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Advances in Patterning Materials and Processes XLI 2024

作者： Ku, Yejin Kim, Gayoung Kim, Min Seung Lee, Jin-Kyun Kim, Jiho Park, Byeong-Gyu Lee, Sangsul Lee, Seohyeon Jung, Byung Jun Lee, Changhyeon Kim, Hyunseok Hur, Su-Mi Koh, Chawon Nishi, Tsunehiro Kim, Hyun-Woo Program in Environment and Polymer Engineering Inha University Incheon22212 Korea Republic of Department of Polymer Science and Engineering Inha University Incheon22212 Korea Republic of Pohang Accelerator Laboratory Postech Pohang37673 Korea Republic of Department of Materials Science and Engineering University of Seoul Seoul02504 Korea Republic of Department of Polymer Engineering Graduate School Chonnam National University Gwangju61186 Korea Republic of School of Polymer Science and Engineering Chonnam National University Gwangju61186 Korea Republic of Department of Materials Science and Engineering Yonsei University Seoul03722 Korea Republic of Samsung Electronics Co. Ltd. Semiconductor R&d Center Gyeonggi-do 18448 Korea Republic of

ISBN: (纸本)9781510672208

High numerical aperture (NA) EUV lithography is considered as the most-promising candidate for next generation lithography protocol that will play a crucial role in meeting the demand on the enhanced semiconductor performance and productivity. While this technology enables the fabrication of sub-10 nm patterns, the increased NA has posed challenges, such as reduced depth of focus and narrower process margins. To overcome these hurdles, it is essential to apply thinner resist films while ensuring that the resulting small patterns maintain sufficient physical and chemical durability. Moreover, considering that thinner films absorb fewer photons, the resist molecular structure should be designed to compensate sensitivity burdens. Here, an approach has been proposed to enhance sensitivity by accelerating the solubility change of a well-known tinbased nanocluster resist. To accomplish this goal, it is important to increase not only the number of secondary electrons but also reaction sites and promote radical-based chemical reactions. We aimed at experimentally validating this concept by utilizing elements with high EUV absorbance and highly reactive functional groups with tin radicals. As a model resist, we chose a tin-oxo cage material consisting of a divalent cation containing 12 tin atoms and two counter anions. Our findings indicate that the introduction of unsaturated groups capable of building bridging bonds with radicals leads to fast solubility change at a lower exposure dose, thus enhancing sensitivity. This research offers a promising direction for the development of resists tailored for High NA EUV lithography. © COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.

关键词： Tin

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Photocatalytic bio-inspired PDA-RGO/g-C3N4 nanocomposite incorporated PES membrane for removal of environmental antibiotic pollutants

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Journal of Chemical Technology and Biotechnology 2024年第6期99卷 1401-1413页

作者： Govardhanan, B. GokulaKrishnan, S.A. Arthanareeswaran, G. Ashok, M. Chen, Yong-Song Taweepreda, W. Membrane Research Laboratory Department of Chemical Engineering National Institute of Technology Tiruchirappalli Tiruchirappalli India New Generation Materials lab Department of Physics National Institute of Technology Tiruchirappalli Tiruchirappalli India Department of Mechanical Engineering and Advanced Institute of Manufacturing with High-tech Innovations National Chung Cheng University Chiayi County Taiwan Polymer Science Program Division of Physical Science Faculty of Science Prince of Songkla University Hat-Yai Thailand

BACKGROUND: Membrane technology makes it more suitable for the treatment of environmental polluted organic wastewater. Membrane fouling is one of the major concerns in commercial membranes. To overcome this issue, photocatalytic nanomaterials are embedded into the membrane to enhance its surface nature and reusability. In this investigation, polydopamine functionalized graphene oxide (PDA-RGO), graphite carbon nitride (g-C3N4) and PDA-RGO/g-C3N4 nanomaterials were incorporated within polyethersulfone membrane fabricated via a phase inversion technique. These as-prepared membranes’ functional groups and surface morphologies were investigated by Fourier transform infrared (FTIR) spectroscopy, atomic force microscopy (AFM) and field emission electron microscopy (FESEM). These as-prepared membranes were investigated for photocatalytic activity under visible-light-driven photodegradation by environmental pollutants such as Rhodamine B (RhB) and Norfloxacin (NOR). RESULTS: Compared with pristine PES membrane, the PDA-RGO/g-C3N4-PES nanocomposite membrane showed higher photocatalytic activity for Rhodamine B 94.6% and Norfloxacin 96.8%, also reached greater water flux 189 L m−2 h−1. Therefore, the bio-inspired nanocomposite-modified PDA-RGO/g-C3N4 photocatalytic membrane could have huge potential in processing environmentally polluted water. CONCLUSIONS: PDA-RGO/g-C3N4-PES nanocomposite membrane improved the membrane hydrophilicity, water flow, anti-fouling performance, rejection studies and photocatalytic degradation than the pristine membrane. The synergistic result of PDA-RGO and g-C3N4 exhibits better photodegradation efficiency of the membrane towards environmental pollutants. © 2024 Society of Chemical Industry (SCI). © 2024 Society of Chemical Industry (SCI).

