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Integrated optic micropressure sensor using ring resonator

ELECTRONICs AND COmmUNICATIONs IN JAPAN PART II-ELECTRONICs 1996年第4期79卷 1-10页

作者： Ohkawa, m Abe, T sekine, s sato, T Faculty of Engineering Niigata University Niigata Japan 950-21 Graduated in 1985 from the Department of Electrical Engineering Osaka University where he received his Ph.D. degree in 1989. In 1989 he became a Research Associate at Niigata University where he was promoted to Lecturer and is currently an Associate Professor. He has been engaged in research on integrated optical circuits optical measurement and optoelectronics. He is a member of the Japan Society of Applied Physics and the Laser Society of Japan. Graduated in 1995 from the Department of Electrical and Electronic Engineering Niigata University where at present he is working toward his M.S. degree. He has been engaged in research on the sensitivity enhancement of integrated optical pressure sensors. He is a member of the Japan Society of Applied Physics. Graduated in 1964 from the Department of Electrical Engineering Niigata University where he then became a Research Associate. Later he received his Ph.D. degree and after serving as Lecturer and Associate Professor he was promoted to Professor. He has been engaged in research on application of optical radiation and optical information processing. He is a member of Illumination Society Japan Society of Applied Physics Laser Society of Japan and Japan Color Society. Graduated in 1976 from the Department of Electronic Engineering Kyoto University where he received his Dr. of Eng. degree in 1983. He then became a Research Associate Lecturer and Associate Professor at Niigata University where at present he is a Professor. He has been engaged in research on particle generation by lasers frequency stabilization of dye lasers and laser diodes. He is a member of the Institute of Electrical Engineers of Japan Japan Physical Society IEEE and OSA.

In this paper, sensitivity improvement of integrated optic micropressure sensors is discussed. The sensor is composed of a diaphragm and a ring resonator that is a multiple interference optical circuit. A part of the waveguide of the ring resonator is on the diaphragm. When a pressure is applied to the sensor, the diaphragm is deformed and the refractive index changes slightly so that a phase shift is induced on the guided wave propagating on the diaphragm. From the change of the resonant frequency caused by this phase change, the magnitude of the applied pressure is detected. In this study, particular emphasis is on the relationship between the diaphragm dimensions and the sensor sensitivity. From the analysis of the sensor operation, it is concluded that the use of a square-shaped diaphragm with a waveguide of the ring resonator at the edge in addition to employing the Tm-like mode is m.s. suited for a highly sensitive sensor. Further, from the evaluation of the minimum detectable pressure, it is expected that an integrated optic microprocessor sensor can be realized which is sensitive to such low pressure as underwater acoustics.

关键词： integrated optical circuit pressure sensor optics-based sensor ring resonator diaphragm

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measurement errors in effective channel-length extraction

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ELECTRONICs AND COmmUNICATIONs IN JAPAN PART II-ELECTRONICs 1996年第1期79卷 43-50页

作者： Terada, K Member Faculty of Information Sciences Hiroshima City University Hiroshima Japan 731–31 Received his B.E. degree from Waseda University Tokyo Japan in 1971 and his M.S. and Dr. of Eng. degrees from Kyoto University Kyoto Japan in 1973 and 1989 respectively. In 1973 he joined Central Research Laboratories NEC Corporation Kawasaki Japan where he was first engaged in the measurement of Si-MOSFETs and the development of silicon gate DMOS fabrication process. From 1976 to 1992 he was engaged in the research and development of MOSFETs and MOS memories at Microelectronics Research Laboratories NEC Corporation Sagamihara Japan. During this period he worked on new DRAM cell structures their fabrication processes and MOSFET designs. From 1992 to 1994 he was a research manager of basic LSI process group in Microelectronics Research Laboratories NEC Corporation Tsukuba Japan. Since 1994 he has been with Hiroshima City University where at present he is a Professor on the Faculty of Computer Sciences. Dr. Terada is a member of the Institute of Electronics Information and Communication Engineers of Japan the Japan Society of Applied Physics and the IEEE Electron Devices Society.

