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Preparation of NP loaded Chitosan-egg albumin based microparticles and study of release profile

AIP Conference Proceedings 2023年第1期2521卷

作者： rekha Goswami Abhilasha Mishra Ankit Kumar Partha Sarathi Bairy Department of Environment Science Graphic Era Hill University Clement town Dehradun Uttarakhand India Department of Chemistry Graphic Era Deemed to be University Clement town Dehradun Uttarakhand India Process Development Laboratory (PDL) R&D Department Lupin limited New Industrial Area No.2 Mandideep-462046 Dist.-Raisen Madhya Pradesh India School of Pharmacy Graphic Era Hill University Clement Town Dehradun Uttarakhand India

Chitosan and egg albumin are the main constituents used in this study for the formulation of nanostructuredmicro particlesfor control release of fertilizers. In this research work various parameters are observed to check the sensitivity of the NP loaded chitosan and albumin microparticles. To characterised the microparticles SEM study was done observed results showed that the microparticles size distribution were lies between 20 to 200 μm. release study was also examined it was observed that C5E20 microparticles has maximum release behaviour whereas C20E5 showed minimum release behaviour. The maximum rate of biodegradation was shown by C10E15 microparticles i.e. 68.3% whereas C5E20 microparticles showed minimum rate of biodegradation i.e. 42.9%.

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Light Guide Layer Thickness Optimization for Enhancement of the Light Extraction Efficiency of Ultraviolet Light–Emitting diodes

Research Square

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research Square 2021年

作者： Ye, Zhi Ting Yuan-Heng, Cheng Hung, Li-Wei Hsu, Kung-Hsieh Hu, Yu Chang National Chung Cheng University College of Engineering Taiwan Department of Mechanical Engineering Advanced Institute of Manufacturing with High-Tech Innovations National Chung Cheng University 168 University Rd. Min-Hsiung Chia-Yi 62102 Taiwan Department of Process Development Division EPILEDS TECHNOLOGIES No. 7 Kanxi Rd. Xinshi Dist. Tainan744092 Taiwan Department of R&D Division Harvatek corporation No. 18 Ln. 522 Sec. 5 Zhonghua Rd. Xiangshan Dist. Hsinchu City300066 Taiwan

Challenges related to deep-ultraviolet light-emitting diode substrates include material costs and lattice mismatch. Sapphire substrates are commonly used, although their high refractive index can result in the total internal reflection of light whereby some light is absorbed, reducing light extraction efficiency (LEE). In this study, we proposed an optimal thickness value of a sapphire substrate light guide layer through first-order optical design and used the optical simulation software Ansys SPEOS to assess and refine its effect on LEE. AlGaN ultraviolet-C light-emitting diode (UV-C LEd) wafers with a substrate thickness of 150–700 μm were used. The simulation proceeded under a UV-C LEd center wavelength of 275 nm to determine the optimal thickness of the light guide layer. Finally, the experimental results demonstrated that a light guide layer thickness of 150 μm resulted in a reference output power of 13.53 mW, and an increased thickness of 600 um resulted in output power of 20.58 mW. The LEE can therefore be increased by 1.52 times through light guide layer thickness optimization. © 2021, CC BY.

关键词： Light emitting diodes

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Atomization of reduced Graphene Oxide Ultra-thin Film for Transparent Electrode Coating

Atomization of Reduced Graphene Oxide Ultra-thin Film for Tr...

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IEEE Conference on Sustainable Utilization and development in Engineering and Technology (STUdENT)

作者： Mohd rofei Mat Hussin Siti Aishah Mohamad Badaruddin Mohd Hilmy Azuan Hamzah Nik Mohd razali Mohd Nor Yuan Piou Choong Hin Yong Wong Mukter Zaman Nanotechnology & Adv. Device R&D MIMOS Berhad Kuala Lumpur Malaysia Process Engineering R&D MIMOS Berhad Kuala Lumpur Malaysia Semiconductor Tech. Development MIMOS Semiconductor Sdn Bhd Kuala Lumpur Malaysia Mechanical Design Engineering NSW Automation Sdn. Bhd. Penang Malaysia Faculty of Engineering Multimedia University Cyberjaya Malaysia

