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检索条件"机构=R&D Material and Technology Development"
1299 条 记 录,以下是1121-1130 订阅
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Optical Burst Switching Node with Sub-millisecond Granularity Equipped with Agile Tunable Wavelength Converter and Waveguide Amplifier
Optical Burst Switching Node with Sub-millisecond Granularit...
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32nd European Conference on Optical Communication (ECOC 2006),vol.4
作者: r. Inohara K. Nishimura Y. Horiuchi M. Usami A. Al Amin M. Takenaka K. Shimizu T. Kagimoto T. Kurobe A. Kasukawa H. Arimoto S. Tsuji Y. Kondo M. Ono J. Kageyama N. Sugimoto I. Ogura T. Hatta H. Onaka Y. Nakano KDD Research and Development Laboratories Inc. Fujimino Saitama Japan KDDI R&D Laboratories Inc. Saitama Japan RCAST the University of Tokyo Optoelectronic Industry and Technology Development Association (OITDA) RCAST the University of Tokyo Japan The Furukawa Electric Co. Ltd. Japan 4: Hitachi Ltd. Japan 5: Asahi Glass Co. Ltd. Japan 6: NEC Corporation Japan 7: Mitsubishi Electric Corporation Japan Fujitsu Laboratories Limited Japan
An optical switching node with sub-millisecond granularity is demonstrated. The node is equipped with shared wavelength converter for contention resolution with microsecond tuning speed and compact gain block for loss... 详细信息
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Low-temperature and rapid solid-state synthesis of YAG:Ce powders using oxides with narrow particle size distribution
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physica status solidi c 2006年 第8期3卷
作者: Toshihiro Moriga Takashi Kunimoto Yuta Sakanaka Tatsuro Yoshida Kei-ichiro Murai Masashi Mori Eisaku Suda Department of Chemical Science and Technology Faculty of Engineering The University of Tokushima 2-1 Minami-Josanjima Tokushima 770-8506 Japan Department of Nano Material Bio Engineering Tokushima Bunri University 1314-1 Shido Sanuki Kagawa 769-2193 Japan Central Research Institute of Electric Power Industry 2-6-1 Nagasaka Yokosuka Kanagawa 240-0196 Japan R&D Department Anan-Kasei Co. Ltd. 210-51 Ogata Anan Tokushima 774-0022 Japan
We applied a new precipitation technique to the syntheses of CeO 2 and Y 2 O 3 as starting oxides for YAG:Ce powders. This technique can be characterized by usage of NH 4 HCO 3 as a precipitating agent and by aging of... 详细信息
来源: 评论
New architecture of realizing seamless connectivity and cooperative control for home network systems
New architecture of realizing seamless connectivity and coop...
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IEEE International Symposium on Circuits and Systems (ISCAS)
作者: H. Ikebe K. Ogawa H. Takernura Y. Hatayama Digital Systems Development Center Technology R&D Headquarters SANYO Electric Co. Ltd Japan
This paper proposes a new home network architecture for realizing flexible scalability and seamless connectivity and cooperative control. In a home, there are devices which have varying processing power so these devic... 详细信息
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Full Hd 1920 × 1080 Pixel digital d-ILA™ Microdisplay Projector technology
Full HD 1920 × 1080 Pixel Digital D-ILA™ Microdisplay Proj...
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SMPTE Technical Conference
作者: S. Shimizu S. Nakagaki K. doi W.P. Bleha Victor Company of Japan Ltd Technology Development Division Yokosuka Japan JVC North America R&D Center Cypress CA 90630
JVC1 has developed a fully digital drive d-ILA LCOS microdisplay device, which has a native resolution of full Hd (1920 times 1080 pixels) and contrast ratio greater than 5000:1. The new devices have been combined in ...
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Microcell urban propagation channel analysis using measurement data
Microcell urban propagation channel analysis using measureme...
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IEEE Conference on Vehicular technology (VTC)
作者: M. Ghoraishi J.-i. Takada T. Imai Department of International Development Engineering Tokyo Institute of Technology Tokyo Japan R&D Center NTT DoCoMo Inc. Kanagawa Japan
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Magnetocaloric effects and magnetic properties in intermetallic compounds La(Fe/sub 1-x-y/Co/sub x/Si/sub y/)/sub 13/
Magnetocaloric effects and magnetic properties in intermetal...
