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Fast and Accurate EUVL Thick-Mask Model Based on Multi-Channel Attention Network

IEEE Transactions on Semiconductor Manufacturing 2025年第2期38卷 194-202页

作者： Yu, Chengzhen Liu, Sheng Chen, Wensheng Ma, Xu Beijing Institute of Technology Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China School of Optics and Photonics Beijing100081 China

Simulation of thick-mask effects is an important task in computational lithography within extreme ultraviolet (EUV) waveband. This paper proposes a fast and accurate learning-based thick-mask model dubbed multi-channel block attention network (MCBA-Net) to solve this problem for EUV lithography. The proposed MCBA-Net introduces geometric feature attention module and structural feature attention module to improve the computation accuracy of thick-mask diffraction near field. During the training process, the proposed attention modules can effectively learn the impact of the three-dimensional mask diffraction behavior. In addition, the multi-channel network architecture is used to simultaneously synthesize the thick-mask diffraction matrices under different polarization states, and the coupling between different diffraction matrices is addressed. Numerical experiments show that the proposed model improves the computational efficiency by more than 20-fold over the rigorous simulator, and reduces the prediction error by 25%~50% compared with the state-of-the-art deep learning models. In addition, the generalization ability of the proposed method is proved using a complex testing pattern. © 1988-2012 IEEE.

关键词： Ability testing

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Reducing dose sensitivity in high-numerical-aperture extreme ultraviolet lithography using an innovative source optimization method

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Applied Optics 2025年第12期64卷 3350-3356页

作者： Li, Zhaoxuan Yuan, Miao Li, Zhen Yang, He Huang, Weichen Li, Yanqiu Key Laboratory of Photoelectronic Imaging Technology System of Ministry of Education of China School of Optics and Photonics Beijing Institute of Technology Beijing100081 China

Errors such as illumination non-uniformity and system drift during scanning can lead to unpredictable dose non-uniformity and degrade the imaging performance across the wafer. This paper proposes a novel, to our knowledge, source optimization (SO) method for high-numerical-aperture extreme ultraviolet lithography (high-NA EUVL) system. This method establishes a dose sensitivity function and integrates it into the cost function of the SO process. It aims at reducing the influence of dose variation on the critical dimension error (CDE) in the EUVL system and increasing the exposure latitude (EL). Simulation results demonstrate that this method significantly improves the stability of imaging performance in case of dose non-uniformity. Additionally, it extends the process window (PW). © 2025 Optica Publishing Group. All rights, including for text and data mining (TDM), Artificial Intelligence (AI) training, and similar technologies, are reserved.

关键词： Extreme ultraviolet lithography

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Evaluation of occlusion immunities of free-space orbital angular momentum shift keying

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Optics Express 2025年第6期33卷 13494-13505页

作者： Yang, Jinyu Zhang, Shurui Li, Lang Gao, Mingwei Gao, Chunqing Fu, Shiyao School of Optics and Photonics Beijing Institute of Technology Beijing100081 China Key Laboratory of Information Photonics Technology Ministry of Industry and Information Technology of the People’s Republic of China Beijing100081 China Key Laboratory of Photoelectronic Imaging Technology and System Ministry of Education of the People’s Republic of China Beijing100081 China National Key Laboratory on Near-Surface Detection Beijing100072 China

Orbital angular momentum (OAM) provides a new high-dimensional degree-of-freedom for lasers enabling high-dimensional shift keying, thus showing huge potential in free-space optical data-transmissions. Ensuring the accuracy of data transmission is of concern in any communication system. However, in the free-space OAM shift keying link, interferences from environmental occlusions will broaden the OAM spectrum and thus affect the correctness of information received. In this paper, the occlusion immunities of two commonly used OAM shift keying strategies—OAM-encoding-symbols and OAM-encoding-bits—are evaluated under different occlusion scenarios. We introduce radial, azimuthal, and random occlusions into the link and then analyze the bit error rate (BER) of various OAM shift keying strategies. The results illustrate that the strategy of OAM-encoding-symbols exhibits stronger occlusion immunity with zero BER than OAM-encoding-bits. Moreover, proof-of-concept experiments are done to transmit grayscale images under occlusions. The final decoding results show identical data-transmission performance with simulations. © 2025 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement.