ISBN: (数字)9781728132761

ISBN: (纸本)9781728132778

In this research, an atomization process was introduced to deposit carbon-based nanomaterials i.e. graphene oxide (GO) on 200 mm silicon wafer for high volume production of a transparent conductive electrode (TCE). An ultrasonic spray coating process was used to deposit a stable dispersion of graphene oxide in ethanol on silicon and glass substrates. The thickness of the thin films can be controlled within a nanometer-scale with the high uniformity coating process. Functionalization of GO based on thermal reduction in rapid Thermal process (rTP) and Plasma Enhanced Chemical Vapour deposition (PECVd) chambers was performed to make the GO electrically conductive and optically transparent. AFM measurements revealed that the thin film thickness has a strong correlation with the number of spray passes that can be translated into spray volume. It was discovered that the thin films demonstrate a good electrical conductivity with high optical transparency in the visible light. The sheet resistance of the films can be significantly reduced by rapid thermal annealing at a high temperature of up to 1100 °C and reach 5.3 kΩ/sq with a light transmittance of 77.1% at 550 nm wavelength. This is a low-cost solution for high volume production of TCE, which have a high potential for scaling-up.

关键词： reduced Graphene Oxide spray coating atomization process transparent conductive electrode rapid thermal process

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Enhanced etch characteristics of EUV Pr masked SiON through the ion beam grid pulsing technique

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Scientific reports 2025年第1期15卷 19920页

作者： Hae In Kwon Yun Jong Jang Kyoung Chan Kim Hong Seong Gil Ju Young Kim Seong Hyun ryu do Seong Pyun dae Whan Kim Woo Chang Park Ji Yeon Lee Jin Woo Park Sang Wuk Park Geun Young Yeom School of Advanced Materials Science and Engineering Sungkyunkwan University Suwon 16419 Republic of Korea. Department of Photovoltaic System Engineering Sungkyunkwan University Suwon 16419 Republic of Korea. School of Chemical Engineering Sungkyunkwan University Suwon 16419 Republic of Korea. Department of Semiconductor Display Engineering Sungkyunkwan University Suwon 16419 Republic of Korea. Advanced Process Development Semiconductor R&D Center Samsung Electronics Co. Ltd. Hwaseong 18448 Republic of Korea. School of Advanced Materials Science and Engineering Sungkyunkwan University Suwon 16419 Republic of Korea. gyyeom@skku.edu. SKKU Advanced Institute of Nano Technology (SAINT) Sungkyunkwan University Suwon 16419 Republic of Korea. gyyeom@skku.edu. Department of Semiconductor Display Engineering Sungkyunkwan University Suwon 16419 Republic of Korea. gyyeom@skku.edu.

EUV lithography technology, applied in nano-patterning processes, enables the creation of fine patterns below 10 nm. However, issues still remain due to the reduced etch selectivity and increased line edge roughness (LEr) caused by the thin thickness and weakness of organic EUV photoresist (Pr). In this study, research was conducted to improve the low etch selectivity and high LEr using a novel grid pulsed ion beam etching technique. In this system, Ar/H plasma is generated in the inductively coupled plasma (ICP) source, and the Ar/H ion beam is irradiated while fluorocarbon gas is injected into the process chamber. Grid pulsing technique increases the etch selectivity of SiON over EUV Pr while improving LEr. With a 50% duty ratio and optimal gas flow conditions (Ar:H ratio = 1:3 to the ion beam source and CF:CF = 1:1), the etch selectivity of SiON over EUV Pr approached ∞ while maintaining the LEr close to the reference.

关键词： EUV Pr Etch selectivity Grid pulsing Ion beam etching LEr SiON

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179P Early proof of concept of safety and clinical activity of clonal neoantigen-reactive T cells (cNeT)

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Immuno-Oncology and Technology 2022年 16卷 100291-100291页

作者： Forster, M.d. Cave, J. Greystoke, A. Plummer, r. Spicer, J. Thistlethwaite, F. Turajlic, S. Craig, A. Newton, K. Saggese, M. Quezada, S. Peggs, K. Oncology Dept. UCL - University College London London UK Oncology Southampton General Hospital - University Hospital Southampton NHS Trust Southampton UK Medical Oncology Department The Freeman Hospital (NHS Foundation Trust) Northern Centre for Cancer Care Newcastle upon Tyne UK Translational and Clinical Research Institute Newcastle University Newcastle upon Tyne UK Comprehensive Cancer Centre KCL - King's College London London UK Medical Oncology The Christie NHS Foundation Trust Manchester UK Oncology The Royal Marsden Hospital - Chelsea London UK Bioinformatics Achilles Theraputics Limited London UK Process Development Achilles Theraputics Limited London UK Clinical Development Achilles Theraputics Limited London UK R&D Achilles Theraputics Limited London UK Clinical Achilles Theraputics Limited London UK

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Grinding feed control based on workpiece deflection and on-machine measurement of workpiece stiffness 20

Grinding feed control based on workpiece deflection and on-m...