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International Conference on Magnetics (INTErMAG)
作者: A.T. Saito H. Tsuji T. Kobayashi Environmental Technology Laboratory Corporate Research and Development Center Toshiba Corporation Kawasaki Japan Corporate R&D Center Environmental Technology Laboratory Saiwai-ku Japan
The effect of Co substitution on magnetocaloric effects and magnetic properties of La(Fe/sub 1-x-y/Co/sub x/Si/sub y/)/sub 13/ was described. X-ray diffraction and magnetization measurements were performed on the samp... 详细信息
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Quality assured mass productive 1.6V operational 0.18 /spl mu/m 1T1C FrAM embedded smart card with advanced integration technologies against defectives
Quality assured mass productive 1.6V operational 0.18 /spl m...
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International Electron devices Meeting (IEdM)
作者: J.-H. Kim Y.M. Kang J.H. Park H.J. Joo S.K. Kang d.Y. Choi H.S. rhie B.J. Koo S.Y. Lee H.S. Jeong Kinam Kim Technology Development 2 Team Semiconductor R&D CenterMemory Division Samsung Electronics Company Limited Yongin si Kyunggi South Korea
We have made great progress for mass production of a highly reliable 1.6V, 0.18 mum 1T1C FrAM embedded smart card. For mass production, our device has to pass standard qualification tests on the package level. These c... 详细信息
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Single stress liner for both NMOS and PMOS current enhancement by a novel ultimate spacer process
Single stress liner for both NMOS and PMOS current enhanceme...
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International Electron devices Meeting (IEdM)
作者: Y.C. Liu J.W. Pan T.Y. Chang P.W. Liu B.C. Lan C.H. Tung C.H. Tsai T.F. Chen C.J. Lee W.M. Wang Y.A. Chen H.L. Shih L.Y. Tung L.W. Cheng T.M. Shen S.C. Chiang M.F. Lu W.T. Chang Y.H. Luo d. Nayak d. Gitlin H.L. Meng C.T. Tsai Central R&D Exploratory Technologies Division United Microelectronics Corporation Limited Taiwan Foundry Group CMOS Technology Development Xilinx Inc. San Jose CA USA
For the first time, 75% and 7% drive current improvement is simultaneously achieved in both N/PMOS by adopting ultimate spacer process (USP) with a single stress liner. High out-of-plane stress in the channel accounts... 详细信息
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S-rCAT (sphere-shaped-recess-channel-array transistor) technology for 70nm drAM feature size and beyond
S-RCAT (sphere-shaped-recess-channel-array transistor) techn...
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Symposium on VLSI technology
作者: J.V. Kim H.J. Oh d.S. Woo Y.S. Lee d.H. Kim S.E. Kim G.W. Ha H.J. Kim N.J. Kang J.M. Park Y.S. Hwang d.I. Kim B.J. Park M. Huh B.H. Lee S.B. Kim M.H. Cho M.Y. Jung Y.I. Kim C. Jin d.W. Shin M.S. Shim C.S. Lee W.S. Lee J.C. Park G.Y. Jin Y.J. Park Kinam Kim Samsung Electronics Co. Yongin-City Kyunggi-Do KOREA Advanced Technology Development Semiconductor Research and Development Division CAE Samsung Electronics Company Limited Yongin si Gyeonggi South Korea Advanced Technology Development Semiconductor R&D Division CAE Advanced Technology Development Semiconductor Research and Development Division Process Technology Team Samsung Electronics Company Limited Yongin si Gyeonggi South Korea Process Technology Team
For the first time, S-rCAT (sphere-shaped-recess-channel-array transistor) technology has been successfully developed in a 2Gb density drAM with 70nm feature size. It is a modified structure of the rCAT (recess-channe... 详细信息
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Effective dopant Analysis for the High Performance Poly(3-Hexylthiophene) Field-Effect Transistors
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MrS Online Proceedings Library 2005年 第1期871卷 1-6页
作者: Shinichi Kawamura Manabu Yoshida Satoshi Hoshino Toshihide Kamata R&D Center RICOH 16-1 Shinei-cho Tsuzuki-ku Yokohama Japan Optoelectronic Industry and Technology Development Association (OITDA) Sekiguchi Bunkyo-ku Tokyo Japan National Institute of Advanced Industrial Science and Technology 1-1-1 Higashi Tsukuba Ibaraki Japan
The relationship between impurity species included in regioregular poly(3-hexylthiophene) (P3HT) and the field effect transistors (FETs) property was investigated. P3HT synthesized by the rieke method contained only Z...
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