关键词： Bit error rate

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Selective formation of generalized optical skyrmions

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Optics Letters 2025年第9期50卷 2840-2843页

作者： Zhang, Haojun Gao, Chunqing Fu, Shiyao School of Optics and Photonics Beijing Institute of Technology Beijing100081 China Key Laboratory of Information Photonics Technology Ministry of Industry and Information Technology of the People’s Republic of China Beijing100081 China Key Laboratory of Photoelectronic Imaging Technology and System Ministry of Education of the People’s Republic of China Beijing100081 China National Key Laboratory on Near-Surface Detection Beijing100072 China

Optical skyrmions, a type of topologically protected quasiparticle, have undergone various deformations in recent years. In this Letter, we present a scheme that can achieve the selective formation of generalized optical skyrmions. In our proposal, a liquid-crystal spatial light modulator and a variable liquid-crystal retarder, both of which are commonly programmable devices, are employed, allowing for the on-demand precise manipulation of topological textures of various quasiparticles including but not limited to skyrmions, antiskyrmions, and bimerons. The proof-of-concept experiments illustrate that generalized optical skyrmions whose skyrmion number up to 5 can be well generated with on-demand tailored topological textures. While maintaining a simple setup, the system demonstrates a notable capacity for the manipulation of intricate high-order textures, signifying its considerable potential for extensive and sophisticated applications in the generation and manipulation of skyrmions. © 2025 Optica Publishing Group.

关键词： Topology

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Design of an Underwater Micro-Scanning Single-Photon Laser imaging system Based on SPAD Array 10

Design of an Underwater Micro-Scanning Single-Photon Laser I...

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10th Symposium on Novel Optoelectronic Detection technology and Applications

作者： Kuang, Yanjin Zhao, Huanqing Tian, Youyuan Wu, Guanlin Qiu, Su Jin, Weiqi Zhu, Shihao Yu, Xiangzhi MOE Key Laboratory of Optoelectronic Imaging Technology and System Beijing Institute of Technology Beijing China

ISBN: (数字)9781510688155

ISBN: (纸本)9781510688148

There is an urgent need for new concept underwater observation and detection equipment in marine exploration, becoming a key development direction for marine resource detection, marine scientific research, underwater rescue, and underwater defense. With the advancement of new SPAD array technology, its application in terrestrial/underwater Lidar has gained attention. This paper addresses the issues of insufficient photoelectric imaging sensitivity and high noise under strong underwater scattering conditions by investigating an underwater micro-scanning laser single-photon imaging system based on a 32×32 avalanche photodiode (SPAD) array. The system uses a SPAD array with time-correlated single-photon counting (TCSPC) functionality combined with a high-power, high-repetition-rate blue-green laser and micro-scanning imaging methods to detect weak photon echo signals underwater. It employs 2×2 low-resolution micro-scanning imaging to achieve 64×64 micro-scanning high-resolution single-photon imaging and recognition for both terrestrial and underwater targets. Additionally, the design of the optical system, optomechanical structure, and underwater pressure-sealed tank is carried out. An underwater micro-scanning single-photon laser imaging experimental system based on the SPAD array is developed. Through imaging experiments on land and underwater, the feasibility and effectiveness of the system's technical approach are demonstrated, providing effective technical and methodological support for further detection systems in actual marine environments. © 2025 SPIE.

关键词： Avalanche photodiodes

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Design of Wireless Video Transmission system Based on Retina-like Distributed CMOS Imager 10

Design of Wireless Video Transmission System Based on Retina...

引用

10th Symposium on Novel Optoelectronic Detection technology and Applications

作者： Li, Pengcheng Cao, Fengmei MOE Key Laboratory of Optoelectronic Imaging Technology and System Beijing Institute of Technology Beijing100081 China

ISBN: (数字)9781510688155

ISBN: (纸本)9781510688148

This paper proposes the design of a wireless video transmission system based on the retina-like distributed CMOS imaging device, BIT-Retina52, aimed at addressing the issue of cable entanglement caused by wired transmission during dynamic image rotation-elimination experiments. The overall design takes the heterogeneous multi-core chip ZYNQ SoC as the main control unit to conduct co-design of hardware and software: the Programmable Logic (PL) side implements the acquisition, format conversion, and transmission of image data, while the Processing system (PS) manages data flow control, data buffering, and packetized transmission. Additionally, a Linux system was built to port the USB Wi-Fi module driver. The upper computer system was developed using the Qt framework for image reception and display. Through timing simulations and experimental validation, this design successfully achieved the stable acquisition and transmission of visible light images from the BIT-Retina52 under wireless conditions. © 2025 SPIE.

关键词： CMOS integrated circuits

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Preprocessing method for underwater time-gated SPAD-array-based images utilizing Retinex and BM3D

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Applied Optics 2025年第14期64卷 3842-3855页

作者： Guan-Lin WuXiang-Zhi YuShi-Hao ZhuYou-Yuan TianYan-Jin KuangHuan-Qing ZhaoSu Qiu Wei-Qi Jin Xia Wang MoE Key Lab of Photoelectronic Imaging Technology and System Beijing Institute of Technology Beijing 100081 China

Underwater optical imaging is affected by light absorption and backscattering in water, thus yielding low signal-to-noise ratios and limited imaging ranges. This study proposes an image preprocessing method for underwater, time-gated, single-photon avalanche diode (TG-SPAD)-array-based images according to the Retinex theory, and a block-matching and 3D filtering (BM3D) algorithm to address uneven illumination and complex noise issues in small-diameter, light beam, underwater imaging. Specifically, images undergo rapid illumination correction in combination with time-domain transformation. Subsequently, the proposed method employs the BM3D algorithm in conjunction with an adaptive noise-fitted model and an improved Anscombe transform for denoising. The experimental results demonstrate that the proposed method outperforms various existing image preprocessing techniques in both subjective visual assessments and objective evaluation metrics. The proposed method considerably enhances the visual quality of TG-SPAD-array-based images and is well-suited for underwater, single-photon imaging applications and for the optimized processing of high-precision, 3D depth maps.

