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检索条件"机构=Integrated Circuit Advanced Process Research and Development Center"
10 条 记 录,以下是1-10 订阅
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Correcting on-chip distortion of control pulses with silicon spin qubits
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Chinese Physics B 2025年 第1期34卷 265-271页
作者: Ming Ni Rong-Long Ma Zhen-Zhen Kong Ning Chu Wei-Zhu Liao Sheng-Kai Zhu Chu Wang Gang Luo Di Liu Gang Cao Gui-Lei Wang Hai-Ou Li Guo-Ping Guo CAS Key Laboratory of Quantum Information University of Science and Technology of China(USTC)Hefei 230026China CAS Center for Excellence in Quantum Information and Quantum Physics University of Science and Technology of ChinaHefei 230026China Integrated Circuit Advanced Process Research and Development Center Institute of MicroelectronicsChinese Academy of Sciences(CAS)Beijing 100029China Hefei National Laboratory Hefei 230088China Beijing Superstring Academy of Memory Technology Beijing 100176China Origin Quantum Computing Company Limited Hefei 230026China
In semiconductor quantum dot systems,pulse distortion is a significant source of coherent errors,which impedes qubit characterization and ***,we demonstrate two calibration methods using a two-qubit system as the dete... 详细信息
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A New Thin Film Growth/Regrowth process Design and Experimental Comparisons with Molecular Dynamic Analyses
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MRS Online Proceedings Library 1992年 第1期283卷 615-620页
作者: Takako K. Okada Shigeru Kambayashi Moto Yabuki Yoshitaka Tsunashima Yuichi Mikata Shinji Onga ULSI Research Center Toshiba Corporation Kawasaki Japan Integrated Circuit Advanced Process Engineering Department Toshiba Corporation Japan
A new concept of thin film growth/regrowth process design taking atomic motions into account using molecular dynamics is proposed. In the system, a modified many-body Tersoff-type interatomic potential for silicon has...
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Malus-metasurface-assisted polarization multiplexing
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Light(Science & Applications) 2020年 第1期9卷 1038-1046页
作者: Liangui Deng Juan Deng Zhiqiang Guan Jin Tao Yang Chen Yan Yang Daxiao Zhang Jibo Tang Zhongyang Li Zile Li Shaohua Yu Guoxing Zheng Hongxing Xu Cheng-Wei Qiu Shuang Zhang Electronic Information School Wuhan University430072 WuhanChina NOEIC State Key Laboratory of Optical Communication Technologies and NetworksWuhan Research Institute of Posts&Telecommunications430074 WuhanChina School of Physics and Technology Wuhan University430072 WuhanChina Department of Electrical and Computer Engineering National University of Singapore4 Engineering Drive 3Singapore 117583Singapore Integrated Circuit Advanced Process Center Institute of MicroelectronicsChinese Academy of Sciences100029 BeijingChina School of Physics&Astronomy University of BirminghamBirmingham B152TTUK
Polarization optics plays a pivotal role in diffractive,refractive,and emerging flat optics,and has been widely employed in contemporary optical industries and daily *** polarization manipulation leads to robust contr... 详细信息
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Reconfigurable continuous-zoom metalens in visible band
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Chinese Optics Letters 2019年 第11期17卷 69-74页
作者: Yuan Cui Guoxing Zheng Ming Chen Yilun Zhang Yan Yang Jin Tao Taotao He Zile Li Electronic Information School Wuhan UniversityWuhan 430072China NOEIC State Key Laboratory of Optical Comm unication Technologies and NetworksWuhan Research Institute of Posts and TelecommunicationsWuhan 430074China Photonics Research Centre Guilin University of Electronic TechnologyGuilin 541004China Integrated Circuit Advanced Process Center Institute of Microelectronics of Chinese Academy of SciencesBeijing 100029China
The design of a conventional zoom lens is always challenging because it requires not only sophisticated optical design strategy, but also complex and precise mechanical structures for system adjustment. Here, we propo... 详细信息
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Recent progress on submicron electron beam lithography
Recent progress on submicron electron beam lithography
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Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V 1986
