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检索条件"机构=Key Laboratory of Microelectronics Devices and Integration Technology"
1307 条 记 录,以下是311-320 订阅
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Monitoring the silk fabrics at different process stages by using FLIM  4
Monitoring the silk fabrics at different process stages by u...
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4th International Conference on Laser, Optics, and Optoelectronic technology, LOPET 2024
作者: Li, Changjiang Deng, Yifeng Xiao, Zeyu Wu, Zipei Zhu, Lei Lin, Junxiong Peng, Xiao Yan, Wei Qu, Junle State Key Laboratory of Radio Frequency Heterogeneous Integration Shenzhen University Shenzhen518060 China College of Physics and Optoelectronic Engineering Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province Shenzhen University Shenzhen518060 China Engineering Research Center for Eco-Dyeing and Finishing of Textiles Ministry of Education Zhejiang Sci-Tech University Hangzhou310018 China Key Laboratory of Advanced Textile Materials and Manufacturing Technology Ministry of Education Zhejiang Sci-Tech University Hangzhou310018 China College of Textile Science and Engineering International Institute of Silk Zhejiang Sci-Tech University Hangzhou310018 China School of Medical Engineering and Technology Xinjiang Medical University Urumqi810017 China
Mulberry silk fabrics are very popular due to their soft lustre, comfortable handle and smooth texture. Currently, the traditional textile testing methods are deficient to provide a fast and sensitive directional dete... 详细信息
来源: 评论
Temperature Dependence of Resistive Switching Behavior in α-Ga2O3 Thin Films
SSRN
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SSRN 2024年
作者: Sun, Kai Peng, Bo Yuan, Lei Yu, Jiangang Zhang, Yuming Jia, Renxu School of Microelectronics Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices Xidian University ShanXi Xi’an710071 China State Key Laboratory of Dynamic Measurement Technology School of Semiconductor and Physics North University of China ShanXi Taiyuan030051 China
This study comprehensively analyzes the resistive switching behavior of αGa2O3 thin films under varying temperatures, a critical aspect for data storage and in-memory computing applications. Our results demonstrate t... 详细信息
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Microcomb-driven photonic chip for solving partial differential equations
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Advanced Photonics 2025年 第1期7卷 62-73页
作者: Hongyi Yuan Zhuochen Du Huixin Qi Guoxiang Si Cuicui Lu Yan Yang Ze Wang Bo Ni Yufei Wang Qi-Fan Yang Xiaoyong Hu Qihuang Gong Beijing Institute of Technology School of PhysicsCenter for Interdisciplinary Science of Optical Quantum and NEMS IntegrationBeijing Key Laboratory of Nanophotonics and Ultrafine Optoelectronic SystemsKey Laboratory of Advanced Optoelectronic Quantum Architecture and Measurements of Ministry of EducationBeijingChina Beijing Academy of Quantum Information Sciences Peking UniversityNano-optoelectronics Frontier Center of Ministry of EducationCollaborative Innovation Center of Quantum MatterState Key Laboratory for Mesoscopic Physics&Department of PhysicsBeijingChina Chinese Academy of Sciences Institute of MicroelectronicsBeijingChina Peking University Yangtze Delta Institute of Optoelectronics NantongChina Shanxi University Collaborative Innovation Center of Extreme OpticsTaiyuanChina Hefei National Laboratory HefeiChina
With the development of the big data era,the need for computation power is dramatically growing,especially for solving partial differential equations(PDEs),because PDEs are often used to describe complex systems and p... 详细信息
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Experimental Demonstration of A CT-FeFET Array with Intrinsic Long-Short-Term Plasticity for Low-Cost Trajectory Prediction
Experimental Demonstration of A CT-FeFET Array with Intrinsi...
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International Electron devices Meeting (IEDM)
作者: Chao Li Jie Yu Xumeng Zhang Zhaohao Zhang Fangduo Zhu Siyuan Ouyang Pei Chen Lingli Cheng Gaobo Xu Qingzhu Zhang Huaxiang Yin Qi Liu Ming Liu State Key Laboratory of Integrated Chips and Systems Frontier Institute of Chip and System Fudan University Shanghai China Key Laboratory of Microelectronic Devices and Integrated Technology Institute of Microelectronics Chinese Academy of Sciences Beijing China Key Laboratory of Fabrication Technologies for Integrated Circuits Chinese Academy of Sciences Beijing China
Trajectory prediction is a vital function in the auto-driving field, typically achieved with a long short-term memory network. Static IMC technology accelerates the computing of long-term parameters, while the executi... 详细信息
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A DC-DC converter utilizing $\beta-\text{Ga}_{2}\mathrm{O}_{3}$ Schottky barrier diode
A DC-DC converter utilizing $\beta-\text{Ga}_{2}\mathrm{O}_{...
