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Fabrication of Diamond-Like Carbon Microgears in Roomerature Curing Nanoimprint Lithography Using Ladder-Type Hydrogen Silsesquioxane

Fabrication of Diamond-Like Carbon Microgears in Roomerature...

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作者： Kiyohara, Shuji Shimizu, Yuto Ishikawa, Ippei Harigai, Toru Takikawa, Hirofumi Watanabe, Masahiko Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Electron System Engineering Course Department of Multidisciplinary Engineering Faculty of Advanced Engineering National Institute of Technology 234 Aza Shiroya Maizuru Kyoto625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tempaku Toyohashi Aichi441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering National Institute of Advanced Industrial Science and Technology 1-2-1 Namiki Tsukuba Ibaraki305-8564 Japan

We investigated the fabrication of convex diamond-like carbon (DLC) based microgears in roomerature curing nanoimprint lithography (RTC-NIL) using the ladder-type hydrogen silsesquioxane (HSQ), as an application for the medical micro electro mechanical system (MEMS). The HSQ which is an inorganic polymer of sol-gel system turns into a gel when exposed to air and has the siloxane bond. Therefore, the HSQ was used as RT-imprinting material, and also used as an oxide mask material in electron cyclotron resonance (ECR) oxygen (O2) ion shower etching. We fabricated the polydimethylsiloxane (PDMS) mold with concave microgear patterns which has 40, 50 and 60 μm-tip diameter and 300 nm-depth. We carried out the RTC-NIL process using the PDMS mold under the following optimum conditions of 0.10 MPa-imprinting pressure and 1.0 min-imprinting time. We found that the residual layer of imprinted HSQ microgear patterns was removed with ECR trifluoromethane (CHF3) ion shower under the following conditions of 300 eV-ion energy and 2.0 min-etching time, and then microgears of the HSQ on the DLC film were etched with ECR O2 ion shower under the following conditions of 400 eV-ion energy and 10 min-etching time. As a result, the convex DLC based microgears which have 40, 50 and 60 μm-tip diameter and 400 nm-height were fabricated with high accuracy in the new fabrication process of RTC-NIL. © 2016 Materials Research Society.

关键词： Silicones

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Fabrication of Diamond-Like Carbon Emitter Patterns by Roomerature Curing Nanoimprint Lithography with PDMS Molds Using Polysiloxane

Fabrication of Diamond-Like Carbon Emitter Patterns by Roome...

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作者： Kiyohara, Shuji Yoshida, Shogo Ishikawa, Ippei Harigai, Toru Takikawa, Hirofumi Watanabe, Masahiko Sugiyama, Yoshinari Omata, Yukiko Kurashima, Yuichi Electric and Electron System Engineering Course Department of Multidisciplinary Engineering Faculty of Advanced Engineering National Institute of Technology 234 Aza Shiroya Maizuru Kyoto625-8511 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology 1-1 Hibarigaoka Tempaku Toyohashi Aichi441-8580 Japan Application and Technical Section Elionix Inc. 3-7-6 Motoyokoyama Hachioji Tokyo192-0063 Japan Research Center for Ubiquitous MEMS and Micro Engineering National Institute of Advanced Industrial Science and Technology 1-2-1 Namiki Tsukuba Ibaraki305-8564 Japan

We investigated the fabrication of diamond-like carbon (DLC) emitter patterns by roomerature curing nanoimprint lithography (RTC-NIL) with polydimethylsiloxane (PDMS) molds using polysiloxane, as an application to the emitter for the next generation flat panel display. The DLC which has excellent properties similar to diamond properties was used as a pattern material. A PDMS was used as a mold material and fabricated by the following optimum conditions of the first curing time at RT for 36 h and the second curing time at the temperature of 150 °C for 15 mins. The polysiloxane is in the state of sticky liquid at RT and stable in air. Therefore, the polysiloxane was used the electron beam (EB) resist and oxide mask material in EB lithography, and also used as RT-imprint material. First, we fabricated the PDMS mold with pit array. Each dot is 5 Âm-diameter and 400 nm-depth. We carried out the RTC-NIL process with PDMS molds using polysiloxane under the following optimum imprint conditions of 0.5 MPa-imprinting pressure, 1.5 min-the time between spin-coat and imprint, and 5 min-imprinting time. Next, the residual layer of imprinted polysiloxane pattern was 450 nm and then was removed with electron cyclotron resonance (ECR) trifluoromethane (CHF3) ion shower under the conditions of 300 eV-ion energy and 3 min-etching time. Then, we processed the imprinted polysiloxane patterns on the DLC film with an ECR oxygen (O2) ion shower under the conditions of 400 eV-ion energy and 12 min-etching time. As a result, we succeeded in fabricating convex DLC emitter patterns with high accuracy which has 5 m-diameter and 500 nm-height. © 2016 Materials Research Society.

关键词： Silicones

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