检索结果-内蒙古大学图书馆

A solid-phase epitaxy with clean surface formation using SiH4 and evaluation of SOI layer

ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS 1996年第12期79卷 71-78页

作者： Kodama, M Funabashi, H Mitsushima, Y Taga, Y Toyota Central R&D Laboratories Inc. Nagakute Aichi-ken Japan 480-11 Received his B.S. and M.S. degrees in electronics from Gifu University in 1985 and 1987 respectively. He joined Toyota Central R&D Laboratories in 1987 and has been working in the field of LST process technology. Received his B.S. degree in electrical engineering from Nagoya Institute of Technology in 1982. He joined Toyota Central R&D Laboratories in 1982 and has been working in the field of sensor technology. Received his B.S. and Ph.D. degrees in nuclear engineering from Nagoya University in 1975 and 1980 respectively. He joined Sanyo Electric Co. in 1980 and in 1991 he transferred to Toyota Central R&D Laboratories where he has been engaged in research on LSI process technology. Received his B.S. and M.S. degrees in measurement engineering from Nagoya Institute of Technology in 1968 and 1970 respectively. In 1970 he joined Toyota Central R&D Laboratories where he has been engaged in research on the surface interface physics and development of thin film material. He is presently a principal research fellow at the Toyota Central R&D Laboratories.

We investigated a method of solid-phase epitaxy (SPE) using low-vacuum, low-pressure chemical vapor deposition (LPCVD) equipment without the load lock chamber that is usually used for the Si LSI process. This is a new method of clean surface formation in which the Si substrate is heated after seed formation in an atmosphere of SiH4 gas. Using this method, an L-SPE length of 4 mu m was obtained. The reason for the success of this method appears to be that the seed surface cleaned by HF dipping is preserved by the SiH4 gas. To evaluate the quality of the silicon-on-insulator (SOI) layer formed by this method, a MOSFET and a PN diode were experimentally produced. The MOSFET exhibited normal transistor action, which confirmed that the SOI layer had satisfactory quality without any problem in manufacturing the MOSFET. However, it was found that the n value of the forward direction current characteristic of the PN diode was 1.156 and that the SOI layer had more recombination centers than the Si substrate (n = 1.050). (C) 1997 Scripta Technica, Inc.

关键词： SOI MOSFET LPCVD SPE

来源：评论

学校读者我要写书评

暂无评论

A device simulation of the BBT effect in flash memory cells and implications for the development of high-reliability memory cells

引用

ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS 1996年第11期79卷 51-57页

作者： Hayashi, T Fukuda, K Ohno, M Nishi, K Kita, A VLSI R&D Center OKI Electric Industry Company Ltd. Hachioji-shi Japan 193 Graduated from the Science University of Tokyo Dept. of Applied Physics in 1986 and joined Oki Electric. Since then he has been engaged in research on the reliability of MOS transistors and silicon oxide films. Since 1994 he has been engaged in the development of flash memory. He is a member of the Applied Physics Society. Graduated from the University of Tokyo Dept. of Applied Physics in 1983 and joined Oki Electric in 1985. Since then he has been engaged in research on the semiconductor process and device simulation. In 1990 he participated in joint research at the Technical University of Aachen. He is a member of the Applied Physics Society. Graduated from the Tokyo University of Agriculture and Technology Dept. of Electrical Engineering in 1980 and completed an MS course in 1983. In 1986 he completed the doctoral course at Shizuoka University. He then joined Oki Electric where he has been engaged in research on ULSI processes. He is now a manager responsible for flash memory at the VLSI R&D Center. He holds a doctorate in engineering. He is a member of the Applied Physics Society. Graduated from the University of Tokyo Dept. of Applied Physics in 1973 and joined Oki Electric. He was engaged in the development of integrated circuit logic simulation technology and bipolar process technology and since 1980 he has been engaged in research on process/device simulation and modeling. Presently he is a senior manager at the VLSI R&D Center. In 1982–1984 he was a Visiting Scholar at MIT. He holds a doctorate in engineering. He is a member of the Applied Physics Society and a senior member of IEEE. Graduated from Tokyo Institute of Technology Dept. of Chemical Engineering in 1978 and completed the MS program in 1930. In that year he joined Oki Electric. Since then he has been engaged in CMOS process design for DRAM and flash memory. He is now a manager at the VLSI R&D Center. He is a member of the Applied Physics Society.