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IEEE Electron devices technology and Manufacturing Conference (EDTM)
作者: Wei Guo Guangzhong Jian Feihong Wu Kai Zhou Guangwei Xu Xuanze Zhou Qiming He Xiaolong Zhao Shibing Long School of Microelectronics University of Science and Technology of China Hefei China Key Laboratory of Microelectronics Devices and Integration Technology Institute of Microelectronics of Chinese Academy of Sciences Beijing China
The β-Ga2O3 Schottky barrier diode (SBD) is fabricated and actualized a breakdown voltage of 472 V. A SPICE model for β-Ga2O3 Sbd is derived from experimental results and applied to DC-DC converter circuit simulatio... 详细信息
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Polarization Reconfigurable Patch Antenna Loaded a Dielectric Lens for Ka-Band Applications
Polarization Reconfigurable Patch Antenna Loaded a Dielectri...
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International Conference on Microwave and Millimeter Wave technology Proceedings
作者: Xujun Yang Jun Hu Lei Ge School of Information and Artificial Intelligence Engineering Anhui Agricultural University Anhui China School of Microelectronics Hefei University of Technology Anhui China State Key Laboratory of Radio Frequency Heterogeneous Integration Shenzhen University Shenzhen China
This paper presents a millimeter-wave (mm-Wave) polarization reconfigurable patch antenna for Ka-band wireless applications. The central patch connected with two groups of parasitic shorting posts by the PIN diodes is... 详细信息
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Cost-Efficient Soft Error Detection and Correction Flip-Flop Design for Nanoscale technology
Cost-Efficient Soft Error Detection and Correction Flip-Flop...
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International Conference on ASIC
作者: Hong-Chen Li He Liu Jie Li Heilongjiang Provincial Key Laboratory of Micro-Nano Sensitive Devices and Systems Heilongjiang University Harbin China Microelectronics Center Harbin Institute of Technology Harbin China
With the rapid development of integrated circuits and the scaling down of transistor feature sizes, the susceptibility of flip-flops to the Single Event Transient (SET) and Single Event Upset (SEU) increases. In this ...
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An Efficient Construction Method Based on Partial Distance of Polar Codes with Reed-Solomon Kernel
arXiv
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arXiv 2023年
作者: Zhao, Jianhan Zhang, Wei Liu, Yanyan The School of Microelectronics Tianjin University Tianjin300072 China The Tianjin Key Laboratory of Photoelectronic Thin Film Devices and Technology Nankai University Tianjin300071 China
Polar codes with Reed-Solomon (RS) kernel have great potential in next-generation communication systems due to their high polarization rate. In this paper, we study the polarization characteristics of RS polar codes a... 详细信息
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A photomemory by selective-assembling hybrid porphyrin-silicon nanowire field-effect transistor
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Science China(Information Sciences) 2020年 第6期63卷 253-255页
作者: Gong CHEN Bocheng YU Xiaokang LI Xiaoqiao DONG Xiaoyan XU Zhihong LI Ru HUANG Ming LI Key Laboratory of Microelectronic Devices and Circuits(MOE) Institute of MicroelectronicsPeking University National Key Laboratory of Science and Technology on Micro/Nano Fabrication Peking University Faculty of Information Technology Beijing University of Technology
Dear editor,Recently, the integration of photosensitive material and electronic nanodevice has been the center of attention with Internet of things (IoT)technology development [1–3]. The immobilization of such photoa... 详细信息
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Influence of an ALD TiN capping layer on the PBTI characteristics of n-FinFET with ALD HfO2/TiN-capping/TiAl gate stacks
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Science China(Information Sciences) 2020年 第2期63卷 248-250页
作者: Hong YANG Luwei QI Yanbo ZHANG Bo TANG Qianqian LIU Hao XU Xueli MA Xiaolei WANG Yongliang LI Huaxiang YIN Junfeng LI Huilong ZHU Chao ZHAO Wenwu WANG Tianchun YE Key Laboratory of Microelectronics Devices & Integrated Technology Institute of MicroelectronicsChinese Academy of Sciences National Space Science Center Chinese Academy of Sciences School of Microelectronics University of Chinese Academy of Sciences
Dear editor,High k/metal gate (HKMG) stacks with fully gatelast processing have become the primary solution for sub-22-nm volume manufacturing with the development of complementary oxide semiconductor(CMOS) technology... 详细信息
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