To evaluate the accuracy of the effective channel-length extraction method;the behavior of the measurement errors in the least-square method, used twice in the extraction procedure, is studied. It is found that the increased number of data are mainly effective in suppressing the dispersion of the measurement data;these data are also somewhat effective in reducing the actual measurement errors. Based on this result, the actual effective channel-length extraction using experimental m.s.ET data is studied. It is observed in the samples used here that the linear relation between total m.s.ET resistance and design channel length changes in short channel region. It is found in such a case that as many reference m.s.ETs as possible, including both short and long m.s.ETs, should be used.

关键词： m.s.ET channel-length extraction LDD structure

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measuring system for diffusion length of photoactive compound in post-exposure bake process

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ELECTRONICs AND COmmUNICATIONs IN JAPAN PART II-ELECTRONICs 1996年第9期79卷 70-77页

作者： sekiguchi, A sensu, Y matsuzawa, T minami, Y Lithotech Japan Corporation Kawaguchi Japan 332 Received his B.S. degree from Shibaura Institute of Technology in 1982 and joined Japan Chemitech in 1983 where he worked on the development of an electroless Au plating. He joined Sumitomo GCA in 1985 where he was engaged in the development of photoresist application systems and the development of analysis system for photoresist processing. He is currently with Lithotech Japan Corporation. He is a member of the Japan Society of Applied Physics. Graduated from the Aircraft Maintenance Division of Nakanihon Aeronautics in 1985 and joined Sumisho Electronic Systems Inc. the same year. Following the merger of Sumisho Electronic Systems with Sumitomo G.C.A. in 1986 he was transferred to the latter where he worked on the development of an automatic end-point detector as well as analysis systems for development processes and a resist profile simulator. Mr. Sensu has been with Lithotech Japan Corporation since 1993. Received his M.S. degree in Chemical Engineering from Tohoku University in 1975 and joined Central Research Laboratory of Hitachi Ltd. the same year. He received his Ph.D. degree in 1985 from Tohoku University. He was engaged in the development of advanced photolithography processes and simulation technologies. In 1988 he resigned from Hitachi to found Technofront Inc. and then Lithotech Japan Corporation in 1993. Dr. Matsuzawa is a member of the Japan Chemical Society the Japan Society of Applied Physics and IEEE. Received his B.S. degree from Tokyo Denki University in 1979 and then joined Process System Co. There he was involved in field service for GCA Co. USA. He joined Sumitomo GCA Co. in 1983 where he was engaged in the development of photoresist coating and development systems and systems to detect the end-point of photoresist development. He also developed a photoresist development analysis system. He is currently the company executive Lithotech Japan Corporation.

The post-exposure bake (FEB) characteristics of a photoresist can be examined with a method that estimates the diffusion length of a photoactive compound (PAC) in the photoresist FEB process. Diffusion lengths are estimated with development rate measurement equipment using FEB conditions at temperatures of 50 degrees C, 100 degrees C, 110 degrees C, and 120 degrees C. An ultrahigh-resolution i-line photoresist THmR-iP3000 is used in the research. The obtained values are input into 61 photolithography simulator PROLITH/2 to calculate photoresist profiles. Using a 365-nm wavelength, 0.5 NA, and 0.6-coherence factor conditions, resist profiles for a 0.4-mu m line space feature are calculated with varied focus. The simulated results are compared with sEm observations to evaluate the validity of the estimation method;they are found to be substantially consistent with experimental results, thus confirming the validity of the method.

