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Constitutive model incorporating the strain-rate and state of stress effects for machining simulation of titanium alloy Ti6Al4V

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Procedia CIrP 2018年 77卷 344-347页

作者： Wenyu Cheng Jose Outeiro Jean-Philippe Costes rachid M’Saoubi Habib Karaouni Lamice denguir Viktor Astakhov François Auzenat Arts et Metiers ParisTech LaBoMaP Rue Porte de Paris 71250 Cluny France R&D Material and Technology Development Seco Tools AB SE-73782 Fagersta Sweden Safran Tech Research and Technology Center 78772 Magny-Les-Hameaux France Production Service Management Inc. (PSMi) Saline MI USA R and D milling and process 22 avenue de la prospective 18020 bourges cedex

Ti6Al4V titanium alloy is widely used in aero-engines due to its superior performance. However, as a difficult-to-cut alloy, it induces short cutting tool life and poor surface integrity. To improve these process outcomes, numerical simulations are of importance. The predictive ability of such simulation depends on the accuracy of the constitutive model which describes the work material behavior under loading conditions specific to metal cutting. Therefore, the focus of this paper is the formulation of a constitutive model to be used in the orthogonal cutting simulation of Ti6Al4V. The distinguished feature of this model is its simplicity, accounting for the strain-rate and state of stress effects in the work material deformation and fracture. The model coefficients were identified using mechanical tests and numerical simulations with specially-designed test specimens to cover a wide range of strain-rates and state of stress. Orthogonal cutting simulations were performed and the obtained results were compared with those measured.

关键词： Constitutive model Metal cutting simulation State of stress

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Some Items of Interest to process r&d Chemists and Engineers

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Organic process research and development 2017年第12期21卷 1873-1883页

作者： Zhao, Wenyi Zhao, dongbo Guizzetti, Sylvain Schwindeman, James A. daniels, david S.B. Guerrero, Carlos A. raghuraman, Arjun Knight, John Jacobus Pharmaceutical Co. Inc. PrincetonNJ08540 United States ChulanST Wuhan Co. Limited 3-4-5 Wangjiadun Xudong Avenue Hubei Province Wuhan430063 China NovAlix Bld Sébastien Brant BP 30170 IllkirchF-67405 France Rohner Inc. 4066 Belle Meade Circle BelmontNC28012 United States Pfizer Chemical Research & Development IPC533 B530/1.158F Ramsgate Road SandwichCT13 9NJ United Kingdom Bristol-Myers Squibb Co. Chemical and Synthetic Development One Squibb Drive New BrunswickNJ08901 United States Polyurethane Process R&D The Dow Chemical Co. FreeportTX77541 United States JKonsult Ltd HerefordHR1 3NT United Kingdom

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Correction to: Use of Physiologically Based Pharmacokinetic (PBPK) Modeling for Predicting drug-Food Interactions: an Industry Perspective

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The AAPS journal 2020年第1期23卷 6页

