The Schottky barriers that forms on the interface between aluminum and organic semiconductor of polymer heterojunction photodiodes based on poly(3-hexylthiophene): [6,6]-phenyl-C16-butyric acid methylester blend, has ...
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We investigated the data transmission performance of indium antimonide (InSb) nanowires (NWs) synthesized on InSb (100) substrate using chemical vapor deposition (CVD) having diameters of 20 nm and below. The results ...
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We investigated the data transmission performance of indium antimonide (InSb) nanowires (NWs) synthesized on InSb (100) substrate using chemical vapor deposition (CVD) having diameters of 20 nm and below. The results indicate that the data transmission performance of NWs suffer from low mobility values on the order of 10-to-15 cm2V-1s-1 because of the scattering due to their small diameters, crystal defects and oxidation occurs during growth and cooling. The 20 nm NWs can sustain data rates up to 5 mega bits per second (Mbps) without any impedance matching and de-embedding of the parasitic parameters coming from the measurement system with a bit error rate (BER) level of 10-8. The data rate is directly proportional to the diameter of the NWs.
The Schottky barriers that forms on the interface between aluminum and organic semiconductor of polymer heterojunction photodiodes based on poly(3-hexylthiophene): [6,6]-phenyl-C61-butyric acid methylester blend, has ...
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The Schottky barriers that forms on the interface between aluminum and organic semiconductor of polymer heterojunction photodiodes based on poly(3-hexylthiophene): [6,6]-phenyl-C61-butyric acid methylester blend, has been investigated according to Mott-Schottky curves. We focused on the effect of light intensity on the Schottky barrier widths and I-V characteristics of the devices. Comparison of the mathematical models and experimental data measured under different light intensities indicate a dependency of Schottky barrier to the light intensity.
Graphene reveals many extraordinary properties including extremely high room temperature carrier mobility and intrinsic thermal conductivity. Understanding how to controllably modify graphene’s properties is essentia...
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Graphene reveals many extraordinary properties including extremely high room temperature carrier mobility and intrinsic thermal conductivity. Understanding how to controllably modify graphene’s properties is essential for its proposed applications. Here we report on a method for tuning the electrical properties of graphene via electron beam irradiation. It was observed that single-layer graphene is highly susceptible to the low-energy electron beams. We demonstrated that by controlling the irradiation dose one can change, by desired amount, the carrier mobility, shift the charge neutrality point, increase the resistance at the minimum conduction point, induce the “transport gap” and achieve current saturation in graphene. The change in graphene properties is due to defect formation on the graphene surface and in the graphene lattice. The changes are reversible by annealing until some critical irradiation dose is reached.
Thin III-V nitride semiconductors fidms are commonly prepared using metalorganic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE). These methods often require high temperatures (800–1000°C) for...
Thin III-V nitride semiconductors fidms are commonly prepared using metalorganic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE). These methods often require high temperatures (800–1000°C) for the films to grow epitaxially. In the present work, we deposited AlxIn1−xN films on Si substrates by reactive magnetron sputttering method at low substrate temperature. The properties of the films have been studied by RBS, x-ray diffraction, and optical measurements. The AlxIn1−xN films deposited at room temperature were confirmed to be crystalline by x-ray diffraction. Band gap energies of our AlxIn1−xN alloys varies from 1.9 ev to 4.2 ev The bandgap energy vs. lattice constant curve was constructed and confirmed to bow downwards.
One risk factor associated with breast cancer is tissue or mammographic density which is directly correlated with the stiffness of the tissue. We undertook a study of mammary gland cells and their interactions with th...
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Enhanced rates of oxide growth have been observed on silicon when exposed to high-energy x-ray irradiation. This observed effect could potentially be utilized for remote total ionizing dose-sensing applications.
Enhanced rates of oxide growth have been observed on silicon when exposed to high-energy x-ray irradiation. This observed effect could potentially be utilized for remote total ionizing dose-sensing applications.
We report on how to increase transmittance of a 0.2 mm thick polycarbonate (PC) film by periodic subwavelength anti-reflection structures in the visible spectral range. Subwavelength anti-reflection structures like mo...
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Thin film transistors fabricated using Low Temperature Polycrystalline Silicon (LTPS) have several well-known advantages over those made with amorphous Silicon: higher electron mobility, smaller size, higher speed. Ho...
Thin film transistors fabricated using Low Temperature Polycrystalline Silicon (LTPS) have several well-known advantages over those made with amorphous Silicon: higher electron mobility, smaller size, higher speed. However, LTPS has not been widely adopted due to the relatively high cost and low yield of the process relative to a-Si. We have investigated a laser annealing process that offers an improvement for both throughput and yield when compared to existing processes. The process uses a very narrow laser beam (∼5 microns) at high repetition rates to create large poly-Si crystals via lateral growth. The beam length is long enough to allow the substrate to be scanned in a single pass, resulting in better uniformity without any seams seen in multi-pass techniques. In this presentation, we will present results from a prototype system used to validate the critical elements of the process.
We investigated the electrical characteristics and digital data transmission performance few-layer graphene ribbons grown by chemical vapor deposition. Graphene ribbons having a mobility of 2,180 cm2V−1s−1 can sustain...
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We investigated the electrical characteristics and digital data transmission performance few-layer graphene ribbons grown by chemical vapor deposition. Graphene ribbons having a mobility of 2,180 cm2V−1s−1 can sustain data rates up to 50 megabits per second at 1.5 µm length, thus the bandwidth is inversely proportional to resistance caused by defects in the graphene layers. Improving the graphene mobility to highest measured values (~200,000 cm2V−1s−1) and using structures with multiple coplanar transmission lines in parallel could carry the bandwidth beyond the gigabits per second level.
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