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检索条件"机构=R&D Materials and Technology Development"
2778 条 记 录,以下是2561-2570 订阅
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Writing current reduction for high-density phase-change rAM
Writing current reduction for high-density phase-change RAM
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International Electron devices Meeting (IEdM)
作者: Y.N. Hwang S.H. Lee S.J. Ahn S.Y. Lee K.C. ryoo H.S. Hong H.C. Koo F. Yeung J.H. Oh H.J. Kim W.C. Jeong J.H. Park H. Horii Y.H. Ha J.H. Yi G.H. Koh G.T. Jeong H.S. Jeong Kinam Kim Advanced Technology Development Semiconductor R&D Division Samsung Electronics Company Limited Yongin si Gyeonggi South Korea Process Development Semiconductor R&D Division Samsung Electronics Company Limited Yongin si Gyeonggi South Korea
By developing a chalcogenide memory element that can be operated at low writing current, we have demonstrated the possibility of high-density phase-change random access memory. We have investigated the phase transitio... 详细信息
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Carbon Nanofiber reinforced Composites for Enhanced Conductivity, Strength, and Tensile Modulus
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MrS Online Proceedings Library 2003年 第1期733卷 1-5页
作者: Gary G. Tibbetts Ioana C. Finegan Choongyong Kwag Materials and Processes Laboratory General Motors R&D Center Warren USA Industrial and Engineering Technology Central Michigan University Mount Pleasant USA
Carbon nanofibers of diameter 200 nm may be used as an additive to thermoplastics for applications requiring electrical conductivity and enhanced mechanical properties. The electrical properties of nanofiber in thermo...
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Performance evaluation of a mesh optical burst switched network with tunable lasers and tunable wavelength converters
Performance evaluation of a mesh optical burst switched netw...
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International Conference on Telecommunications (ConTEL)
作者: E. Zouganeli r.O.E. Andreassen r.B. Haugen A. Solem B. Feng A. Sudboe N. Stol B.E. Helvik P.J. Emstad Telenor Research and Development Fornebu Norway Telenor R&D Fornebu Norway Department of Telematics Norwegian University of Science and Technology Trondheim Norway
This paper evaluates the performance of a mesh optical burst switched (OBS) network that implements tunable lasers and tunable wavelength converters to realize the optical label setting and optical label swapping func... 详细信息
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An outstanding and highly manufacturable 80nm drAM technology
An outstanding and highly manufacturable 80nm DRAM technolog...
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International Electron devices Meeting (IEdM)
作者: H.S. Kim d.H. Kim J.M. Park Y.S. Hwang M. Huh H.K. Hwang N.J. Kang B.H. Lee M.H. Cho S.E. Kim J.Y. Kim B.J. Park J.W. Lee d.I. Kim M.Y. Jeong H.J. Kim Y.J. Park Kinam Kim Advanced Technology Development Team Semiconductor R&D Center Device Solution Network Samsung Electronics Company Limited Yongin si Gyeonggi South Korea
For the first time, fully working 512 Mb drAMS have been developed successfully using an 80 nm drAM technology, which is the smallest feature size in drAM technology ever reported. With an ArF lithography, recess-chan... 详细信息
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Characterizations of shock-compacted Nd-system superconductor particles
Characterizations of shock-compacted Nd-system superconducto...
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International Conference on Properties and Applications of Properties and Applications of dielectric materials
作者: H. Kezuka M. Kikuchi T. Atoh K. Fukuoka Y. Satoh S. Yoshizawa Department of Bionics Tokyo University of Technology Hachioji Tokyo Japan Institute for Materials Research University of Tohoku Sendai Japan Advanced Materials R&D Center Meisei University Hino Tokyo Japan
Shock compaction for Nd-system superconductor particles have been investigated by shock compaction technique. After the shock compaction characterizations of as-shocked and annealed Nd-system superconductor particles ... 详细信息
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A process integration of high performance 64Kb MrAM
A process integration of high performance 64Kb MRAM
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Intermag 2003: International Magnetics Conference
作者: Kim, H.J. Koh, K.H. Jeong, G.T. Jeong, W.C. Park, J.H. Lee, S.Y. Song, I.-H. Jeong, H.S. Kim, Kinam Advanced Technology Development Team Semiconductor R and D Division Samsung Electronics Co. Ltd. San#24. Nongseo-Ri Yongin Gyconggi-Do 449-711 Korea Republic of Materials and Device Labornmry Samsung Adv. Institute of Technology San#24. Nongseo-Ri Yongin Gyconggi-Do 449-711 Korea Republic of
Magnetic and electrical properties of MTJs were investigated at each fabrication step during the process integration of high performance 64 Kb magnetic random access memory (MrAM). Studies showed that the coercivity o... 详细信息
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relationship between field emission property and composition of carbon nanotube paste for large area cold cathode
Relationship between field emission property and composition...