作者： Arian Emami riedmaier Kevin deMent James Huckle Phil Bransford Cordula Stillhart richard Lloyd ravindra Alluri Sumit Basu Yuan Chen Varsha dhamankar Stephanie dodd Priyanka Kulkarni Andrés Olivares-Morales Chi-Chi Peng Xavier Pepin Xiaojun ren Thuy Tran Christophe Tistaert Tycho Heimbach Filippos Kesisoglou Christian Wagner Neil Parrott DMPK and Translational Modeling AbbVie Inc. North Chicago Illinois USA. arian.emamiriedmaier@***. Global DMPK Takeda Pharmaceutical Co. Ltd. San Diego California USA. Drug Product Technology Amgen Thousand Oaks California USA. Modeling & Informatics Vertex Pharmaceuticals Boston Massachusetts USA. Pharmaceutical R&D Formulation & Process Sciences F.Hoffmann-La Roche Ltd. Basel Switzerland. Computational & Modelling Sciences Platform Technology Sci-ences GlaxoSmithKline R&D Ware Hertfordshire UK. Clinical Pharmacology and Safety Sciences R&D AstraZeneca Cambridge UK. Pharmacokinetic Pharmacodynamic and Drug Metabolism-Quantitative Pharmacology and Pharmacometrics (PPDM-QP2)Merck & Co Inc. West Point Pennsylvania USA. Department of Drug Metabolism and Pharmacokinetics Genentech South San Francisco California USA. Formulation Development Vertex Pharmaceuticals Boston Massachusetts USA. Formulation Development Cyclerion Therapeu-tics Inc. Cambridge Massachusetts USA. Chemical & Pharmaceutical Profiling Novartis Institutes for Biomedical Research Cambridge Massachusetts USA. Department of Pharmacokinetics and Drug Metabolism AmgenInc Cambridge Massachusetts USA. Pharmaceutical Sciences Roche Pharmaceutical Research andEarly Development Roche Innovation Center Basel Switzerland. Drug Metabolism and Pharmacokinetics Theravance Biopharma South San Francisco California USA. New Modalities and Parenteral Development PharmaceuticalTechnology & Development Operations AstraZeneca Maccles-field UK. Modeling & Simulation PK Sciences Novartis Institutes of Biomedical Research East Hanover New Jersey USA. Computational & Modelling Sciences Platform Technology Sci-ences GlaxoSmithKline R&D Collegeville Pennsylvania USA. Pharmaceutical Sciences Janssen Research & Development Beerse Belgium. PBPK & Biopharmaceutics Novartis Institutes of Biomedical Research Wayne New Jersey USA. Pharmaceutical Sciences Merck & Co. Inc. Kenilworth New Jersey US

An Erratum to this paper has been published: https://***/10.1208/s12248-020-00535-z.

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P-216: High efficiency, transparent overcoat for planarization of display modules

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SId Symposium digest of Technical Papers 2019年第1期50卷

作者： radu reit Noriyuki Nagashima Masahiro Imaizumi Satoshi Mori Kejia Yang Abraham Vega Adrian Avendano david Arreaga CTO Ares Materials Inc. 17217 Waterview Pkwy. Suite 1.202 ROW Dallas TX 75252 USA Engineer Group1 Functional Chemical R&D Laboratories Nippon Kayaku Co. Ltd. 1-1 Marunouchi 2-chome Chiyoda-ku Tokyo 100-0005 Japan Section Manager Group1 Functional Chemical R&D Laboratories General Manager Technical Department Functional Materials Division Senior Polymer Scientist Process Development Scientist CPO CEO

Overcoating materials for the planarization of display module subassemblies such as the thin-film transistor (TFT) array or the color filter (CF) sub-pixels have seen little innovation in the previous decade. However challenges with existing overcoat materials still exist, principally in the form of high solvent contents, difficult to remove or toxic solvents and inadequate planarization performance. In response, Ares Materials has employed its Pylux™-brand polysulfide thermoset (PST) resins as effective overcoat materials which solve the previously described commercial overcoat material issues. In this paper we describe the use of Pylux PST overcoating resins and their corresponding planarization performance over a commercial CF, showing equivalent or improved planarization performance of < 0.2 µm while using > 2X less solvent.

关键词： overcoat low solvent content color filter Pylux

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de novo design of selective Sortase-A inhibitors: Synthesis, structural and in vitro characterization

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Chemical data Collections 2018年 15-16卷 126-133页

作者： Kranthi raj K Pardhasaradhi Mathi Mutyala Veera Venkata Vara Prasad Mahendran Botlagunta ravi M ramachandran d Department of H & S MLR Institute of Technology Dundigal Hyderabad Telangana India Upstream Process Development Team Lupin Limited Biotechnology R&D 1156 Ghotawade Village Mulshi Taluka Pune 411042 India Department of Chemistry TJohn Institute of Technology Bengaluru Karnataka 560076 India Biomedical Research Laboratory Department of Biotechnology KLEF University (Koneru Lakshmaiah Educational Foundation) Green fields Vaddeswaram Guntur (Dist) Andhra Pradesh 522502 India Bioinformatics Division Environmental Microbiology Lab Department of Botany Osmania University Hyderabad 500007 India Department of Chemistry Acharya Nagarjuna University Nagarjuna Nagar Guntur 522510 India

Novel molecules were designed against Staphylococcus aureus sortase A, an imperative and vital target involved in the bacterial virulence. Structure guided de novo designing was performed using different chemical fragments. These fragments were extended based on the requirements of the binding cavity. All the compounds in its binding orientation has formed good interaction network with amino acids HIS 120 and ArG 197. Molecules designed contain indole-chroman and indolin-chroman moieties and their docking scores were ranging from −6.92 to −5.67. designed molecules were selected for synthesis and tested in vitro against Staphylococcus aureus sortase A using Fluorescence resonance energy transfer assay. The highest active molecule KK4 (( Z )-3-((5-nitro-1 H -indol-3-yl) methylene) chroman-2,4‑dione) has IC 50 of 3.4 µM. This molecule with indole chroman moiety is suitable candidate that can be used as a prospective lead against Staphylococcus aureus sortase A.