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20th International Symposium on Advances in Abrasive Technology, ISAAT 2017

作者： Yoritsune, Masashi Tano, Makoto Process Technology R&D Department Research and Development Headquarters JTEKT CORPORATION 1-1 Asahi-machi Kariya Aichi448-8652 Japan

In grinding process, the actual depth of cut lags behind the command depth of cut because of workpiece deflection. In order to achieve the required machining accuracy, it is necessary to stabilize the actual cutting depth which is proportional to workpiece deflection. As a result, conventional grinding process needs a long machining time. In this research, we have developed the grinding system to stabilize the amount of workpiece deflection in a short time. In this system, the control logic was built to compensate the grinding feed rate based on workpiece deflection, which was predicted from the workpiece stiffness and the grinding force. Grinding experiment was carried out for the evaluation of developed grinding system by using cylindrical grinders. In addition, on-machine measuring method of workpiece stiffness was proposed for flexible manufacturing system. This paper describes the grinding experiment of the developed grinding system and measurement result of workpiece stiffness. © ISAAT *** right reserved.

关键词： Grinding (machining)

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MOF-based high-entropy-alloy evaporator featuring enhanced interband transitions for efficient solar steam and green electricity generation

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Chemical Engineering Journal 2025年 517卷

作者： Chenyang dai Jia-Han Zhang Cheng-Yu He rongrong dai Likun Pan Yusuke Yamauchi Jing Zhang Zhengtong Li Xingtao Xu Marine Science and Technology College Zhejiang Ocean University Zhoushan 316022 China Electronic-Photonic Smart Sensing Device R&D Team Inner Mongolia Key Laboratory of Intelligent Communication and Sensing and Signal Processing School of Electronic Information Engineering Inner Mongolia University Hohhot 010021 China Research Center of Resource Chemistry and Energy Materials State Key Laboratory of Solid Lubrication Lanzhou Institute of Chemical Physics Chinese Academy of Sciences Lanzhou China Shanghai Key Laboratory of Magnetic Resonance School of Physics and Electronic Science East China Normal University Shanghai 200026 China Department of Materials Process Engineering Graduate School of Engineering Nagoya University Nagoya 464-8603 Japan Australian Institute for Bioengineering and Nanotechnology (AIBN) The University of Queensland Brisbane QLD 4072 Australia Department of Chemical and Biomolecular Engineering Yonsei University 50 Yonsei-ro Seodaemun-gu Seoul 03722 South Korea Ningbo Key Laboratory of Green Petrochemical Carbon Emission Reduction Technology and Equipment Zhejiang Institute of Tianjin University Ningbo Zhejiang 315201 China State Key Laboratory of Hydrology-Water Resources and Hydraulic Engineering Yangtze Institute for Conservation and Development Hohai University Nanjing 210098 China

Photothermal materials exhibiting broadband optical absorption and high energy efficiency are highly sought after in the field of solar-driven evaporation. Herein, we present a novel photothermal material derived from polymetallic metal–organic frameworks (MOFs) through a d - d interband transition ( d - d IBT) engineering strategy. This approach enables comprehensive occupation of electronic states within ±4 eV relative to the Fermi level through 3d transition metal coordination, achieving an exceptional average solar absorption efficiency of over 97 % across the full solar spectrum (250–2500 nm). This breakthrough effectively overcomes the inherent wide bandgap limitation of MOFs that traditionally restricts their full-spectrum solar utilization. Leveraging its remarkable broadband sunlight harvesting capacity and ultrafast localized heating performance, this evaporator engineered with high-entropy alloy nanoparticles, achieves an evaporation efficiency surpassing 95% under one sun irradiation while maintaining a high evaporation rate of 2.80 kg m −2 h −1 . Moreover, this evaporator demonstrates exceptional desalination efficiency even with high-salinity seawater (20 wt%), while the waste heat generated during operation can be strategically repurposed to produce green electricity, enhancing its sustainability profile. Thus, the FeCoNiMnCuAlZn high-entropy alloy nanoparticle-based photothermal evaporator offers innovative solutions for addressing the scarcity of clean water resources and the need for green energy.

关键词： Green electricity generation High-entropy alloys Interband transition Metal–organic frameworks Solar steam generator

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development of advanced CMP process for the minimization of hydrophobic interaction based on the surface treatment technology

Development of advanced CMP process for the minimization of ...