关键词： Lidar Light beams Optical imaging Polarimetric imaging Single-photon avalanche diodes Wavelet transforms

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ResGNN-OPC: a fast optical proximity correction approach based on an interpretable residual graph neural network

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Applied Optics 2025年第15期64卷 4227-4234页

作者： Jingqing Liu Xu Ma Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China School of Optics and Photonics Beijing Institute of Technology Beijing 100081 China

Optical proximity correction (OPC) is a pivotal resolution enhancement technique that compensates for the image distortion in the optical lithography process. However, the turn-around time of modern OPC techniques, namely model-based OPC (MBOPC), increases dramatically as the lithography technology node constantly pushes forward. This paper develops a learning-based OPC approach using the residual graph neural network, dubbed ResGNN-OPC, to achieve more than 6000-fold acceleration compared to the conventional MBOPC. The residual network structure is integrated in the graph convolution layer to emulate each iteration of the MBOPC algorithm and to facilitate the increment of the network depth, thereby enhancing the network’s interpretability and fitting ability. The superiorities of the proposed method are verified by numerical experiments. Compared to the existing learning-based OPC approach, the proposed method improves the prediction accuracy of OPC corrections by more than 40% and costs comparable runtime. In addition, ResGNN-OPC can output the final OPC solution with fewer or even no subsequent iteration steps but can still achieve similar image fidelity as the MBOPC approach.

关键词： Deep learning Fourier transforms Image metrics imaging systems Neural networks Projection systems

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Design of a grazing incidence illumination system for anamorphic extreme ultraviolet lithography

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Applied Optics 2025年第13期64卷 3545-3553页

作者： Chen, Yuqing Li, Tong Li, Yanqiu Liu, Lihui Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China School of Optics and Photonics Beijing Institute of Technology Beijing 100081 China

High-numerical-aperture (NA) anamorphic extreme ultraviolet lithography (EUVL) is the next-generation technology under advanced technology nodes. The design of the illumination system requires achieving better illumination uniformity while ensuring energy efficiency. However, the traditional four-mirror structure illumination system ignores the impact of energy efficiency. In this paper, a grazing incidence illumination system design method is proposed. The illumination system adopts a grazing incidence relay system structure to improve energy efficiency and ensure good illumination uniformity. To realize different illumination modes and eliminate ray obstruction between adjacent field facet mirrors, a multiparameter double facet mirror assignment method is proposed. In this work, the double facet mirrors’ multiparameter automatic alignment assignment model is established. Then the model parameters are optimized by using the Kuhn–Munkres algorithm to minimize the cost function. The optimal allocation relationship for double facet mirrors is obtained by using the proposed method. Through the above methods, an EUV illumination system matching an NA 0.55 anamorphic projection objective is designed. The simulation results show that the illumination system can achieve a mask plane illumination uniformity of 99% under different illumination modes, and the energy efficiency of the illumination system is 23.6%. Compared with the traditional four-mirror illumination system, the energy efficiency of the illumination system has improved by 28.2%. © 2025 Optica Publishing Group. All rights, including for text and data mining (TDM), Artificial Intelligence (AI) training, and similar technologies, are reserved.

关键词： Extreme ultraviolet lithography Illumination Illumination design imaging systems Ray tracing systems design

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Full-field source and mask optimization using gradient surgery strategy

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Applied Optics 2025年第13期64卷 3737-3743页

作者： Yang, He Li, Yanqiu Yuan, Miao Li, Zhaoxuan Li, Zhen Huang, Weichen Key Laboratory of Photoelectronic Imaging Technology System of Ministry of Education of China School of Optics and Photonics Beijing Institute of Technology Beijing100081 China

The aberrations of the lithography objective are unevenly distributed at different field points. Full-field source and mask optimization (FFSMO) can reduce the impact of uneven aberration on projection lithography imaging. However, gradient conflicts between field points would prevent FFSMO merit function from converging to an optimal solution. In this paper, the gradient surgery (GS) theory is applied to solve the gradient conflict problem in FFSMO. To mitigate the gradient conflict, the proposed GS-FFSMO method projects the gradient of each field point onto the gradient normal plane of any other field point that has a conflicting gradient. Then, the source and mask patterns based on the corrected gradient information are updated. Compared with traditional FFSMO, the proposed method can effectively improve the lithography imaging fidelity and uniformity at full exposure field. © 2025 Optica Publishing Group.

关键词： Photomasks

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