关键词： Staphylococcus aureus sortase A de novo designing Antibacterial Indole Chroman

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Mass Activated droplet Sorting (MAdS) Enables High‐Throughput Screening of Enzymatic reactions at Nanoliter Scale

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Angewandte Chemie 2019年第11期132卷

作者： daniel A. Holland‐Moritz Michael K. Wismer Benjamin F. Mann Iman Farasat Paul devine Erik d. Guetschow Ian Mangion Christopher J. Welch Jeffrey C. Moore Shuwen Sun robert T. Kennedy Dept. of Chemistry University of Michigan 930 N University Ann Abor MI 48109 USA Scientific Engineering and Design Merck & Co. Inc. 2000 Galloping Hill Road Kenilworth NJ 07033 USA Process Research and Development Merck & Co. Inc. 126 E. Lincoln Ave Rahway NJ 07065 USA Janssen R&D 1400 McKean Rd. Spring House PA 19477 USA Indiana Consortium Analyt Sci & Engn Indianapolis IN 46202 USA

Microfluidic droplet sorting enables the high‐throughput screening and selection of water‐in‐oil microreactors at speeds and volumes unparalleled by traditional well‐plate approaches. Most such systems sort using fluorescent reporters on modified substrates or reactions that are rarely industrially relevant. We describe a microfluidic system for high‐throughput sorting of nanoliter droplets based on direct detection using electrospray ionization mass spectrometry (ESI‐MS). droplets are split, one portion is analyzed by ESI‐MS, and the second portion is sorted based on the MS result. Throughput of 0.7 samples s −1 is achieved with 98 % accuracy using a self‐correcting and adaptive sorting algorithm. We use the system to screen ≈15 000 samples in 6 h and demonstrate its utility by sorting 25 nL droplets containing transaminase expressed in vitro. Label‐free ESI‐MS droplet screening expands the toolbox for droplet detection and recovery, improving the applicability of droplet sorting to protein engineering, drug discovery, and diagnostic workflows.

关键词： Biokatalyse Tröpfchenmikrofluidik Hochdurchsatz-Screening Massenspektrometrie Mikroreaktoren

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Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates

Fabrication and Characterization of Flexible Thin Film Trans...

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IEEE Workshop on Microelectronics and Electron devices, WMEd

作者： Haoyu U. Li Thomas N. Jackson R&D Process Development Micron Technology Inc. Boise ID USA Department of Electrical Engineering Penn State University University Park PA USA

We report flexible ZnO thin film transistors (TFTs) fabricated on 5 μm thick solution-cast polyimide substrate. Plasma enhanced atomic layer deposition (PEALd) was used to deposit Al 2 O 3 dielectric and ZnO active layers respectively. The highest processing temperature was 200 °C. The flexible ZnO TFTs we fabricated have very similar characteristics to devices fabricated on glass substrates. Typical TFT mobility was greater than 12 cm2/V·s for a gate electric field of 2 MV/cm. Simple mechanical releasing can be used to detach the polyimide substrate from the rigid carrier. device performance showed almost no degradation after releasing. repeated bending test using homemade roller-flex testing apparatus was conducted. The flexible ZnO TFTs were repeatedly bent and flattened to a minimum radius of 1.6 mm for more than 10,000 cycles with little change in device characteristics. These results demonstrated solution-cast thin polymeric film as a simple but profound path to oxide semiconductor flexible electronics.