In order to analyze the BBT (band-to-band tunneling) phenomenon in flash memory cells by simulation, a new model is proposed, which improves on the BBT model by introducing the concept of ''average electric field.'' This model agrees well with the measured results in a wide drain N-concentration range. Using this model, the reliability of memory cells is analyzed. It is found that the difference of the amount of BBT generation does not directly affect the endurance characteristics but does affect the disturb characteristics. The same model can be used to analyze problem points of the present cells and to estimate the BBT current of next-generation devices accurately.

关键词： band-to-band tunneling flash memory simulation endurance characteristics

来源：评论

学校读者我要写书评

暂无评论

A data acquisition system for machine tool condition monitoring .2. Some of the signals acquired

引用

QUALITY AND RELIABILITY engineering INTERNATIONAL 1996年第1期12卷 19-26页

作者： Drake, PR Jennings, AD Grosvenor, RI Systems Engineering Division Cardiff School of Engineering University of Wales Cardiff PO Box 917 Newport Road Cardiff CF2 1XH U.K. Paul Drake:has a B.Sc. in Statistics an M.Sc. in Systems Engineering and a Ph.D. in Fault Diagnosis from the University of Wales. He gained several years experience of developing information systems while working in industry. At present he is a lecturer in Systems Engineering at the Cardiff School of Engineering within the University of Wales Cardiff. He is an active researcher in the field of machine condition monitoring and fault diagnosis in collaboration with industrial partners. He is also involved in the application of artificial intelligence techniques within manufacturing. He is a Chartered Engineer and a member of the Institution of Electrical Engineers. July 1994 saw the publication of a book entitledCondition Based Maintenance and Machine Diagnosticsof which he was co-author. Alun Jennings:has a B.Sc. in mechanical engineering from Portsmouth Polytechnic and an M.Sc. from Manchester University. He is a chartered mechanical engineer with experience in fault diagnosis and product development. Currently he is employed as a research associate at Laser Zentrum Hannover. Roger Grosvenor:is an IT lecturer in Systems Engineering at the Cardiff School of Engineering within the University of Wales Cardiff. His teaching covers reliability engineering instrumentation and measurement and digital control. His main research interests are in-process measurement on machine tools and condition monitoring of machine tools. Prior to his ten years at UWCC he was a development engineer in the heating and ventilation industry. He holds a B. Eng. in mechanical engineering and an M. Eng. both from the University of Wales and is a member of the Institute of Measurement and Control.

This paper presents some of the machine tool condition monitoring signals logged by the data acquisition system (DAS) designed and implemented as part of the European Union research project BREU-CT91-0463. Cause and effect relationships between machine components and signal features are highlighted, along with a demonstration of the suitability of vibration signal kurtosis as a measure of machine tool spindle bearing condition.

关键词： condition monitoring machine tools

来源：评论

学校读者我要写书评

暂无评论

Measuring system for diffusion length of photoactive compound in post-exposure bake process

