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检索条件"机构=R&D Technology Development"
1037 条 记 录,以下是831-840 订阅
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An Endurance-Free Ferroelectric random Access Memory as a non-volatile rAM
An Endurance-Free Ferroelectric Random Access Memory as a no...
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Symposium on VLSI technology
作者: d. J. Jung W. S. Ahn Y. K. Hong H. H. Kim Y. M. Kang J. Y. Kang E. S. Lee H. K. Ko S. Y. Kim W. W. Jung J. H. Kim S. K. Kang J. Y. Jung H. S. Kim d. Y. Choi S. Y. Lee K. H. A. C. Wei H. S. Jeong Technology-Development Team 2 Semiconductor R&D Center Memory Division Samsung Electronics Co. Ltd. San #24 Nongseo-Dong Giheung-Gu Yongin-City Kyungki-Do S. Korea
We demonstrate endurance characteristics of a 1T1C, 64 Mb FrAM in a real-time operational situation. To explore endurance properties in address access time t{sub}(AA) of 100ns, we establish a measurement set-up that c... 详细信息
来源: 评论
Numerical optimization of single-mode photonic crystal VCSELs
Numerical optimization of single-mode photonic crystal VCSEL...
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International Conference on Numerical Simulation of Optoelectronic devices, (NUSOd)
作者: Peter Nyakas Tomofumi Kise Tamas Karpati Noriyuki Yokouchi Furukawa Electric Institute of Technology Limited Budapest Hungary Yokohama Research & Development Laboratories Photonic Device Research Center Furukawa Electric Corporation Limited Nishi Japan Yokohama R&D Labs. Furukawa Electr. Corp. Yokohama
The lattice constant of a single-defect photonic crystal vertical-cavity surface-emitting laser (PhC-VCSEL) is numerically optimized to achieve the highest single-mode power in the fundamental mode. The simulated resu... 详细信息
来源: 评论
TId Sensitivity of NANd Flash Memory Building Blocks
TID Sensitivity of NAND Flash Memory Building Blocks
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European Conference on radiation and its Effects on Components and Systems
作者: M. Bagatin G. Cellere S. Gerardin A. Paccagnella A. Visconti S. Beltrami RREACT Group Dipartimento di Ingegneria dell'Informazione Universita di Padova Numonyx R&D - Technology Development Agrate Brianza (Mi)
NANd Flash memories are the leader among high capacity non-volatile memory technologies and are becoming attractive also for radiation harsh environments, such as space. For these applications, a careful assessment of... 详细信息
来源: 评论
Extraction of Voltage Transfer Characteristic of Inverter Based on TSNWFETs
Extraction of Voltage Transfer Characteristic of Inverter Ba...
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2008 9th International Conference on Solid-State and Integrated-Circuit technology
作者: Yeonsung Kang Sung dae Suk Kang Il Seo donggun Park Hyungcheol Shin Seoul National Univ.Dept.of EE San 56-1Sillim-dongGwanak-guSeoul151-742Korea Advanced Technology Development Teaml R&D CenterSamsung Electronics Co.San 24Nongseo-DongKiheung-KuYongin-CityKyoungi-Do449-711Korea
In this paper,voltage transfer characteristic(VTC) of inverter based on Twin Silicon Nanowire MOSFETs (TSNWFETs) is *** with 40 nm gate length and 10 nm nanowire diameter are used to construct ***,switching threshold ... 详细信息
来源: 评论
Fabrication of nano-structured VOx film by low temperature ion beam sputtering and reductive annealing
Fabrication of nano-structured VOx film by low temperature i...
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IEEE International Nanoelectronics Conference (INEC)
作者: Xiaodong Wang Guike Li Jiran Liang An Ji Ming Hu Fuhua Yang Jian Liu Nanjian Wu Hongda Chen Engineering Research Center for Semiconductor Integrated Technology Institute of Semiconductors Chinese Academy and Sciences Beijing China Engineering Research Center for Semiconductor Integrated Technology Chinese Academy of Sciences Beijing P. R. China Chinese Academv of Sciences Institute of Semiconductors Beijing P. R. China Department of electronic science and -technology Tianiin University Tianiin P. R. China Optoelectronic Research and Development Center Institute of Semiconductors Chinese Academy and Sciences Beijing China Optoelectronic R&D Center Chinese Academy of Sciences Beijing P. R. China
VO x thin films have been fabricated by low temperature ion beam sputtering and post reductive annealing process. Semiconductor-metal phase transition is observed for the film annealed at 400degC for 2 hours. The fil... 详细信息
来源: 评论
Strategy and Technical Support System for developing New TCM drugs
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World Science and technology 2008年 第3期10卷 1-7页
作者: Qiong-lin LIANG Guo-an LUO Jian-qiang ZOU Xiu-mei GAO Jian-xun LIU Zu-guang YE Wei JIA Modern Research Center for TCM Tsinghua University Beijing 100084 China Division of Biotechnology and Medicine Department of Social Development Ministry of Science and Technology of China Beijing 100862 China Tianjin University of Traditional Chinese Medicine Tianjin 300193 China Xiyuan Hospital China Academy of Chinese Medical Sciences Beijing 100091 China State Research Center for R&D of TCM Multi-ingredient Drugs Beijing 100075 China School of Pharmacy Shanghai Jiao Tong University Shanghai 200030 China
Abstract Along with frequently changed human disease spectrums, multicomponent drugs have attracted increasing attention of the mainstream international medical community. Traditional Chinese Medicine (TCM) has been d... 详细信息
来源: 评论
3dAV integrated system featuring arbitrary listening-point and viewpoint generation
3DAV integrated system featuring arbitrary listening-point a...