关键词： Substrates Zinc oxide II-VI semiconductor materials Polyimides Thin film transistors Logic gates Flexible electronics

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20nm drAM: A new beginning of another revolution

20nm DRAM: A new beginning of another revolution

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International Electron devices Meeting (IEdM)

作者： J. M. Park Y. S. Hwang S.-W. Kim S. Y. Han J. S. Park J. Kim J. W. Seo B. S. Kim S. H. Shin C. H. Cho S. W. Nam H. S. Hong K. P. Lee G. Y. Jin E. S Jung DRAM Technology Development Team Samsung Electronics Co. Hwasung-City Gyounggi-Do Korea DRAM Process Architecture Team Samsung Electronics Co. Hwasung-City Gyounggi-Do Korea Process Development Team Samsung Electronics Co. Hwasung-City Gyounggi-Do Korea Advanced Core Equipment Engineering & Development P/J Samsung Electronics Co. Hwasung-City Gyounggi-Do Korea DRAM Product & Technology Center Samsung Electronics Co. Hwasung-City Gyounggi-Do Korea Semiconductor R&D Center Samsung Electronics Co. Hwasung-City Gyounggi-Do Korea

For the first time, 20nm drAM has been developed and fabricated successfully without extreme ultraviolet (EUV) lithography using the honeycomb structure (HCS) and the air-spacer technology. The cell capacitance (Cs) can be increased by 21% at the same cell size using a novel low-cost HCS technology with one argon fluoride immersion (ArF-i) lithography layer. The parasitic bit-line (BL) capacitance is reduced by 34% using an air-spacer technology whose breakdown voltage is 30% better than that of conventional technology.

关键词： random access memory Capacitors Lithography Capacitance Honeycomb structures Metals Computer architecture

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Some Items of Interest to process r&d Chemists and Engineers

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Organic process research & development 2015年第10期19卷 1369-1373页

作者： John Knight Sylvain Guizzetti Wenyi Zhao James A. Schwindeman dongbo Zhao J-KONSULT Ltd. 1 Beechwood Lane Heathfield East Sussex TN21 8QQ U.K. The Zlota Company LLC 15 Fairbanks Road Sharon Massachusetts 02067-2858 United States. E-mail: Pfizer Chemistry 10578 Science Center Drive San Diego California 09121 United States. E-mail: Bristol-Myers Squibb Chemical Development One Squibb Drive New Brunswick New Jersey 08903 United States. E-mail: Jacobus Pharmaceutical Co. Inc. Princeton New Jersey 08540 United States. E-mail: Bayer Technology & Engineering (Shanghai) Co. Ltd. 82 Mu Hua Road Shanghai Chemical Industry Park Shanghai 201507 P. R. China. E-mail: NovAlix Building A: Chemistry Bioparc Bld Sébastien Brant BP 30170 F-67405 Illkirch Cedex France. E-mail: Polyurethane Process R&D The Dow Chemical Co. Freeport TX 77541 United States. E-mail: Rohner Inc. 4066 Belle Meade Circle Belmont NC 28012 United States. E-mail:

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Verification on the extreme scalability of STT-MrAM without loss of thermal stability below 15 nm MTJ cell

Verification on the extreme scalability of STT-MRAM without ...

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Symposium on VLSI Technology

作者： Ju Hyun Kim W. C. Lim U. H. Pi J. M. Lee W. K. Kim J. H. Kim K. W. Kim Y. S. Park S. H. Park M. A. Kang Y. H. Kim W. J. Kim S. Y. Kim J. H. Park S. C. Lee Y. J. Lee J. M. Yoon S. C. Oh S. O. Park S. Jeong S. W. Nam H. K. Kang E. S. Jung Process Development Team Semiconductor R&D Center Samsung Electronics Co. Ltd. Hwasung-City Gyeonggi-Do Korea Computer Aided Engineering Team Semiconductor R&D Center Samsung Electronics Co. Ltd. Hwasung-City Gyeonggi-Do Korea Memory Analysis Science & Engineering Group Samsung Electronics Co. Ltd. Hwasung-City Gyeonggi-Do Korea

Scalability of interface driven perpendicular magnetic anisotropy (i-PMA) magnetic tunnel junctions (MTJs) has been improved down to 1X node which verifies STT-MrAM for future standalone memory. With developing a novel damage-less MTJ patterning process, robust magnetic and electrical performances of i-PMA MTJ cell down to 15 nm node could be achieved.

关键词： Thermal stability Magnetic tunneling Switches Stability analysis Magnetic switching Thermal factors Scalability

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