关键词： photoresist development rate diffusion length development parameter focus latitude profile simulation

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scattering parameter estimation accuracy of Root-m.s.C algorithms in electromagnetic wave scattering measurements

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ELECTRONICs AND COmmUNICATIONs IN JAPAN PART II-ELECTRONICs 1996年第5期79卷 106-115页

作者： Yamada, H Yamamoto, K Yamaguchi, Y sengoku, m Faculty of Engineering Niigata University Niigata Japan 950-21 Received his B.S. M.S. and Ph.D. degrees from Hokkaido University Sapporo Japan in 1988 1990 and 1993 respectively all in Electronic Engineering. Since 1993 he has been with Niigata University where he is currently a Lecturer. His current research involves superresolution techniques electromagnetic wave measurements and radar signal processings. Dr. Yamada is a member of the IEEE. Received his B.S. degree from Niigata University Niigata Japan in 1994 in Information Engineering. He is currently in the Master's program in Information Engineering. His current research involves superresolution technique and antenna measurements. Received his B.E. degree in Electronics Engineering from Niigata University in 1976 and his M.E. and Dr. of Eng. degrees from Tokyo Institute of Technology Tokyo Japan in 1978 and 1983 respectively. In 1978 he joined the Faculty of Engineering Niigata University where at present he is a Professor. From 1988 to 1989 he was a Research Associate at the University of Illinois at Chicago. His interests are in the field of propagation characteristics of electromagnetic wave in lossy medium radar polarimetry microwave remote sensing and imaging. Dr. Yamaguchi is a senior member of IEEE and a member of the Japan Society for Snow Engineering. Received his B.E. degree in Electrical Engineering from Niigata University Japan in 1967 and his M.E. and Ph.D. degrees from Hokkaido University in 1969 and 1972 respectively. In 1972 he joined the staff at Hokkaido University as a Research Associate. In 1978 he was an Associate Professor at Niigata University where he is presently a Professor. During 1986–1987 he was a Visiting Scholar at the University of California Berkeley and at the University of Illinois Chicago. His research interests include transmission of information network theory and graph theory. He is a recipient of the Best Paper Award of I.E.I.C.E. in 1992. Dr. Sengoku is a senior member of IEE

An application of the superresolution method for the analysis of the electromagnetic scattering data is expected to be effective for experimental verification of the geometrical optics approximation theory and the analysis of multiple paths. There exist many techniques for the superresolution method. It is desirable to select an appropriate technique based upon the characteristics of the individual algorithms. Among these techniques, the Root-m.s.C method has been proposed;this method enables treatment of the signal attenuating exponentially with respect to frequency. In the modified Root-m.s.C method, arbitrary frequency characteristics can be treated. This paper investigates the estimation accuracy of the scattering center and the attenuation coefficient when the Root-m.s.C method and the modified Root-m.s.C method are applied to the estimation of scattering. With the backscattering data of a conducting sphere, the estimation accuracy of the scattering parameters versus the signal-to-noise ratio (sNR) and the number of snapshots is investigated by computer simulation. As a result, it is found that the estimation accuracy of the modified Root-m.s.C method is much better than that of the conventional Root-m.s.C method in the case of a low sNR and a small number of snapshots. Experimental results are also reported.

关键词： super-resolution Root-m.s.C algorithm modified Root-m.s.C algorithm electromagnetic scattering scattering center creeping wave

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OPTICAL AND sTRUCTURAL-PROPERTIEs OF ANTImONY-DOPED CDs THIN-FILms

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mATERIALs CHEm.s.RY AND physics 1995年第4期39卷 278-283页

作者： DEsHmUKH, LP HOLIKATTI, sG mORE, Bm Department of Physics (Applied Electronics) Shivaji University Centre for P.G. Studies Solapur 413 003 M.S. India

Optical and structural investigations of antimony-doped cadmium.s.lphide thin films prepared by a modified chemical deposition process are described. The samples were prepared in an aqueous medium at a deposition temperature of 85+/-2 degrees C and a pH of around 8.5. The samples were doped with various concentrations of sb3+ in the concentration range 0.005-1 wt.%. measurements of the absorption coefficient in the energy range 1.6-3.5 eV for both Cds and Cds:sb crystalline thin films have been carried out. A careful analysis of the absorption coefficients indicated the crystalline character of the samples studied;a similar diagnosis was obtained from the X-ray and sEm analyses. The absorption coefficient is of the order of 10(4) cm(-1), and the optical energy bandgap decreases with increasing doping concentration, typically from 2.47 to 1.7 eV. The absorption edge shifts towards the higher-wavelength side and becom.s.broader as the doping concentration is increased. The samples are polycrystalline, and the crystallinity increases after doping up to a 0.075 wt.% doping level and decreases thereafter. In both cases the samples consist of phases of cubic and hexagonal structures. Additional peaks corresponding to sb2s3 orthorhombic phases and some other small peaks due to excess Cd and s have also been observed.