引用

ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS 1996年第9期79卷 70-77页

作者： Sekiguchi, A Sensu, Y Matsuzawa, T Minami, Y Lithotech Japan Corporation Kawaguchi Japan 332 Received his B.S. degree from Shibaura Institute of Technology in 1982 and joined Japan Chemitech in 1983 where he worked on the development of an electroless Au plating. He joined Sumitomo GCA in 1985 where he was engaged in the development of photoresist application systems and the development of analysis system for photoresist processing. He is currently with Lithotech Japan Corporation. He is a member of the Japan Society of Applied Physics. Graduated from the Aircraft Maintenance Division of Nakanihon Aeronautics in 1985 and joined Sumisho Electronic Systems Inc. the same year. Following the merger of Sumisho Electronic Systems with Sumitomo G.C.A. in 1986 he was transferred to the latter where he worked on the development of an automatic end-point detector as well as analysis systems for development processes and a resist profile simulator. Mr. Sensu has been with Lithotech Japan Corporation since 1993. Received his M.S. degree in Chemical Engineering from Tohoku University in 1975 and joined Central Research Laboratory of Hitachi Ltd. the same year. He received his Ph.D. degree in 1985 from Tohoku University. He was engaged in the development of advanced photolithography processes and simulation technologies. In 1988 he resigned from Hitachi to found Technofront Inc. and then Lithotech Japan Corporation in 1993. Dr. Matsuzawa is a member of the Japan Chemical Society the Japan Society of Applied Physics and IEEE. Received his B.S. degree from Tokyo Denki University in 1979 and then joined Process System Co. There he was involved in field service for GCA Co. USA. He joined Sumitomo GCA Co. in 1983 where he was engaged in the development of photoresist coating and development systems and systems to detect the end-point of photoresist development. He also developed a photoresist development analysis system. He is currently the company executive Lithotech Japan Corporation.

The post-exposure bake (FEB) characteristics of a photoresist can be examined with a method that estimates the diffusion length of a photoactive compound (PAC) in the photoresist FEB process. Diffusion lengths are estimated with development rate measurement equipment using FEB conditions at temperatures of 50 degrees C, 100 degrees C, 110 degrees C, and 120 degrees C. An ultrahigh-resolution i-line photoresist THMR-iP3000 is used in the research. The obtained values are input into 61 photolithography simulator PROLITH/2 to calculate photoresist profiles. Using a 365-nm wavelength, 0.5 NA, and 0.6-coherence factor conditions, resist profiles for a 0.4-mu m line space feature are calculated with varied focus. The simulated results are compared with SEM observations to evaluate the validity of the estimation method;they are found to be substantially consistent with experimental results, thus confirming the validity of the method.

关键词： photoresist development rate diffusion length development parameter focus latitude profile simulation

来源：评论

学校读者我要写书评

暂无评论

Abstracts of papers presented at the 14th conference of the Weed Science Society of Israel Abstracts of papers presented at the international conference on controlled atmosphere and fumigation (CAF) in stored products Abstracts of papers presented at the joint international conference of FAOPMA — CEPA on pest control in the 21st century Abstracts of papers presented at the 2nd international Agro-Ecology Symposium on integrated pest management: from the drawing board to the market

