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检索条件"机构=Research and Development of Advanced Software System Laboratory"
346 条 记 录,以下是291-300 订阅
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Walking Phase Recognition for People with Lower Limb Disability
Walking Phase Recognition for People with Lower Limb Disabil...
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IEEE International Conference on Rehabilitation Robotics (ICORR)
作者: Sang Wan Lee Taeyoub Yi Jeong-Su Han Hyoyoung Jang Heon-Hui Kim Jin-Woo Jung Zeungnam Bien Electrical Engineering and Computer Science Department Korean Advanced Institute of Science and Technology Daejeon South Korea Core Technology Laboratory Digital Appliances Research and Development Center Samsung Electronics Company Limited Suwon South Korea Human-friendly Welfare Robot System Engineering Research Center Korean Advanced Institute of Science and Technology Daejeon South Korea Computer Engineering Department Dongguk University Seoul South Korea
This paper presents a total solution on EMG signal-based walking phase recognition for people with lower limb disability. Various environmental factors such as sensed location, walking speed, and ground inclination ar... 详细信息
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Mutiple-view object tracking using metadata
Mutiple-view object tracking using metadata
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International Conference on Wavelet Analysis and Pattern Recognition (ICWAPR)
作者: Inho Paek Changhan Park Myeongsuk Ki Kyoungju Park Joonki Paik Image Processing and Intelligent System Laboratory Department of Image Engineering Chung-Ang University Seoul South Korea Advanced Technology Research & Development Center Samsung Thales Company Limited Yongin si Gyeonggi South Korea Digital Broadcasting Research Division ETRI Electronics and Telecommunication Research Institute Daejeon South Korea Next Generation Imaging Contents Laboratory Department of Image Engineering Chung-Ang University Seoul South Korea
In this paper we present a moving object tracking method in a multiple camera tracking system using meta-data. The proposed method acquires image sequences from multiple fixed cameras without a priori camera calibrati... 详细信息
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A 55 TFLOPS simulation of amyloid-forming peptides from yeast prion Sup35 with the special-purpose computer system MDGRAPE-3
A 55 TFLOPS simulation of amyloid-forming peptides from yeas...
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2006 ACM/IEEE Conference on Supercomputing, SC'06
作者: Narumi, Tetsu Ohno, Yousuke Okimoto, Noriaki Koishi, Takahiro Suenaga, Atsushi Futatsugi, Noriyuki Yanai, Ryoko Himeno, Ryutaro Fujikawa, Shigenori Taiji, Makoto Ikei, Mitsuru Intel K.K. High Performance Molecular Simulation Team Genomic Sciences Center Innovative Nanopatterning Laboratory Topochemical Design Laboratory Frontier Research System Advanced Center for Computing and Communication Software and Solutions Group Parallel and Distributed Solutions Group
We have achieved a sustained performance of 55 TFLOPS for molecular dynamics simulations of the amyloid fibril formation of peptides from the yeast Sup35 in an aqueous solution. For performing the calculations, we use... 详细信息
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Filling a narrow and high aspect-ratio trench with electro-cu plating
Filling a narrow and high aspect-ratio trench with electro-c...
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作者: Chonan, Yasunori Komiyama, Takao Onuki, Jin Nagano, Takahiro Akahoshi, Haruo Itabashi, Takeyuki Saito, Tatuyuki Khoo, Khyoupin Department of Electronics and Information Systems Factory of System Science and Technology Akita Prefectual University Yurihonjyo 015-0055 Japan Department of Materials Science and Engineering Ibaraki University Hitachi 316-8511 Japan Intellexres Laboratory Hitachi 316-0015 Japan Hitachi Research Laboratory Hitachi 319-1292 Japan Advanced Research Laboratory Hitachi Ltd. Hatoyama 350-0395 Japan Hitachi Ltd. Hitachi Device Development Center 198-8512 Japan
Copper electroplating has been used for making interconnections in large-scale integration (LSI). Sub-100-nm-wide, deep trenches with aspect-ratios over 6 were fully filled by optimizing DC and pulse electroplating pr... 详细信息
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Ultra Low Voltage Operations in Bulk CMOS Logic Circuits with Dopant Segregated Schottky Source/Drain Transistors
Ultra Low Voltage Operations in Bulk CMOS Logic Circuits wit...