关键词： CADmIUm.s.LFIDE THIN FILms ANTImONY OPTICAL PROPERTIEs sTRUCTURAL PROPERTIEs

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Propagation properties of Love wave-type surface-acoustic wave on alpha-quartz

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ELECTRONICs AND COmmUNICATIONs IN JAPAN PART II-ELECTRONICs 1996年第2期79卷 24-30页

作者： Isobe, A Hikita, m Asai, K Central Research Laboratory Hitachi Ltd. Kokubunji Japan 185 (Member) graduated from the Department of Physics Tohoku University in 1986 and completed an M.S. course in 1988. In that year he joined Hitachi Ltd. Presently he is with Hitachi Central Research Laboratory. He has been engaged in research on surface acoustic wave devices. (Member) completed the doctoral program of the Department of Electronic Engineering Hokkaido University in 1977 and remained as a research student. In 1978 he joined Hitachi Ltd. Presently he is a Senior Researcher at Hitachi Central Research Laboratory. He holds a Doctor of Engineering degree. He has been engaged in research on the electromagnetic field analysis boundary value problem of the surface acoustic wave interaction of the acoustic wave and optics high-performance SAW filter high-frequency circuit for satellite communication and mobile communication. In 1981 he received an Academic Promotion Award from I.E.I.C.E. In 1990 he received an IEEE MTT Microwave Prize Award. In 1991 he received a Kanto District Invention Award (from the Invention Society) and in 1993 a Commendation for Research Accomplishment from the Director of Science and Technology Agency. He is a senior member of IEEE. (Member) graduated from the Department of Mechanical Engineering Matsuyama Technical High School in 1984 and joined Hitachi Central Research Laboratory. In 1988 he graduated from the Department of Electronic Engineering Hitachi Keihin Technical School. Since then he has been engaged in research and development of the process technology of magnetic bubble memory and surface acoustic wave devices. Presently he is with the Communication Systems Department.

As a piezoelectric substrate for surface acoustic wave devices, the LsT cut quartz has good temperature characteristics and low propagation loss. However, as the thickness of the metal electrodes on the substrate surface is increased, propagation loss also increases. Further, the electromechanical coupling coefficient is small. In this paper, a cut angle of the quartz substrate is sought that has excellent temperature stability, low propagation loss, and a large electromechanical coupling coefficient in the present of metal electrode films. For the rotated Y-cut substrate in the neighborhood of the LsT cut, the propagating surface acoustic wave (sAW) merle changes from the leaky surface wave to the Love wave-type surface acoustic wave for which. no propagation loss occurs in theory while the electromechanical coupling coefficient increased to 0.5 percent at the maximum if gold is used for the electrodes and the propagation direction of the sAW is shifted from the X axis. This is shown by simulation. By experiment, it is shown that the second-order temperature coefficient is on the same order as that of the sT-cut quartz substrate.

关键词： surface acoustic wave quartz Love wave temperature characteristics

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Optimization of silicide process for sub-0.1-mu m Cm.s.devices

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ELECTRONICs AND COmmUNICATIONs IN JAPAN PART II-ELECTRONICs 1995年第12期78卷 75-81页

