC molds. © 2012 Materials Research Society.

关键词： Silicones

来源：评论

学校读者我要写书评

暂无评论

Fabrication of DLC-based micro-gear patterns by room-temperature curing nanoimprint lithography using glass-like carbon molds

Fabrication of DLC-based micro-gear patterns by room-tempera...

引用

2012 MRS Fall Meeting

作者： Kiyohara, Shuji Ikegaki, Tomu Ito, Chigaya Ishikawa, Ippei Tanoue, Hideto Takikawa, Hirofumi Taguchi, Yoshio Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Control System Engineering Course Faculty of Advanced Engineering Maizuru National College of Technology 234 Aza Shiroya Maizuru Kyoto 625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tenpaku Toyohashi Aichi 441-8580 Japan Application and Technical Section ELIONIX INC 3-7-6 Motoyokoyama Hachioji Tokyo 192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering AIST 1-2-1 Namiki Tsukuba Ibaraki 305-8564 Japan

ISBN: (纸本)9781632661043

The fabrication of diamond-like carbon (DLC) micro-gear by room temperature curing nanoimprint lithography (RTC-NIL) using glass-like carbon (GC) molds as applications to the DLC-based medical MEMS (Micro Electronic Mechanical systems) was investigated. The DLC film which has excellent properties similar to chemical vapor deposited (CVD) diamond films was used as the patterning material. We propose GC as mold material because GC has higher etching selectivity than a diamond film. The etching selectivity of polysiloxane film against a GC substrate is about 5 times as high as that of a diamond film. Therefore we fabricated the GC molds that have micro-gear patterns with 30 μm-tip diameter and 500 nm-tooth thickness. We carried out the RTC-NIL process using the GC micro-gear molds under the following optimum conditions. 1 min-time from spin-coating to imprint: t1, 0.5 MPa-imprinting pressure: P and 5 min-holding time: t2, and then the imprinted polysiloxane pattern on DLC film was processed with an electron cyclotron resonance (ECR) oxygen ion shower. However, we were not able to fabricate micro-gear patterns in high accuracy because of a remaining residual layer on the DLC film. Therefore we propose the removing process for the residual layer with trifluoromethane (CHF3) ion shower under the optimum conditions of 300 eV-ion energy and 4 min-etching time. As a result, we succeeded to fabricate concave DLC-based micro-gear patterns in high accuracy which has 30 μm-tip diameter and 1 μm-depth. © 2013 Materials Research Society.

关键词： Molds

来源：评论

学校读者我要写书评

暂无评论

Diamond Nanopit Arrays Fabricated by Room-Temperature Nanoimprinting using Diamond Molds

引用

MRS Online Proceedings Library 2011年第1期1282卷 117-122页

作者： Shuji Kiyohara Masaya Kumagai Yoshio Taguchi Yoshinari Sugiyama Yukiko Omata Yuichi Kurashima Hirofumi Takikawa Advanced Faculty of Electric and Control System Engineering Course Maizuru National College of Technology Maizuru Japan Application and Technical Section ELIONIX INC. 3-7-6 Motoyokoyama Hachioji Tokyo Japan Department of Mechanical System Engineering University of Yamanashi 4-3-11 Takeda Kofu Yamanashi Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi Aichi Japan

关键词： diamond ion-beam processing nanoscale

来源：评论

学校读者我要写书评

暂无评论

建议与咨询留下您的常用邮箱和电话号码，以便我们向您反馈解决方案和替代方法

时间限定

文献类型

馆藏选择

核心期刊

语言

文献类型

帮助

文字说明：

检索规则说明：

检索范例：

分类表

所选分类

限定检索结果

文献类型

馆藏范围

日期分布

学科分类号

主题

机构

作者

语言

请选择保存的检索档案：

请选择收藏分类：

通借通还

建议与咨询 留下您的常用邮箱和电话号码，以便我们向您反馈解决方案和替代方法

时间限定

文献类型

馆藏选择

核心期刊

语言

文献类型

帮助

文字说明：

检索规则说明：

检索范例：

分类表

所选分类

限定检索结果

文献类型

馆藏范围

日期分布

学科分类号

主题

机构

作者

语言

请选择保存的检索档案： 新增检索档案 确定 取消

请选择收藏分类： 新增自定义分类 确定 取消

通借通还

建议与咨询留下您的常用邮箱和电话号码，以便我们向您反馈解决方案和替代方法

请选择保存的检索档案：

请选择收藏分类：