The front end of an 850 nm monolithic integrated optical receiver has been developed with 0.5μm GaAs PHEMT process, which comprises a PIN photodetector and a distributed amplifier. The photodetector has a diameter an...
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The front end of an 850 nm monolithic integrated optical receiver has been developed with 0.5μm GaAs PHEMT process, which comprises a PIN photodetector and a distributed amplifier. The photodetector has a diameter and capacitance of 30μm and 0.25 pF, respectively, as well as a dark current of less than 20 nA under the reverse bias of 10 V. The distributed amplifier has a -3dB bandwidth close to 20 GHz, with a transimpedance gain of 46 dBΩ;In the range of 50 MHz-16 GHz, both the input and output voltage standing wave ratios are less than 2;The noise figure varies from 3.03 to 6.5 dB within the bandwidth. The monolithic integrated optical receiver front end output eye diagrams for 1 Gb/s and 2.5 Gb/s NRZ pseudorandom binary sequence (PRBS) are clear and satisfying.
Using the first-principles full-potential linearized augmented plane-wave (FPLAPW) method based on density functional theory (DFT), we have investigated the native defect properties and p-type doping efficiency in AlN...
Using the first-principles full-potential linearized augmented plane-wave (FPLAPW) method based on density functional theory (DFT), we have investigated the native defect properties and p-type doping efficiency in AlN doped with group-IIA elements such as Be, Mg, and Ca. It is shown that nitrogen vacancies (VN) have low formation energies and introduce deep donor levels in wurtzite AlN, while in zinc blende AlN and GaN, these levels are reported to be shallow. The calculated acceptor levels ϵ(0∕−) for substitutional Be (BeAl), Mg (MgAl), and Ca (CaAl) are 0.48, 0.58, and 0.95eV, respectively. In p-type AlN, Be interstitials (Bei), which act as donors, have low formation energies, making them a likely compensating center in the case of acceptor doping. Whereas, when N-rich growth conditions are applied, Bei are energetically not favorable. It is found that p-type doping efficiency of substitutional Be, Mg, and Ca impurities in w−AlN is affected by atomic size and electronegativity of dopants. Among the three dopants, Be may be the best candidate for p-type w−AlN. N-rich growth conditions help us to increase the concentration of BeAl, MgAl, and CaAl.
Polymer white-light-emitting diodes are fabricated based on the blend of poly[9,9-di-(2-ethylhexyl)-fluorenyl-2, 7- diyl]-end capped with polysilsesquioxane (PFO) and a chelating copolymer of poly[(9,9-bis(3′-...
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Polymer white-light-emitting diodes are fabricated based on the blend of poly[9,9-di-(2-ethylhexyl)-fluorenyl-2, 7- diyl]-end capped with polysilsesquioxane (PFO) and a chelating copolymer of poly[(9,9-bis(3′-(N,N-dimethylamino) propyl)-2, 7-fluorene-alt-2, 7-(9,9-dioctylfluorene) )-co- [2, 7-(9,9-dioctlyfluorene)-alt-5,5-bis(2-(4-methyl-l-naphtha- lene) pyridine-C^2,N) iridium (III) acethylacetonate]] (PFN-NaIr). The device with the sole aluminium cathode is able to produce a comparably white electroluminescence efficiency of 1.31 cd/A to that of the device using low work function cathodes (such as Ba, Ca, etc.). The CIE coordinates of the white light emission consisting of red, green and blue three components are nearly at (0.34, 0.35). The mechanism of the white light emission from the device with the AI cathode is investigated, which is related to the efficient injection of electrons through the interface of PFN-Nalr/AI.
We investigate the influence of precursor molar ratio of [S^2-]/[Zn^2+] on particle size and photoluminescence (PL) of ZnS:Mn^2+ nanocrystMs. By changing the [S^2-]/[Zn^2+] ratio from 0.6 (Zn-rich) to 2.0 (S-...
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We investigate the influence of precursor molar ratio of [S^2-]/[Zn^2+] on particle size and photoluminescence (PL) of ZnS:Mn^2+ nanocrystMs. By changing the [S^2-]/[Zn^2+] ratio from 0.6 (Zn-rich) to 2.0 (S-rich), the particle size increases from nearly 2. 7nm to about ***. The increase in the ratio of [S^2-]/[Zn^2+] cadses a decrease of PL emission intensity of ZnS host while a distinct increase of Mn^2+ emission. The maximum intensity for the luminescence of Mn^2+ emission is observed at the ratio of [S^2-]/[Zn^2+] ≈ 1.5. The possible mechanism for the results is discussed by filling of S^2- vacancies and the increase of Mn^2+ ions incorporated into ZnS lattices.
We demonstrate a high eftlciency top-emitting polymer light-emitting diode (TPLED) with chromium (Cr) taking as the anode. The TPLED structure is Cr/poly-3, 4-ethylenedioxythiophene (PEDOT:PSS)/poly [2-(4-3',...
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We demonstrate a high eftlciency top-emitting polymer light-emitting diode (TPLED) with chromium (Cr) taking as the anode. The TPLED structure is Cr/poly-3, 4-ethylenedioxythiophene (PEDOT:PSS)/poly [2-(4-3',7'- dimethyloctyloxy)-phenyl]-p-phenylenevinylene) (P-PP V) /Ba/Ag. The Cr ( 100 nm) anode is prepared by sputterdepositing in a vacuum chamber. It is found that the device emissive properties are affected dramatically by the thickness of both PEDOT:PSS and the Ag cathode. Optimized thicknesses of PEDOT:PSS and Ag layer are 60nm and 15nm, respectively. The diode exhibits excellent electroluminescence (EL) properties, such as a turn-on voltage of 3.32 V, luminous eftlciency of 4.41 cd/A and luminance of 6989cd/m^2 at driving voltage of about 9 V.
Saturated red polymer light-emitting diodes have been fabricated with a single emitting polymer blend layer of poly[2-(2-ethylhexyloxy)-5-methoxy-1,4-phenylenevinylene] (MEH-PPV) and poly[9,9-dioc- tylfluorene-co-4,7-...
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Saturated red polymer light-emitting diodes have been fabricated with a single emitting polymer blend layer of poly[2-(2-ethylhexyloxy)-5-methoxy-1,4-phenylenevinylene] (MEH-PPV) and poly[9,9-dioc- tylfluorene-co-4,7-di-2-thienyl-2,1,3-benzothiadiazole] (PFO-DBT15). Saturated red emission with the Commission Internationale de l’Eclairage (CIE) coordinates of (0.67, 0.33) was obtained. The device stability was investigated. The results showed that energy transfer occurred from MEH-PPV to PFO-DBT15, and MEH-PPV improved the hole injection and transportation.
A series of hydrogenated silicon thin films were prepared by the radio frequency plasma enhanced chemical vapor deposition method (RF-PECVD) with various si-lane concentrations. The influence of silane concentration o...
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A series of hydrogenated silicon thin films were prepared by the radio frequency plasma enhanced chemical vapor deposition method (RF-PECVD) with various si-lane concentrations. The influence of silane concentration on structural and elec-trical characteristics of these films was investigated to study the phase transition region from amorphous to microcrystalline phase. At the same time,optical emis-sion spectra (OES) from the plasma during the deposition process were monitored to get information about the plasma properties,Raman spectra were measured to study the structural characteristics of the deposited films. The combinatorial analysis of OES and Raman spectra results demonstrated that the OES can be used as a fast method to diagnose phase transition from amorphous to microcrystalline silicon. At last the physical mechanism,why both OES and Raman can be used to diagnose the phase transition,was analyzed theoretically.
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