引用

Phytoparasitica 1996年第3期24卷 199-265页

作者： E. Yogev M. Berson Y. Benyamini Y. Sheinboim T. Lev-Ran A. Bahat Y. Barkai Y. Gatti M. Zaidan O. Barazani Y. Boshvize S. Graph U. Luchinsky T. Blumenfeld Y. Kleifeld G. Herzlinger H. Bucsbaum S. Golan T. Chilf R. Aly Y. Ohali A. Ovadia Y. Chachlon H. Yovel Y. Tesler G. Colodney A. Nir S. Zarka A. Tal B. Rubin T. Yaacoby Y. Alon Y. Kedar Orit Ben-Zvi Assaraf O. Shainberg H. D. Rabinowitch E. Tel-Or Y. Goldwasser D. M. Joel D. Plakhine V. Portnoy G. Tzuri N. Katzir Dalia Losner-Goshen A. M. Mayer R. Jacobsohn Z. Tanaami H. Eisenberg Ziva Amsellem Z. Kernyi L. Hornok J. Gressel Adiva Shomer-Ilan Ela Nir Daphna Michaeli V. Kampel A. Warshawsky M. Yogev M. Negbi J. Hershenhorn Y. Lavan T. Hilf M. Horowitz M. Cohen I. Hirsch A. Veneziani S. T. Conyers C. H. Bell Ana C. Sá-Fischer C. S. Adler Ch. Reichmuth P. W. Flinn D. W. Hagstrum G. N. Mbata R. G. Winks Elisabeth A. Hyne M. Q. Chaudhry A. D. MacNicoll N. R. Price M. Schöller J. -F. Dugast R. Plarre S. Navarro E. J. Donahaye R. Diaz Miriam Rindner A. Azrieli P. Trematerra F. Fontana M. Mancini Ailsa D. Hocking Marta H. Taniwaki J. Lacey A. Hamer N. Magan N. Paster F. M. Caliboso D. G. Alvindia G. C. Sabio M. T. dela Cruz Okky Setyawati Dharmaputra A. S. R. Putri M. Sidik Eleni Papademetriou A. Varnava C. Mouskos M. A. Malek B. Parveen K. A. Dzisi W. O. Ellis Ana Maria Estevez Ljubica Galletti T. Fichet E. Oteiza L. A. Lizana M. X. Gonzalez B. Yakobson Y. Slavezky H. Ephrati El-H. Bartaly R. K. Kashyap M. Gupta W. L. Kashyap B. S. Dahiya A. K. Dash J. R. Rangaswamy R. D. Shroff D. S. Jayas W. E. Muir N. D. G. White L Gaye Weller J. E. van S. Graver Wu-Kang Peng M. Bengston E. Alip C. Reed J. G. Leesch G. F. Knapp G. F. Russell L. B. Llewellin Ch. Ulrichs H. J. Banks P. C. Annis R. Allanson R. Tauscher K. Westphal S. Mohan M. Gopalan P. C. Sumdarababu V. V. Sree Narayanan Sabine Prozell G. Ziegleder B. Schartmann R. Matissek J. Kraus D. Gerard S. Rogg W. Raemann R. F. Ryan Ya-Nan Wang R. T. Noyes P. Kenkel J. T. Criswell G. W. Cuperus C. J. Waterford C. P. Whittle L. Be Luxembourg Chemicals and Agriculture Ltd. Tel Aviv Israel Agrochemicals Dept. Milchan Bros. Ltd. Ramat Gan Israel Extension Service Ministry of Agriculture Zefat Mevo Hamma Ramat HaGolan Israel Dept. of Weed Science ARO Newe Ya’ar Research Center Haifa Israel Agrochemicals Department Milchan Bros. Ltd. Ramat Gan Israel Tarsis-Agrichem Tel Aviv Israel Weed Control Co. Ltd. Bet Dagan Israel Dept. of Field Crops Vegetables and Genetics The Hebrew University of Jerusalem Faculty of Agriculture Rehovot Israel Plant Protection and Inspection Services Ministry of Agriculture Bet Dagan 50250 Agan Chemical Manufacturers Ltd. Ashdod Israel Dept. of Field Crops Vegetables and Genetics Rehovot Dept. of Agricultural Botany The Hebrew University of Jerusalem Faculty of Agriculture Rehovot Israel Dept. of Weed Science ARO Newe Ya’ar Research Center Haifa Dept. of Botany The Hebrew University of Jerusalem Jerusalem Israel Dept. of Vegetable Crops ARO The Volcani Center Bet Dagan Israel Dept. of Plant Genetics Weizmann Institute of Science Rehovot Israel Inst. for Plant Science Agricultural Biotechnology Center Gödöllö Hungary Dept. of Botany Tel-Aviv University Tel Aviv Israel Dept. of Plant Genetics The Weizmann Institute of Science Rehovot Israel Dept. of Organic Chemistry The Weizmann Institute of Science Rehovot Israel Dept. of Ornamental Horticulture ARO The Volcani Center Bet Dagan Israel Weed Control Co. Ltd. Bet Dagan Chem-Nir Ltd. Kefar Shemaryahu Tiveon-Chem Co. Haifa Israel Central Science Laboratory Ministry of Agriculture Fisheries and Food Slough Berks UK Federal Biological Research Centre for Agriculture and Forestry Inst. for Stored Product Protection Berlin Germany USDA-ARS Grain Marketing and Production Research Center Manhattan USA School of Biological Sciences Abia State University Uturu Nigeria CSIRO Division of Entomology SCMC Nambour CSIRO Division of Entomology Canberra Australia DowElanco Europe Letcombe Laboratory L