作者: Takigawa, Tadahiro Shimazaki, Kuniya Kusui, Naoki VLSI Research Center Toshiba R and D Center Toshiba Corporation 1 Komukai Toshibacho Saiwai-ku Kawasaki-city210 Japan Mask Engineering Section Integrated Circuit Advanced Process Engineering Deaprtment Toshiba Corporation 1 Komukai Toshibacho Saiwai-ku Kawasaki-city210 Japan Electron Machine Department Advanced Machine and Equipment Division Toshiba Machine Co. Ltd. 2068-3 Ooka Numazu-city Shizuoka-ken410 Japan
In order to fabricate submicron pattern, total electron beam (EB) lithography system has been developed. Upper submicron pattern will be realized by optical lithography, which requires reticle with high accuracy. An E... 详细信息
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Undoped Strained Ge Quantum Well with Ultrahigh Mobility Grown by Reduce Pressure Chemical Vapor Deposition
arXiv
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arXiv 2022年
作者: Kong, Zhenzhen Li, Zonghu Cao, Gang Su, Jiale Zhang, Yiwen Liu, Jinbiao Liu, Jingxiong Ren, Yuhui Wei, Laiming Guo, Guoping Wu, Yuanyuan Radamson, Henry H. Li, Junfeng Wu, Zhenhua Li, Haiou Yang, Jiecheng Zhao, Chao Wang, Guilei Integrated Circuit Advanced Process R&D Center Institute of Microelectronics Chinese Academy of Sciences Beijing100029 China School of Integrated Circuits University of Chinese Academy of Sciences Beijing100049 China CAS Key Laboratory of Quantum Information University of Science and Technology of China Hefei230026 China Hefei National Laboratory Hefei230088 China School of Advanced Manufacturing Engineering Hefei University Hefei230601 China Origin Quantum Computing Company Limited Hefei230026 China Research and Development Center of Optoelectronic Hybrid IC Guangdong Greater Bay Area Institute of Integrated Circuit and System Guangzhou510535 China Beijing Superstring Academy of Memory Technology 100176 China
We fabricate an undoped Ge quantum well under a 30 nm relaxed Ge0.8Si0.2 shallow barrier. The bottom barrier contains Ge0.8Si0.2 (650 ℃) followed by Ge0.9Si0.1 (800 ℃) such that variation of Ge content forms a sharp... 详细信息
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Reconfigurable continuous-zoom metalens in visible
arXiv
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arXiv 2019年
作者: Cui, Yuan Zheng, Guoxing Chen, Ming Zhang, Yilun Yang, Yan Tao, Jin He, Taotao Li, Zile Electronic Information School Wuhan University Wuhan430072 China NOEIC State Key Laboratory of Optical Communication Technologies and Networks Wuhan Research Institute of Posts and Telecommunications Wuhan430074 China Photonics Research Centre Guilin University of Electronic Technology Guilin541004 China Integrated Circuit Advanced Process Center Institute of Microelectronics of Chinese Academy of Sciences Beijing100029 China
Design of a conventional zoom lens is always challengeable because it requires not only sophisticated optical design strategy, but also complex and precise mechanical structures for lens adjustment. In this paper, we ... 详细信息
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A novel strategy for GaN-on-diamond device with a high thermal boundary conductance
arXiv
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arXiv 2021年
作者: Mu, Fengwen Xu, Bin Wang, Xinhua Gao, Runhua Huang, Sen Wei, Ke Takeuchi, Kai Chen, Xiaojuan Yin, Haibo Wang, Dahai Yu, Jiahan Suga, Tadatomo Shiomi, Junichiro Liu, Xinyu High-Frequency High-Voltage Device and Integrated Circuits RandD Center Institute of Microelectronics Chinese Academy of Sciences Beijing100029 China Department of Mechanical Engineering The University of Tokyo Tokyo Bunkyo113-8656 Japan University of Chinese Academy of Sciences Beijing100049 China Key Laboratory of Microelectronic Devices and Integrated Technology Institute of Microelectronics Chinese Academy of Sciences Beijing100029 China Collaborative Research Center Meisei University Tokyo Hino-shi191-8506 Japan Integrated Circuit Advanced Process RandD Center Institute of Microelectronics of Chinese Academy of Sciences Beijing100029 China
To achieve high device performance and high reliability for the gallium nitride (GaN)-based high electron mobility transistors (HEMTs), efficient heat dissipation is important but remains challenging. Enormous efforts... 详细信息
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A device simulation of the BBT effect in flash memory cells and implications for the development of high-reliability memory cells
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ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS 1996年 第11期79卷 51-57页