关键词： Nanocomposites

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Positive-tone Tin-oxo Nanoclusters for Extreme UV lithography 42

Positive-tone Tin-oxo Nanoclusters for Extreme UV lithograph...

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Advances in Patterning Materials and Processes XLII

作者： Kim, Gayoung Ku, Yejin Jeon, Subin Lee, Jin-Kyun Lee, Seohyun Jung, Byung Jun Lee, Sung-Il Ryu, Choonghan Park, Kangho Jung, Yun Lim Jeong, Changyoung Choi, Jin Program in in Environment and Polymer Engineering Inha University Incheon22212 Korea Republic of Program in Semiconductor Convergence Inha University Incheon22212 Korea Republic of Department of Polymer Science and Engineering Inha University Incheon22212 Korea Republic of Department of Materials Science and Engineering University of Seoul Seoul02504 Korea Republic of Samsung Electronics Co. Ltd. Semiconductor R&D Center Suwon18448 Korea Republic of

ISBN: (纸本)9781510686427

In this study, we propose a strategy to achieve positive metal oxide resists (pMORs) based on tin-oxo nanoclusters (TOCs) for extreme ultraviolet (EUV) lithography in high-performance semiconductor integrated circuit manufacturing. TOC possesses Lewis acidic properties and becomes more strongly acidic upon ligand dissociation when exposed to high-energy radiation, such as electron beam (e-beam) and EUV. During the subsequent development process using an aqueous solution of tetramethylammonium hydroxide (TMAH), a Lewis base, the exposed regions undergo Lewis acid-base interactions, leading to increased hydrophilicity. Ultimately, this results in enhanced solubility, enabling the formation of positive-tone patterns. To address the limitations of TOCs, particularly in terms of process margin and chemical stability, we mixed TOCs with small organic molecules containing phenolic hydroxyl groups, which act as Lewis bases. This modification effectively mitigated the shortcomings of TOCs. A TOC formulation containing 10% dendritic polyphenol (DPP) exhibited an improved dissolution contrast while simultaneously enhancing chemical stability. Using this in EUV lithography, we successfully achieved high resolution positive-tone patterns with a line width of 13 nm. © 2025 SPIE.

关键词： Extreme ultraviolet lithography

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Ethanol steam reforming over Ni/ZSM-5 nanosheet for hydrogen production

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Chinese Journal of Chemical engineering 2024年第3期67卷 247-256页

作者： Porapak Suriya Shanshan Xu Shengzhe Ding Sarayute Chansai Yilai Jiao Joseph Hurd Daniel Lee Yuxin Zhang Christopher Hardacre Prasert Reubroycharoen Xiaolei Fan Department of Chemical Engineering School of EngineeringThe University of ManchesterManchester M139PLUnited Kingdom Program of Petrochemistry and Polymer Science Faculty of ScienceChulalongkorn UniversityBangkok10330Thailand Shenyang National Laboratory for Materials Science Institute of Metal ResearchChinese Academy of SciencesShenyang 110016China Liaoning Academy of Materials Shenyang 110167China Center of Excellence in Catalysis for Bioenergy and Renewable Chemicals(CBRC) andDepartment of Chemical TechnologyFaculty of ScienceChulalongkorn UniversityBangkok 10330Thailand Nottingham Ningbo China Beacons of Excellence Research and Innovation Institute University of Nottingham Ningbo ChinaNingbo315100China