来源：评论

学校读者我要写书评

暂无评论

A DATA-ACQUISITION SYSTEM FOR MACHINE-TOOL CONDITION MONITORING

引用

QUALITY AND RELIABILITY engineering INTERNATIONAL 1995年第1期11卷 15-26页

作者： DRAKE, PR JENNINGS, AD GROSVENOR, RI WHITTLETON, D Systems Engineering Division School of Engineering University of Wales College of Cardiff (UWCC) PO Box 917 Newport Road Cardiff CF2 1XH U.K. Paul Drake:has a B.Sc. in Statistics an M.Sc. in Systems Engineering and a Ph.D. in Fault Diagnosis from the University of Wales. He gained several years experience of developing information systems while working in industry. At present he is a lecturer in Systems Engineering at the Cardiff School of Engineering within the University of Wales College of Cardiff. He is an active researcher in the field of machine condition monitoring and fault diagnosis in collaboration with industrial partners. He is also involved in the application of artificial intelligence techniques within manufacturing. He is a Chartered Engineer and a member of the Institution of Electrical Engineers. July 1994 saw the publication of a book entitledCondition Based Maintenance and Machine Diagnosticsof which he was a co-author. Alun Jennings:has a B.Sc. in mechanical engineering from Portsmouth Polytechnic and an M.Sc. from Manchester University. He is a chartered mechanical engineer with experience in fault diagnosis and product development. Currently he is employed as a research associate at UWCC on the MIRAM project. Roger Grosvenor:is an IT lecturer is Systems Engineering at the Cardiff School of Engineering within the University of Wales College of Cardiff. His teaching covers reliability engineering instrumentation and measurement and digital control. His main research interests are in-process measurement on machine tools and condition monitoring of machine tools. Prior to his ten years at UWCC he was a development engineer in the heating and ventilation industry. He holds a B. Eng. in mechanical engineering and an M. Eng. both from the University of Wales and is a member of the Institute of Measurement and Control. He is currently a principal investigator on two European research grants in the field of condition monitoring and maintenance of machine tools. David Whittleton:is a pract

A flexible, generically applicable and inexpensive data acquisition system (DAS), for machine tool condition monitoring, has been designed, constructed and installed as part of a European Union sponsored project. The DAS is more than just a data logger and an array of sensors. It also consists of a methodology for analysing data logging requirements and a relational database that supports this methodology. The database is held on a central 'maintenance management' computer. The monitoring to be carried out by the DAS is specified through this database, which contains detailed information about the DAS's facilities. This feature makes it simple to reconfigure the DAS to implement new monitoring requirements and to customize its operation to meet the the needs of different machines. The information in the database is transformed into a look-up table that is read by the software that sets up and controls the data logging processes.

关键词： CONDITION MONITORING DATA ACQUISITION MACHINE TOOLS

来源：评论

学校读者我要写书评

暂无评论

GROWTH AND PRODUCTION OF RIFAMYCIN OXIDASE BY CURVULARIA-LUNATA

引用

FOLIA MICROBIOLOGICA 1994年第1期39卷 49-52页

作者： BANERJEE, UC Biochemical Engineering Research and Process Development Centre Institute of Microbial Technology Chandigarh India

Curvularia lunata could neither grow nor produce rifamycin oxidase in synthetic media without peptone and yeast extract. Mycelia grown on complex media were tested for the ability to produce rifamycin oxidase in synthetic media. The optimum concentrations of peptone and past extract were in the range of 75-10 g/L. Five percent inoculum size was found to be optimum for good growth and enzyme production. Addition of metal ions to the cultivation medium increased the enzyme activity.