作者： Gotoh, K Fushida, A Yamazaki, T Fujitsu Laboratories Ltd. Atsugi Japan 243–01 Ken-ichi Goto:received his B.S. and M.S. degrees in Electronics Engineering from Tohoku University in 1989 and 1991 respectively. In 1991 he joined Fujitsu Laboratories Ltd. Atsugi Japan. He has been engaged in silicide process for subquarter micron CMOS devices. Mr. Goto is a member of the Japan Society of Applied Physics. Tatsuya Yamazaki:received his B.S. and M.S. degrees in Instrument Engineering from Keio University in 1981 and 1983 respectively. In 1983 he joined Fujitsu Laboratories Ltd. Atsugi Japan. He worked on VLSI materials and process especially on low-temperature Si epitaxy. His current research interests are subquarter micron CMOS device processing and physics. Mr. Yamazaki is a member of the Japan Society of Applied Physics. Nonmembers Atsuo Fushida:received his B.S. degree in Chemical Engineering from the Science University of Tokyo in 1988. In 1988 he joined Fujitsu Ltd. Kawasaki Japan. He has been engaged in silicide process for subquarter micron CMOS devices. Mr. Fushida is a member of the Japan Society of Applied Physics.

A silicide process is indispensable to reduction of the parasitic resistance of deep submicron Cm.s.devices. The parasitic resistance degrades the operating speed of ultrafine gates, limiting development of further scale-down Cm.s.devices. However, the conventional silicide process causes many problems, such as agglomeration, junction leakage and thermal instability, and cannot be used for m.s. production of deep submicron semiconductor devices. The limitations of conventional Ti, Pi, Ni, and Co silicide processes are investigated and analyzed, and it is found that a TiN-capped Co silicide process is suitable for fabricating 0.1-mu m Cm.s.devices.

关键词： sub-0.1-mu m CmOs silicide process parasitic resistance

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Reconstruction of magnetic fields by reflection electron tomography

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ELECTRONICs AND COmmUNICATIONs IN JAPAN PART II-ELECTRONICs 1995年第11期78卷 106-114页

作者： matsuda, J Otawa, Y Nomizu, s Member Faculty of Engineering Nagaoka University of Technology Nagaoka Japan 940-21 Jin-ichi Matsuda.:Education: Osaka University B.S. 1962 D.Eng. 1967. Academic appointments: Osaka University Research fellow Nagaoka University of Technology Associate Professor Professor. Research interests: optoelectronic devices in high-frequency electromagnetic fields three-dimensional reconstruction of stray electromagnetic fields medical image analysis. Memberships: Information Processing Society Applied Physics Society of Japan Japan Electron Microscopy Association. Shigeaki Nomizu.:Education: Kogakuin University B.S. 1989 Nagaaoka University of Technology M.S. degree in progress. Industry posts: Soinbaado Industries 1989. Research interests: electron tomography. Memberships: Applied Physics Society of Japan. Nonmembers Yasuhiko Otawa.:Education: Nagaoka University of Technology B.S. 1992 M.S. degree in progress. Research interests: electron tomography.

The trend in magnetic record development is toward ever higher areal storage density. methods for accurate measurement of the magnetic field distribution iri the very small region surrounding the gap of the recording head have been the focus of several recent studies. Using transm.s.ion electron beam tomography, a new reconstruction technique is proposed and applied to measure three-dimensional magnetic stray field extending beyond a commercial magnetic head by a developed measurement system. Results have demonstrated the applicability of this technique for measuring a magnetic stray field of several kGauss with an error of less than 10 percent. With transm.s.ion electron beam tomography, however, it is difficult to measure directly the magnetic field just beyond the gap of a magnetic head. This is because the stronger Lorentz force of the magnetic field on the electron beam causes the election beam to collide with the head surface. A new method, called reflection electron beam tomography, is presented herein to overcome the forementioned limitation in which the electron beams are injected perpendicularly to the surface of a magnetic head and their deflection vectors are measured at the deflection plane set above the head. Our method is tested with a known magnetic field model of a one-turn coil by computer simulation. Results have shown that the magnetic field just beyond the gap of the magnetic head can be estimated with an error of approximately 20 percent.