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IEEE Workshop on Multimedia Signal Processing
作者: Mehrdad Panahpour Tehrani Kenta Niwa Norishige Fukushima Yasushi Hirano Toshiaki Fujii Masayuki Tanimoto Kazuya Takeda Kenji Mase Akio Ishikawa Shigeyuki Sakazawa Atsushi Koike Visual Communications Laboratory KDDI R&D Laboratories Inc. Fujimino Saitama Japan Department of Information Science Nagoya University Nagoya Aichi Japan Department of Electrical Engineering and Computer Science Nagoya University Nagoya Aichi Japan Information Technology Centre Nagoya University Nagoya Aichi Japan Visual Communications Laboratory KDD Research and Development Laboratories Inc. Fujimino Saitama Japan
In this paper, we propose two novel methods for arbitrary listening-point generation for 3d audio-video (3dAV) integration in a large-scale multipoint cameras and microphones system with abilities to process, and disp... 详细信息
来源: 评论
Investigation of Mobility in Twin Silicon Nanowire MOSFETs (TSNWFETs)
Investigation of Mobility in Twin Silicon Nanowire MOSFETs ...
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2008 9th International Conference on Solid-State and Integrated-Circuit technology
作者: Junsoo Kim Seungwon Yang Jaehong Lee Sung dae Suk Kangil Seo donggun Park Byung-Gook Park Jong duk Lee Hyungcheol Shin Nano Systems Institute (NSI) Inter-University Semiconductor Research Center (ISRC)and School of Electrical EngineeringSeoul National UniversitySan 56-1Shinlim-dongKwanak-kuSeoulKorea Advanced Technology Development Team1 R&D CenterSamsung Electronics Co.San 24Kiheung-GuYongin-City Kyunggi-DoKorea449-711
The transport characteristics of cylindrical gate-all-around twin silicon nanowire field-effect transistors with radius of 5 nm have been investigated. Mobility was estimated by extracting of source/drain resistance.
来源: 评论
Neutron-induced soft errors in advanced flash memories
Neutron-induced soft errors in advanced flash memories
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International Electron devices Meeting (IEdM)
作者: G. Cellere S. Gerardin M. Bagatin A. Paccagnella A. Visconti M. Bonanomi S. Beltrami P. roche G. Gasiot r. Harboe Sorensen A. Virtanen C. Frost P. Fuochi C. Andreani G. Gorini A. Pietropaolo S. Platt DEI University of Padova Padova Italy Numonyx R&D - Technology Development Agrate-Brianza Italy STMicroelectronics Crolles France ESA ESTEC Noordwijk Netherlands Accelerator Laboratory University of Jyväskylä Finland Rutherford Appleton Laboratory ISIS Facility Didcot UK CNR-ISOF Bologna Italy Università di Roma Tor Vergata Italy Università di Milano-Bicocca Italy University of Central Lancashire UK
Atmospheric neutrons are a known source of Soft Errors (SE), in static and dynamic CMOS memories. This paper shows for the first time that atmospheric neutrons are able to induce SE in Flash memories as well. detailed... 详细信息
来源: 评论
Two-bit Cell Operation in diode-Switch Phase Change Memory Cells with 90nm technology
Two-bit Cell Operation in Diode-Switch Phase Change Memory C...
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Symposium on VLSI technology
作者: d. H. Kang J. H. Lee J. H. Kong d. Ha J. Yu C. Y. Um J. H. Park F. Yeung J. H. Kim W. I. Park Y. J. Jeon M. K. Lee Y. J. Song J. H. Oh G. T. Jeong H. S. Jeong Advanced Technology Development Team 2 Memory R&D Div. Samsung Electronics Co. Ltd. San #24 Nongseo-Dong Giheung-Gu Yongin-City Gyunggi-Do 449-711 South Korea
This paper firstly reports key factors which are to be necessarily considered for the successful two-bit (four-level) cell operation in a phase-change random access memory (PrAM). They are 1) the write-and-verify (WAV... 详细信息
来源: 评论