关键词：

来源：评论

学校读者我要写书评

暂无评论

EFFECT OF STIRRER SPEED, AERATION RATE AND CELL MASS CONCENTRATION ON VOLUMETRIC OXYGEN-TRANSFER COEFFICIENTS (KLA) IN THE CULTIVATION OF CURVULARIA-LUNATA IN A BATCH REACTOR

引用

BIOTECHNOLOGY TECHNIQUES 1993年第10期7卷 733-738页

作者： BANERJEE, UC Biochemical Engineering Research and Process Development Centre Institute of Microbial Technology Chandigarh India

Curvularia lunata was grown in a stirred and aerated reactor for the production of extracellular rifamycin oxidase. Volumetric oxygen transfer coefficients (K(L)a) were measured for various stirrer speeds, rates of aeration and cell mass concentrations in the reactor. Stirrer speed and aeration rate were optimized and it was found that stirrer speeds of 400-500 rpm and aeration rates of 0.75-1 vvm were optimum for the maximum amount of enzyme production. It was noticed that the increase in cell mass decreased the oxygen transfer coefficient. It was also noticed that the organism formed pellets rather than mycelia when grown on glucose and with an increase in the concentration of glucose in the reactor, there was heavy pellet formation.

关键词：

来源：评论

学校读者我要写书评

暂无评论

TRANSFORMATION OF RIFAMYCIN-B WITH IMMOBILIZED RIFAMYCIN OXIDASE OF CURVULARIA-LUNATA

引用

BIOTECHNOLOGY TECHNIQUES 1993年第5期7卷 339-345页

作者： BANERJEE, UC Biochemical Engineering Research and Process Development Centre Institute of Microbial Technology Chandigarh India

Rifamycin oxidase of Curvularia lunata was immobilized on polyacrylamide gel. The optimum pH and temperature for immobilized enzyme reaction were 6.5 and 50-degrees-C, respectively. Enzyme stability increased on immobilization and the half lives of immobilized enzyme preparations at 30 and 40-degrees-C were 30 and 11.5 d, respectively. With 2.5 mm beads diffusional resistances were observed. Reusability studies showed that 1 mm size beads gave a higher rate of transformation in comparison with 2 or 2.5 mm beads.

关键词：

来源：评论

学校读者我要写书评

暂无评论

EVALUATION OF DIFFERENT BIO-KINETIC PARAMETERS OF CURVULARIA-LUNATA AT DIFFERENT ENVIRONMENTAL-CONDITIONS

引用

BIOTECHNOLOGY TECHNIQUES 1993年第9期7卷 635-638页

作者： BANERJEE, UC Biochemical Engineering Research and Process Development Centre Institute of Microbial Technology Chandigarh India

Growth kinetic parameters for Curvularia lunata were determined in yeast extract, peptone and dextrose medium under different environmental conditions. The values of specific growth rate (mu) were found to be different at different cultivation ( pH and temperature) conditions. At the optimum growth conditions (pH 7.0 and temperature 28-degrees-C) the values of specific growth rate and maintenance coefficient for C. lunata were maximum (0.19 h-1) and minimum (0.04 h-1) respectively, whereas the growth yield coefficient (Y(EG)) decreased with the increase of cultivation temperature. The values of saturation constant (K(S)) did not change appreciably with the change of cultivation conditions.

关键词：

来源：评论

学校读者我要写书评

暂无评论

建议与咨询留下您的常用邮箱和电话号码，以便我们向您反馈解决方案和替代方法

时间限定

文献类型

馆藏选择

核心期刊

语言

文献类型

帮助

文字说明：

检索规则说明：

检索范例：

分类表

所选分类

限定检索结果

文献类型

馆藏范围

日期分布

学科分类号

主题

机构

作者

语言

请选择保存的检索档案：

请选择收藏分类：

通借通还

建议与咨询 留下您的常用邮箱和电话号码，以便我们向您反馈解决方案和替代方法

时间限定

文献类型

馆藏选择

核心期刊

语言

文献类型

帮助

文字说明：

检索规则说明：

检索范例：

分类表

所选分类

限定检索结果

文献类型

馆藏范围

日期分布

学科分类号

主题

机构

作者

语言

请选择保存的检索档案： 新增检索档案 确定 取消

请选择收藏分类： 新增自定义分类 确定 取消

通借通还

建议与咨询留下您的常用邮箱和电话号码，以便我们向您反馈解决方案和替代方法

请选择保存的检索档案：

请选择收藏分类：