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2017 International Conference on Planarization/CMP Technology, ICPT 2017

作者： Kim, Hyuk-Min Heo, Jee-Hwan Kang, Jung-Eun Park, Seung-Ho Park, Jong-Hyuk Yoon, Il-Young Yoon, Bo-Un Nam, Seok-Woo Process Development Team Semiconductor R&D Center SEC San 14 Nongseo-dong Yongin-si Gyeonggi-do Giheung-gu Korea Republic of Material Development P/J Semiconductor R&D Center SEC San 14 Nongseo-dong Yongin-si Gyeonggi-do Giheung-gu Korea Republic of

ISBN: (纸本)9783800744626

In this study, the influence of poly-Si surface wettability on the removal of defects from CMP (Chemical Mechanical Planarization) process was investigated. The poly-Si surface is hydrophobic in nature which attracts the hydrophobic organic residues including the pad debris, slurry additives and so on. Therefore, the adhesion between organics and poly-Si surface is dominant among the defects in poly-Si polishing. For this reason, the control of poly-Si surface wettability is a key for the reduction of CMP residues. The alkaline solution which contains the hydrophilic polymer was supplied to change the surface properties in the final polishing step. The hydrophilic layer acts as a sacrificial layer for the removal of organics. The following in-situ SC-1 cleaning removes not only the hydrophilic layer but also the organics on its surface. In case of abrasive particles in slurry, they were removed by the repulsive force between the same charged poly-Si surface and particles in SC-1 process. Furthermore, the prevention of abrasive particles in the main photo keys was also confirmed. This indicates the hydrophilic polymer in poly-Si CMP process decreases the defects which can skip the cleaning process. This enables the simplification of overall semiconductor process and reduction of CoO (Cost of Ownership). © VdE VErLAG GMBH Berlin Offenbach

关键词： Hydrophilicity

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Correction to: NetConfer: a web application for comparative analysis of multiple biological networks

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BMC biology 2020年第1期18卷 147页

作者： Sunil Nagpal Krishanu das Baksi Bhusan K Kuntal Sharmila S Mande Bio-Sciences R&D Division TCS Research Tata Consultancy Services Ltd. 54-B Hadapsar Industrial Estate Pune 411 013 India. Bio-Sciences R&D Division TCS Research Tata Consultancy Services Ltd. 54-B Hadapsar Industrial Estate Pune 411 013 India. kuntal.bhusan@***. Chemical Engineering and Process Development Division CSIR-National Chemical Laboratory Dr. Homi Bhabha Road Pune 411 008 India. kuntal.bhusan@***. Academy of Scientific and Innovative Research (AcSIR) Ghaziabad 201002 India. kuntal.bhusan@***. Bio-Sciences R&D Division TCS Research Tata Consultancy Services Ltd. 54-B Hadapsar Industrial Estate Pune 411 013 India. sharmila.mande@***.

An amendment to this paper has been published and can be accessed via the original article.

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The forefront of chemical engineering research

Nature Chemical Engineering

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Nature Chemical Engineering 2024年第1期1卷 18-27页

作者： Laura Torrente-Murciano Jennifer B. dunn Panagiotis d. Christofides Jay d. Keasling Sharon C. Glotzer Sang Yup Lee Kevin M. Van Geem Jean Tom Gaohong He Department of Chemical Engineering and Biotechnology University of Cambridge Cambridge UK Chemical and Biological Engineering Center for Engineering Sustainability and Resilience Northwestern University Evanston IL USA Department of Chemical and Biomolecular Engineering University of California Los Angeles Los Angeles CA USA Department of Chemical & Biomolecular Engineering University of California Berkeley Berkeley CA USA Department of Bioengineering University of California Berkeley Berkeley CA USA California Institute of Quantitative Biosciences (QB3) University of California Berkeley Berkeley CA USA Division of Biological Systems and Engineering Lawrence Berkeley National Laboratory Berkeley CA USA Joint BioEnergy Institute Emeryville CA USA Center for Biosustainability Danish Technical University Lyngby Denmark Center for Synthetic Biochemistry Shenzhen Institutes for Advanced Technologies Shenzhen China Department of Chemical Engineering University of Michigan Ann Arbor MI USA Metabolic and Biomolecular Engineering National Research Laboratory Systems Metabolic Engineering and Systems Healthcare Cross-Generation Collaborative Laboratory Department of Chemical and Biomolecular Engineering (BK21 four) BioProcess Engineering Research Center Korea Advanced Institute of Science and Technology (KAIST) Daejeon Republic of Korea Laboratory for Chemical Technology Department of Materials Textiles and Chemical Engineering Faculty of Engineering and Architecture Ghent University Ghent Belgium Chemical Process Development Global Product Development and Supply Bristol Myers Squibb New Brunswick NJ USA State Key Laboratory of Fine Chemicals R&D Center of Membrane Science and Technology School of Chemical Engineering Panjin Institute of Industrial Technology Liaoning Key Laboratory of Chemical Additive Synthesis and Separation Dalian University of Technology Dalian Liaoning China

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