作者: Hayashi, T Fukuda, K Ohno, M Nishi, K Kita, A VLSI R&D Center OKI Electric Industry Company Ltd. Hachioji-shi Japan 193 Graduated from the Science University of Tokyo Dept. of Applied Physics in 1986 and joined Oki Electric. Since then he has been engaged in research on the reliability of MOS transistors and silicon oxide films. Since 1994 he has been engaged in the development of flash memory. He is a member of the Applied Physics Society. Graduated from the University of Tokyo Dept. of Applied Physics in 1983 and joined Oki Electric in 1985. Since then he has been engaged in research on the semiconductor process and device simulation. In 1990 he participated in joint research at the Technical University of Aachen. He is a member of the Applied Physics Society. Graduated from the Tokyo University of Agriculture and Technology Dept. of Electrical Engineering in 1980 and completed an MS course in 1983. In 1986 he completed the doctoral course at Shizuoka University. He then joined Oki Electric where he has been engaged in research on ULSI processes. He is now a manager responsible for flash memory at the VLSI R&D Center. He holds a doctorate in engineering. He is a member of the Applied Physics Society. Graduated from the University of Tokyo Dept. of Applied Physics in 1973 and joined Oki Electric. He was engaged in the development of integrated circuit logic simulation technology and bipolar process technology and since 1980 he has been engaged in research on process/device simulation and modeling. Presently he is a senior manager at the VLSI R&D Center. In 1982–1984 he was a Visiting Scholar at MIT. He holds a doctorate in engineering. He is a member of the Applied Physics Society and a senior member of IEEE. Graduated from Tokyo Institute of Technology Dept. of Chemical Engineering in 1978 and completed the MS program in 1930. In that year he joined Oki Electric. Since then he has been engaged in CMOS process design for DRAM and flash memory. He is now a manager at the VLSI R&D Center. He is a member of the Applied Physics Society.
In order to analyze the BBT (band-to-band tunneling) phenomenon in flash memory cells by simulation, a new model is proposed, which improves on the BBT model by introducing the concept of ''average electric fi... 详细信息
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THE AMERICAN SOCIETY OF NAVAL ENGINEERS takes great pleasure in presenting: THE GOLD MEDAL AWARD FOR 1991
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Naval Engineers Journal 1992年 第4期104卷
作者: CAPTAIN CLARK GRAHAM USN Captain Clark “Corky” Graham throughout his naval career has been a major force in the pursuit of a technology-based vision of the Navy of the future and the development of an engineering bridge to turn the vision into a reality. After an already distinguished naval career he was assigned to NavSea as Ship Design Manager and Technical Director for the Navy's newest destroyer the USSArleigh Burke(DDG-51). He was a major contributor to the many technical innovations that made this ship one of the most effective combatants in the Fleet. Upon return to MIT as a teacher and head of the Navy Program he continued to espouse the virtues of systems engineering instilling in his students the need to continually question old paradigms and to examine and assess the merits of new and innovative approaches to ship design. During his tour as Commander of the David Taylor Research Center he established a broad-based strategic planning process for exploring technology options and issues for the fleet of the future. He stimulated the Center's technologists and managers to challenge current paradigms and to make ships and ship systems more affordable without sacrifice in mission capabilities. He provided a collaborative systems oriented culture that addressed long range fleet operational and affordability goals. This led to the development of a battleforce design incorporating a multi-purpose modular ship concept called Carrier of Large Objects (CLO) double-hull structural concepts and an emphasis on technologies and processes to enhance the affordability of future ships. He also waged a successful campaign to convince higher authority of the merits of an integrated electric drive for ships. This ultimately led to his present assignment as Manager of NavSea's Advanced Surface Ship Machinery Program. Capt. Graham has laid a technological foundation for the Navy to meet the challenges of the future in a world of profound geopolitical change. Perhaps of even greater importance he articulated his ideas and philosophy to a
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