Compared to reforming reactions using hydrocarbons,ethanol steam reforming(ESR)is a sustainable alternative for hydrogen(H_(2))production since ethanol can be produced sustainably using *** work explores the catalyst design strategies for preparing the Ni supported on ZSM-5 zeolite catalysts to promote ***,two-dimensional ZSM-5 nanosheet and conventional ZSM-5 crystal were used as the catalyst carriers and two synthesis strategies,i.e.,in situ encapsulation and wet impregnation method,were employed to prepare the *** on the comparative characterization of the catalysts and comparative catalytic assessments,it was found that the combination of the in situ encapsulation synthesis and the ZSM-5 nanosheet carrier was the effective strategy to develop catalysts for promoting H_(2) production via ESR due to the improved mass transfer(through the 2-D structure of ZSM-5 nanosheet)and formation of confined small Ni nanoparticles(resulted via the in situ encapsulation synthesis).In addition,the resulting ZSM-5 nanosheet supported Ni catalyst also showed high Ni dispersion and high accessibility to Ni sites by the reactants,being able to improve the activity and stability of catalysts and suppress metal sintering and coking during ESR at high reaction ***,the Ni supported on ZSM-5 nanosheet catalyst prepared by encapsulation showed the stable performance with~88% ethanol conversion and~65% H_(2) yield achieved during a 48-h longevity test at 550-C.

关键词： ZSM-5 nanosheet In situ encapsulation Ni catalyst Ethanol steam reforming Hydrogen production

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Assembly of exfoliated α-zirconium phosphate nanosheets:Mechanisms and versatile applications

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Aggregate 2022年第4期3卷 41-60页

作者： Hao Ding Abbas Ahmed Kuangyu Shen Luyi Sun Polymer Program Institute of Materials ScienceUniversity of ConnecticutStorrsConnecticutUSA Department of Chemical and Biomolecular Engineering University of ConnecticutStorrsConnecticutUSA Department of Biomedical Engineering University of ConnecticutStorrsConnecticutUSA

α-Zirconium phosphate(Zr(HPO_(4))_(2)⋅H_(2)O,α-ZrP)is an inorganic layered *** the first report of crystallineα-ZrP in 1964,thanks to its simple synthesis and unique physiochemical properties,α-ZrP has found widespread application in many fields including mechanical reinforcing,barrier improvement,flame retardancy,anticorrosion,catalysis,environment,energy,and *** of the ease of exfoliation ofα-ZrP to obtain single-layer nanosheets,as well as its rich surface chemistry thanks to the high density of orderly arranged surface acidic hydroxyl groups,α-ZrP single-layer nanosheets are ideal building blocks for self-assembly or assembly with other *** assembly ofα-ZrP nanosheets could form a randomly dispersed structure(isotropic),roughly ordered structure(nematic),or highly ordered structure(smectic)within liquid colloids or solid hybrids(including hydrogels).Thanks to the combination of the unique structures and the novel functions of the components,the assembled materials have found a wide verity of applications due to their excellent *** this article,the methods to synthesizeα-ZrP,the approaches and mechanisms to exfoliateα-ZrP,and the strategies to assembleα-ZrP nanosheets to form various structures,as well as the applications of the assembled materials are *** emerging prospects ofα-ZrP nanosheets as a key material in next-generation functional applications are envisioned.

关键词： application assembly exfoliation nanosheets α-zirconium phosphate

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Sensitivity improvement of fluoroalkylated EUV resist with electron-rich vinyl units 41

Sensitivity improvement of fluoroalkylated EUV resist with e...

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Advances in Patterning Materials and Processes XLI 2024

作者： Kim, Gayoung Ku, Yejin Lee, Jin-Kyun Kim, Jiho Park, Byeong-Gyu Lee, Sangsul Jang, Yu Ha Jung, Byung Jun Koh, Chawon Nishi, Tsunehiro Kim, Hyun-Woo Program in Environment and Polymer Engineering Inha University Incheon22212 Korea Republic of Department of Polymer Science and Engineering Inha University Incheon22212 Korea Republic of Pohang Accelerator Laboratory Postech Pohang37673 Korea Republic of Department of Materials Science and Engineering University of Seoul Seoul02504 Korea Republic of Samsung Electronics Co. Ltd. Semiconductor R&d Center Suwon18448 Korea Republic of Department of Materials Science and Engineering Yonsei University Seoul03722 Korea Republic of

ISBN: (纸本)9781510672208

In this study, we present a method to enhance the sensitivity of fluorinated EUV resists by leveraging the rapid coupling reaction between electrophilic carbon radicals and electron-rich alkenes. To validate the impact of the vinyl groups, DVS-HNF was synthesized by introducing fluorinated alkyl chains and silyl vinyl functional groups into the model compound. Additionally, TMS-HNF and EDMS-HNF, which do not contain a vinyl moiety, were synthesized for comparison. To evaluate the patterning properties of the three materials, e-beam lithography experiments were conducted, resulting in the formation of negative-tone patterns for all three materials. Comparing sensitivities, DVS-HNF with two vinyl moieties exhibited the most excellent sensitivity, confirming the effective collaboration between fluorinated alkyl radicals and vinyl groups. After performing an EUV lithography experiment on DVS-HNF, it was confirmed that a 30 nm negative-tone pattern was successfully formed with excellent sensitivity. These results substantiate the potential of the single-component molecular resist for high performance EUV lithography. © COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.

