In this paper,heavy-ion-induced permanent damage in fully depleted silicon-on-insulator(FD SOI) devices are *** exposure to heavy ions, the characteristics degradation of FD SOI nMOSFET are presented,which is due to...
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ISBN:
(纸本)9781467324748
In this paper,heavy-ion-induced permanent damage in fully depleted silicon-on-insulator(FD SOI) devices are *** exposure to heavy ions, the characteristics degradation of FD SOI nMOSFET are presented,which is due to the microdose effect in the oxide layer and the displacement damage in silicon ***,the measured results also exhibit strong device geometry *** electrical properties degradation such as the off-state leakage current and the on-state current become more serious with the gate length or gate width decreasing,which indicates that the heavy-ion-induced damage in ultra-deep submicron FD SOI devices can not be ignored and should be paid more attention for radiation hardened applications.
Multilevel cell storage allows two or more bits to be stored in one cell,thus reducing almost 50% of Flash memory's area without technology shrinkage. Basic concepts like sensing schemes in multilevel Flash memory...
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ISBN:
(纸本)9781467324748
Multilevel cell storage allows two or more bits to be stored in one cell,thus reducing almost 50% of Flash memory's area without technology shrinkage. Basic concepts like sensing schemes in multilevel Flash memory are fundamental and need further *** this paper,an innovative sensing architecture is presented,with the name of serial-parallel sensing scheme,which provides fast read speed and a medium area cost and power consumption,compared with conventional parallel and serial sensing *** 65nm technology,the new architecture performs well, almost five times as fast as serial sensing and has advantage over parallel sensing in both area and power consumption cost.
For the silicided GGnMOS as ESD protection device, the current localization in the n+ diffusion duo to the short contact spacing often degrades the ESD performance of the device. By enlarging the contact spacing, ball...
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A novel layout strategy for on-chip ESD protection application is presented to solve the non-uniformity turn-on phenomenon of multi-finger gate-grounded nMOS (GGnMOS). The multi-finger gates as well as drains and sour...
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In this paper, an efficient method to relax timing requirements of CRFF sigma-delta modulators has been proposed. A system optimization to circuit level design was finished. Class-C inverter was used to realize half d...
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For the silicided GGn MOS as ESD protection device, the current localization in the n+ diffusion duo to the short contact spacing often degrades the ESD performance of the device. By enlarging the contact spacing, bal...
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For the silicided GGn MOS as ESD protection device, the current localization in the n+ diffusion duo to the short contact spacing often degrades the ESD performance of the device. By enlarging the contact spacing, ballasting resistance is introduced to allow a more uniform current distribution. How the drain contact to gate spacing and contact to contact spacing influencing the ESD performance of the GGn MOS is investigated. We find that lengthening the contact to contact spacing can significantly improve the ESD performance of silicided GGn MOS.
A drive system for active-matrix OLED panel is presented. The developed system comprises a digital interface which can receive DVI or MCU signals directly, a digital control part, a SRAM for storing display informatio...
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A drive system for active-matrix OLED panel is presented. The developed system comprises a digital interface which can receive DVI or MCU signals directly, a digital control part, a SRAM for storing display information, common drivers, and the 64-step gray scale segment drivers. Both common driver and segment driver is capable to be cascaded, so it can drive panels in different resolutions by using multiple chips. The drivers are using 0.35 um CMOS technology with 15V high voltage devices.
This paper proposes a new structure of LED(Light-emitting diode) driver for obtaining a low mismatch output current between different channels and even reduces the chip area. It's fabricated with TSMC 0.35 μm DDD...
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This paper proposes a new structure of LED(Light-emitting diode) driver for obtaining a low mismatch output current between different channels and even reduces the chip area. It's fabricated with TSMC 0.35 μm DDD process. The chip contains 16 channels and the maximum/minimum output current is 3mA/45mA, respectively. The value of each channel's output current is the same and controlled by a programmable 6-bits digital input signals. The circuit uses constant gate voltage of the power MOS working in the linear region whose (V GS - V TH ) is 10 to 50 times of V DS . The advantage is no DAC(Digital-to-Analog Converter) and no complex gate voltage generating circuit. Simple gate voltage generating circuit can also adapt to a wide range of external resistance changes. Because of the lower mismatch caused by threshold voltage mismatch, it can achieve a highly matched output current. The chip has only ±1.1% mismatch between different channels. The area of each channel's power MOS is only 200 μm × 100 μm. The area of analog part including current bias, bandgap reference, current mirror, and other control circuits is only 400 μm × 200 μm.
A novel on-chip CMOS current sensor implemented by switched capacitors for a current - mode buck converter is presented in this paper. This proposed current sensing circuit does not need another sense MOSFET and a vol...
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A novel on-chip CMOS current sensor implemented by switched capacitors for a current - mode buck converter is presented in this paper. This proposed current sensing circuit does not need another sense MOSFET and a voltage-to-current and current-to-voltage transform circuit. We use the 0.35um DPTM CMOS process to design and simulate this circuit. Test result shows that the accuracy and the speed of the proposed current sensing circuit are high.
A low power high speed Readout Integrated Circuit(ROIC) design for 320 × 320 IRFPA is proposed in this paper. The ROIC operates as follows: after integration phase, voltages on column bus of odd rows and even row...
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A low power high speed Readout Integrated Circuit(ROIC) design for 320 × 320 IRFPA is proposed in this paper. The ROIC operates as follows: after integration phase, voltages on column bus of odd rows and even rows are read out alternately. And the results are sampled and stored alternately on two sample capacitors added at the output point of column CSA. When sample capacitor for odd row samples and holds data, sample capacitor for even row works as feedback capacitor of output buffer so that voltage stored on sample capacitor can be read out directly. In this design, each column has one low power charge amplifier, and output buffer's power is optimized. Besides, capacitance of sample capacitor is much larger than that of CSA's feedback capacitor, so the KTC noise is lower and the charge injection is suppressed while the output range is not impaired. This design is also applicable to window readout. The readout speed can reach 8MHz with power consumption lower than 50mW. A 320 × 320 ROIC with pixel size of 30 × 30 μm 2 has been designed and fabricated with a 0.35 μm DPTM CMOS process under 5v supply voltage.
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