关键词： measurement of magnetic field electron beam tomography three-dimensional reconstruction computer simulation

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AUTOmATIC VEHICLE ImAGE EXTRACTION BAsED ON sPATIOTEmPORAL ImAGE-ANALYsIs

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sYsTEms AND COmPUTERs IN JAPAN 1995年第12期26卷 71-82页

作者： NAKANIsHI, T sHIO, A IsHII, KI Member NTT Human Interface Laboratories Yokosuka Japan 238 Akb Shio:received his B.S. degree in Applied Physics from Hokkaido University in 1974. He joined NTT Communication Laboratories the same year. He has engaged in the development of optical character readers (OCR) environmental image processing and image recognition. He was a guest researcher of the Electrical Engineering Department Irvine campus of University of California. At present he is a Principal Researcher in Media Application Department NTT Interface Laboratory. He is a member of Institute of Information Processing Japan and of IEEE. Members Ken-ichiro Isbii:received his B.E. and M.S. degrees in 1972 and 1984 respectively from the University of Tokyo and his Ph.D. later. He joined NTT Communication Laboratories in 1984. He had been a guest researcher in the Electrical Engineering Department Purdue University (USA) in 1979 and working on character recognition image processing and optimal character readers. At present he is a Director of the Information Science Department at NTT Human Interface Laboratories. He is a member of Institute of Information Processing Japan and IEEE.

This paper proposes an automatic method of extracting the image of a vehicle moving along a straight road from a sequential video image. The method has been designed to be independent of the type of vehicle and the background, and to obtain an image with minimum defective areas. The image of the vehicle is extracted by analyzing a locus in a spatio-temporal image seen through a slit in a fixed video camera, by updating the background image and superimposing a time-series of the background difference image. The method can extract a full image of various types of vehicles in an arbitrary background with minimum defects, and can separate the images of two vehicles when one crosses in front of the other. The method has been tested successfully with actual traffic (including traffic starting from a traffic light). The results show that the method is practical for smoothly flowing traffic. The method has also been tested successfully for identifying vehicle types.

关键词： ImAGE sEQUENCE ANALYsIs sPATIOTEmPORAL ImAGE VEHICLE IN mOTION VEHICLE CLAssIFICATION BACKGROUND

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A method of measuring moving characteristics of precision mechanical-translation stages using ultrasonic plane waves and applying it to a line-focus-beam acoustic microscopy system

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ELECTRONICs AND COmmUNICATIONs IN JAPAN PART III-FUNDAmENTAL ELECTRONIC sCIENCE 1995年第10期78卷 10-19页

作者： Ono, Y Kushibiki, JI Chubachi, N Department of Electrical Engineering Faculty of Engineering Tohoku University Sendai Japan 980-77 Jun-ichi Kushibiki received his B.S. M.S. and Ph.D. degrees in Electrical Engineering from Tohoku University Sendai Japan in 1971 1973 and 1976 respectively. In 1976 he became a Research Associate at the Research Institute of Electrical Communication Tohoh University. In 1979 he joined the Department of Electrical Engineering Faculty of Engineering Tohoku University where he was an Associate Professor from 1988 to 1993 and became a Professor in 1994. He has been studying ultrasonic metrology especially acoustic microscopy and its applications and established a method of material characterization by line-focus-beam acoustic microscopy. He also has been interested in biological tissue characterization in the higher frequency range applying both bulk and acoustic microscopy techniques. Dr. Kushibiki is a member of the IEEE the Institute of Electronics Information and Communication Engineers of Japan the Society of Japanese Applied Physics the Institute of Electrical Engineers of Japan the Acoustical Society of Japan and the Japan Society of Ultrasonics in Medicine. Members

A method of measuring moving characteristics of precision mechanical-translation stages using ultrasonic plane waves is presented. The moving characteristics are obtained by analyzing the phase variation of ultrasonic waves reflected from a reflector set on the translation stage. The resolution is 4 nm at an ultrasonic frequency of 225 mHz;higher resolution is expected at higher frequencies. The method is demonstrated for a line-focus-beam (LFB) acoustic microscopy system. measurement errors of the phase velocity of leaky surface acoustic waves, caused by the positioning errors of the z-stage, are investigated both theoretically and experimentally. The linear positioning and straightness errors of the z-stage are estimated at 225 mHz and these effects on velocity measurements are successfully removed using the measured moving characteristics.

关键词： mechanical-translation stages moving characteristics ultrasonic plane waves line-focus-beam (LFB) acoustic microscope leaky surface acoustic waves

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