关键词： Extreme ultraviolet lithography

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Smart Soft Materials with Multiscale Architecture and Dynamic Surface Topographies

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Accounts of Materials Research 2022年第11期3卷 1115-1126页

作者： Songshan Zeng Andrew T.Smith Kuangyu Shen Luyi Sun Polymer Program Institute of Materials Science and Department of Chemical&Biomolecular EngineeringUniversity of ConnecticutStorrsConnecticut 06269United StatesPresent Address:Macao Institute of Materials Science and Engineering(MIMSE)Zhuhai MUST Science and Technology Research InstituteFaculty of Innovation EngineeringMacao University of Science and TechnologyTaipa999078MacaoChina Polymer Program Institute of Materials Science and Department of Chemical&Biomolecular EngineeringUniversity of ConnecticutStorrsConnecticut 06269United States

CONSPECTUS:Smart soft materials have one or more characteristics that can be significantly altered in convertible fashions by external stimuli,such as light,moisture,mechanical force,temperature,electric/magnetic fields,pH,and so *** materials can lead to widespread application in multifunctional smart ***,various smart soft materials have been developed under the inspiration of the intriguing multiscale structures,adaptive mechanisms,and dynamic responses of natural life,with an aim to further design advanced material systems with novel,intriguing,and unprecedented properties.

关键词： Smart properties. Dynamic

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Insightful analysis of physical properties, kinetics, absorption capacity, and regeneration heat duty of monoethanolamine and N-methyl-4-piperidinol blended solvent in post-combustion carbon capture

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Environmental science and Pollution Research 2024年第40期31卷 52868-52885页

作者： Apaiyakul, Rattanaporn Khuenkaew, Wachiramon Sirirathomsud, Ornicha Boonprasop, Sutthichai Liu, Heilei Gao, Hongxia Liang, Zhiwu Tontiwachwuthikul, Paitoon Sema, Teerawat Petrochemistry and Polymer Science Program Faculty of Science Chulalongkorn University Pathumwan Bangkok10330 Thailand Department of Chemical Engineering Faculty of Engineering Mahidol University Nakhon Pathom73170 Thailand Department of Biotechnology Faculty of Science Mahidol University Bangkok10400 Thailand School of Chemistry and Chemical Engineering Beijing Institute of Technology Beijing100081 China Provincial Hunan Key Laboratory for Cost-Effective Utilization of Fossil Fuel Aimed at Reducing CO₂ Emissions College of Chemistry and Chemical Engineering Hunan University Changsha410082 China Faculty of Engineering and Applied Science University of Regina ReginaSKS4S 0A2 Canada Department of Chemical Technology Faculty of Science Chulalongkorn University Pathumwan Bangkok10330 Thailand

In this study, the high potential tertiary N-methyl-4-piperidinol or MPDL (0.25–1.00 M) was blended with 5 M monoethanolamine (MEA) to formulate 5.25–6.00 M MEA-MPDL solvent and compare with the benchmark 5 M MEA. It was found that the density and the Henry’s constant slightly decreased, while the viscosity increased as the MPDL concentration in the blend increased. Even though the equilibrium CO2-loaded viscosity considerably increased (by 34.3–40.2%) as the MPDL content increased, it was still in a great operating region of less than 10 mPa.s. Experimental overall reaction kinetics constant (kov) was well corresponding with the zwitterion mechanism of MEA and the base-catalyze hydration mechanism of MPDL based absorption kinetics model, with %AAD of 0.56%. Interestingly, an addition of MPDL into 5 M MEA slightly enhanced kov (1.2–3.3% increment) and considerably favored absorption capacity (13–31% elevation), and regeneration heat duty (28–47% reduction), respecting 5 M MEA. The proposed strategic blending can maintain the overall solvent reactivity at the same level of the benchmark, while obviously increase the absorption capacity and largely reduce the regeneration heat duty. This highly favors a solvent upgrading for the existing 5 M MEA based CO2 capture plant. According to the recent data, 5 M MEA + 1.00 M MPDL was suggested. Since the blend was formulated at high concentration, its corrosiveness should also be considered. Graphical abstract: (Figure presented.) © The Author(s), under exclusive licence to Springer-Verlag GmbH Germany, part of Springer Nature 2024.

