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检索条件"机构=Key Laboratory of Optoelectronic Circuit and Integration"
5 条 记 录,以下是1-10 订阅
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Achieving highly-efficient H2S gas sensor by flower-like SnO_(2)–SnO/porous GaN heterojunction
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Chinese Physics B 2023年 第2期32卷 193-200页
作者: 刘增 都灵 张少辉 边昂 方君鹏 邢晨阳 李山 汤谨诚 郭宇锋 唐为华 College of Integrated Circuit Science and Engineering Nanjing University of Posts and TelecommunicationsNanjing 210023China National and Local Joint Engineering Laboratory for RF Integration and Micro-Packing Technologies Nanjing University of Posts and TelecommunicationsNanjing 210023China School of Electronic and Information Engineering Jinling Institute of TechnologyNanjing 211169China Institute of Microscale Optoelectronics Shenzhen UniversityShenzhen 518060China Key Laboratory of Luminescence and Optical Information of Ministry of Education Institute of Optoelectronic TechnologyBeijing Jiaotong UniversityBeijing 100044China School of Integrated Circuits Tsinghua UniversityBeijing 100044China Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education College of Physics and Optoelectronic EngineeringShenzhen UniversityShenzhen 518060China State Key Laboratory of Information Photonics and Optical Communications School of ScienceBeijing University of Posts and TelecommunicationsBeijing 100876China
A flower-like SnO_(2)–SnO/porous Ga N(FSS/PGaN) heterojunction was fabricated for the first time via a facile spraying process, and the whole process also involved hydrothermal preparation of FSS and electrochemical ... 详细信息
来源: 评论
2.0%-∆ Silica-Based Compact and Low Loss Array Waveguide Grating
SSRN
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SSRN 2023年
作者: Wang, Liangliang Zhang, Jiashun An, Junming Sun, Bingli Chen, Jun Gao, Zhihao Yin, Xiaojie Wang, Yue Wu, Yuan Da State Key Laboratory on Integrated Optoelectronics Institute of Semiconductors Chinese Academy of Sciences Beijing100083 China Henan Key Laboratory of Optoelectronic Circuit and Integration Henan Shi Jia Photons Technology Co. Ltd Hebi458030 China
In this paper, a new 2.0% refractive index difference silica-based platform is developed. key processes such as etching and up cladding are optimized to achieve low transmission loss of 0.043dB/cm. The periodic segmen... 详细信息
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Design and Fabrication of E-Band Silica Based Dense Wavelength-Division Multiplexing (Dwdm) Awg
SSRN
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SSRN 2024年
作者: Han, Feng Zhang, Jiashun Wang, Liangliang Cui, Pengwei Wang, Yue An, Junming Chen, Jun Sun, Bingli Zhou, Tianhong Jining Normal University School of Physics and Electronic Information Engineering Wulanchabu 012000 China Key Laboratory of Optoelectronic Materials and Devices Institute of Semiconductors Chinese Academy of Sciences Beijing100083 China Center of Materials Science and Optoelectronics Engineering University of Chinese Academy of Sciences Beijing100049 China College of Materials Science and Opto-Electronic Technology University of Chinese Academy of Sciences Beijing100049 China Key Laboratory of Optoelectronic Circuit and Integration Henan Shijia Photons Technology Co. Ltd. Henan Hebi458030 China
A E-band,48 channels flat top silica based dense wavelength-division multiplexing (DWDM) arrayed waveguide grating (AWG) was designed and fabricated with 0.75% relative refractive index difference. In order to reduce... 详细信息
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Superior Performance of ZnGaO Solar-Blind Photodetectors by Implementing TFT Structure and Tunable ZNO Cycle Ratio
SSRN
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SSRN 2024年
作者: Fan, Hui-Chen Wang, Chen Xu, Yi-Hong Fan, Teng-Min Huang, Pao-Hsun Ruan, Yu-Jiao Wu, Tingzhu Kuo, Hao-Chung Wuu, Dong-Sing Lai, Feng-Min Lien, Shui-Yang Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology School of Opto-Electronic and Communication Engineering Xiamen University of Technology Xiamen361024 China School of Ocean Information Engineering Jimei University Jimei District Fujian Xiamen361021 China National Measurement and Testing Center for Flat Panel Display Industry Xiamen Institute of Measurement and Testing Xiamen361024 China National Integrated Circuit Industry and Education Integration Innovation Platform Department of Electronic Science Xiamen University Xiamen361005 China Department of Photonics Graduate Institute of Electro-Optical Engineering College of Electrical and Computer Engineering National Yang Ming Chiao Tung University Hsinchu30010 Taiwan Department of Applied Materials and Optoelectronic Engineering National Chi Nan University Nantou54561 Taiwan Department of Biomedical Engineering Da-Yeh University Changhua51591 Taiwan
In this study, plasma enhanced atomic layer deposition was used to prepare ZnGaO thin films with different ZnO cycle ratios from 0% to 50%, which were employed to fabricate the MSM-type and TFT-type solar-blind photod... 详细信息
来源: 评论
Superior performance of ZnGaO solar-blind photodetectors by Implementing TFT structure and tunable ZnO cycle ratio
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Materials Today Chemistry 2024年 38卷
作者: Fan, Hui-Chen Wang, Chen Xu, Yi-Hong Fan, Teng-Min Huang, Pao-Hsun Ruan, Yu-Jiao Wu, Ting-Zhu Kuo, Hao-Chung Wuu, Dong-Sing Lai, Feng-Min Lien, Shui-Yang Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology School of Opto-Electronic and Communication Engineering Xiamen University of Technology Xiamen 361024 China School of Ocean Information Engineering Jimei University Jimei District Xiamen 361021 Fujian China National Measurement and Testing Center for Flat Panel Display Industry Xiamen Institute of Measurement and Testing Xiamen 361024 China National Integrated Circuit Industry and Education Integration Innovation Platform Department of Electronic Science Xiamen University Xiamen 361005 China Department of Photonics & Graduate Institute of Electro-Optical Engineering College of Electrical and Computer Engineering National Yang Ming Chiao Tung University Hsinchu 30010 Taiwan Department of Applied Materials and Optoelectronic Engineering National Chi Nan University Nantou 54561 Taiwan Department of Biomedical Engineering Da-Yeh University Changhua 51591 Taiwan
In this study, plasma enhanced atomic layer deposition was used to prepare ZnGaO thin films with different ZnO cycle ratios from 0 % to 50 %, which were employed to fabricate the MSM-type and TFT-type solar-blind phot... 详细信息
来源: 评论