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IEEE International Conference on Vacuum Microelectronics (IVMC)
作者: Jong Hyung Choi Sung Kee Kang Jae-Hee Han Ji-Beom Yoo Chong-Yun Park Joong-Woo Nam J.M. Kim Center for Nanotubes and Nanostructured Composites Sungkyunkwan University Suwon South Korea Technology Development 3 Corperate R&D Center Samsung SDI Company Limited Yongin si South Korea
CNT paste was made by mixture of multi-walled carbon nanotubes (MWNT) powder, organic vehicles and inorganic binder. Then firing process was performed at different temperature under air and N/sub 2/ atmosphere. It was... 详细信息
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Enhanced electron emission from carbon nanotube paste after firing
Enhanced electron emission from carbon nanotube paste after ...
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IEEE International Conference on Vacuum Microelectronics (IVMC)
作者: Joong-Woo Nam Jong Hyung Choi Jae-Hee Han Ji-Beom Yoo Chong-Yun Park Sung Kee Kang J.E. Jung J.M. Kim Center for Nanotubes and Nanostructured Composites Sungkyunkwan University Suwon South Korea Technology Development 3 Corperate R&D Center Samsung SDI Company Limited Yongin si South Korea
After multi-walled carbon nanotubes (MWNT) powder was crushed with ball milling process, it was mixed with organic vehicles. And then CNT paste was printed on ITO coated glass substrate. The field emission characteris... 详细信息
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robust process integration of 0.78 /spl mu/m/sup 2/ embedded SrAM with NiSi gate and low-K Cu interconnect for 90 nm SoC applications
Robust process integration of 0.78 /spl mu/m/sup 2/ embedded...
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Symposium on VLSI technology
作者: Y.W. Kim J.H. Ahn T.S. Park C.B. Oh K.T. Lee H.S. Kang d.H. Lee Y.G. Ko K.S. Cheong J.W. Jun S.H. Liu J. Kim J.L. Nam S.r. Ha J.B. Park S.A. Song K.P. Suh Technology Development System LSI division Samsung Electronics Company Limited Yongin si Kyunggi South Korea R&D Center Memory division Samsung Electronics Company Limited Yongin si Kyunggi South Korea Memory division R&D Center K1 Business Samsung Electronics Samsung Advance Institute of Technology AE Center Yongin si Kyunggi South Korea
The smallest high density embedded 0.78 /spl mu/m/sup 2/ 6T-SrAM cell for high performance 90 nm SoC applications was successively integrated by using leading edge technologies such as 193 nm ArF lithography, 1.2 nm g... 详细信息
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Surface Tension and Wettability of Liquid Fe-16mass%Cr-S Alloy with Alumina
Surface Tension and Wettability of Liquid Fe-16mass%Cr-S All...
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作者: Li, Zushu Zeze, Masafumi Mukai, Kusuhiro Dept. of Mat. Sci. and Engineering Faculty of Engineering Kyushu Institute of Technology Kitakyushu 804-8550 Japan Yawata R and D Lab. Technical Development Bureau Nippon Steel Corporation Kitakyushu 804-8501 Japan Department of Materials Imperial College London Prince Consort Road London SW7 2BP United Kingdom
The surface tension and wettability of liquid Fe-16 mass%Cr-S alloy with alumina substrate at 1823 K and the temperature dependence of surface tension of liquid Fe-16 mass% Cr-S alloy in the temperature range of 1808-... 详细信息
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