关键词： Carbon capture and utilization

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Inverse Hall-Petch effect in nanocrystalline ice predicted by machine-learned coarse-grained molecular simulations

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Journal of Micromechanics and Molecular Physics 2023年第1期8卷 1-10页

作者： Chen, Guang Tao, Lei Kröger, Martin Li, Ying Department of Mechanical Engineering University of Connecticut Storrs 06269 CT United States Department of Materials Polymer Physics Eth Zürich Zürich CH-8093 Switzerland Department of Mechanical Engineering Institute of Materials Science University of Connecticut Storrs 06269 CT United States Polymer Program Institute of Materials Science University of Connecticut Storrs 06269 CT United States

We study the grain-size effect on mechanical behaviors of polycrystalline ice at nanoscale through large-scale molecular dynamics simulations, enabled by an accurate and efficient machine-learned coarse-grained water model [H. Chan, M. J. Cherukara, B. Narayanan, T. D. Loeffler, C. Benmore, S. K. Gray and S. K. Sankaranarayanan. Machine learning coarse grained models for water. Nature Communications 10(1), p. 379, 2019]. Polycrystalline ice systems with different grain sizes in the range of 5∼30 nm are systematically investigated through uniaxial tensile tests. Simulation results reveal that Young's modulus and yield strength increase as the grain size increases, leading to an inverse Hall-Petch effect in nanocrystalline ice. Such an observation is significantly different from the conventional Hall-Petch effect in polycrystalline ice observed by experiments at millimeter scale. The deformation behavior suggests that grain boundaries (GBs), rather than grain interiors, play the active role in accommodating external loading in nanocrystalline ice. Further void analysis of nanocrystalline ice during deformation reveals that nanocrack initiates and propagates along GBs and eventually leads to failure of systems with larger grain sizes (≥20nm), yielding a sudden drop in the stress-strain curve. While for systems with smaller grain sizes (≤15nm), only extensive plastic deformation is presented without significant void growth. Our simulation results demonstrate that the GB sliding is the governing mechanism for the inverse Hall-Petch effect observed in nanocrystalline ice. © 2023 World Scientific Publishing Company.

关键词： grain boundary inverse Hall-Petch effect molecular dynamics simulation Polycrystalline ice water model

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High-performance solid-solution potassium-ion intercalation mechanism of multilayered turbostratic graphene nanosheets

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Journal of Energy Chemistry 2022年第4期31卷 814-823页

作者： Jiae Um Seung Uk Yoon Hoseong Kim Beom Sik Youn Hyoung-Joon Jin Hyung-Kyu Lim Young Soo Yun Program in Environmental and Polymer Engineering Inha Universityncheon 22212 South Korea Department of Polymer Science and Engineering Inha UniversityIncheon 22212South Korea Division of Chemical Engineering and Bioengineering Kangwon National University Chuncheon Gangwon-do 24341 South Korea KU-KIST Graduate School of Converging Science and Technologyea University 145 Anam-roSeongbuk-guSoul02841 South Korea Department of Integrative Energy Engineering 145 Anam-roSongbuk-guKorea UniversitySeoul 02841 South Korea

The solid-solution reaction between an alkali cation and an active host material is known as a singlephase redox mechanism,and it is typically accompanied by a continuous voltage *** is distinct from the typical alkali cation intercalation reaction at an equivalent site of the active host material,which exhibits a voltage ***,we report an unusual solid-solution potassium-ion intercalation mechanism with a low-voltage plateau capacity on multilayered turbostratic graphene nanosheets(T-GNSs).Despite the disordered graphitic structure with a broad range of d-spacings(3.65–4.18À),the T-GNSs showed a reversible plateau capacity of~200 m A h g^(-1),which is higher than that of a well-ordered graphite nanoplate(~120 m A h g^(-1)).In addition,a sloping capacity of~220 m A h g^(-1)was delivered with the plateau capacity,and higher rate capabilities,better reversibility,and a more stable cycling performance were confirmed on the turbostratic ***-principles calculations suggest that the multitudinous lattice domains of the T-GNSs contain diverse intercalation sites with strong binding energies,which could be the origin of the high-performance solid-solution potassium-ion intercalation behavior when the turbostratic graphene stacks have a d-spacing smaller than that of equilibrium potassium–graphite intercalation compounds(5.35À).

关键词： Turbostratic graphite Graphene nanosheet Defective carbon Anode Potassium-ion batteries

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