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International Electron Devices Meeting (IEDM)
作者: T. Kinoshita R. Hasumi M. Hamaguchi K. Miyashita T. Komoda A. Kinoshita J. Koga K. Adachi Y. Toyoshima T. Nakayama S. Yamada F. Matsuoka System LSI Division I Toshiba Corporation Yokohama Japan Advanced LSI Technology Laboratory Corporate Research and Development Center Toshiba Corporation Yokohama Japan
Ultra low power circuit operation is demonstrated with dopant segregated Schottky (DSS) source/drain transistors for the first time. DSS greatly improves propagation delay in multiple fan-in NAND gates at constant sta... 详细信息
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Comprehensive Study on Injection Velocity Enhancement in Dopant-Segregated Schottky MOSFETs
Comprehensive Study on Injection Velocity Enhancement in Dop...
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International Electron Devices Meeting (IEDM)
作者: A. Kinoshita T. Kinoshita Y. Nishi K. Uchida S. Toriyama R. Hasumi J. Koga Advanced LSI Technology Laboratory Corporate Research and Development Center Toshiba Corporation Yokohama Japan System LSI Division I Toshiba Corporation Semiconductor Company Yokohama Japan
The carrier transport in dopant-segregated Schottky (DSS) and conventional MOSFETs was thoroughly investigated in terms of carrier injection velocity, v inj . It was found that v inj enhancement associated with the v... 详细信息
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development of a video-rate rangefinder system using light intensity modulation with scanning laser light
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systems and Computers in Japan 2006年 第3期37卷 20-31页
作者: Azuma, Takeo Uomori, Kenya Nobori, Kunio Morimura, Atsushi Advanced Technology Research Laboratories Matsushita Electric Industrial Co. Ltd. Kyoto 619-0237 Japan Corporate Engineering Division Panasonic System Solutions Company Matsushita Electric Industrial Co. Ltd. Yokohama 223-8639 Japan Intelligent Processing Technology Research Laboratory Development Center Corporate Engineering Division Panasonic System Solutions Company
We have developed an active rangefinder system that can obtain depth images at video field rates by improving Carrihill's intensity ratio depth sensor. Although the depth sensor can be made at low cost, its depth ... 详细信息
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Irregular buffer-zone partitioning reducing synchronization cost in SAMR
Irregular buffer-zone partitioning reducing synchronization ...
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International Symposium on Parallel and Distributed Processing (IPDPS)
作者: J. Steensland Advanced Software Research and Development Sandia National Laboratory Livermore CA USA
Achieving good scalability for large simulations based on structured adaptive mesh refinement is non-trivial. Performance is limited by the partitioner's ability to efficiently use the underlying parallel computer... 详细信息
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Ultra-low standby power (U-LSTP) 65-nm node CMOS technology utilizing HfSiON dielectric and body-biasing scheme
Ultra-low standby power (U-LSTP) 65-nm node CMOS technology ...
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Symposium on VLSI Technology
作者: N. Kimizuka Y. Yasuda T. Iwamoto I. Yamamoto K. Takano Y. Akiyama K. Imai Advanced Device Development Division NEC Electronics Corporation Limited Sagamihara Kanagawa Japan System Device Research Laboratory NEC Corporation Limited Sagamihara Kanagawa Japan
This paper reports 65-nm node ultra-low standby power CMOS technology for mobile applications, utilizing the combination of HfSiON FET and back-biasing scheme for the first time. With well-optimized channel, offset-sp... 详细信息
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Impact of parasitic resistance and silicon layer thickness scaling for strained-silicon MOSFETs on relaxed Si/sub 1-x/Ge/sub x/ virtual substrate
Impact of parasitic resistance and silicon layer thickness s...
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International Electron Devices Meeting (IEDM)
作者: H. Kawasaki K. Ohuchi A. Oishi O. Fujii H. Tsujii T. Ishida K. Kasai Y. Okayama K. Kojima K. Adachi N. Aoki T. Kanemura D. Hagishima M. Fujiwara S. Inaba K. Ishimaru N. Nagashima H. Ishiuchi Toshiba Corporation Semiconductor Company Yokohama Japan System LSI Division I SoC Research and Development Center Yokohama Japan Advanced LSI Technology Laboratory Toshiba Corporation Yokohama Japan Semiconductor Technology Development Group Sony Corporation Yokohama Japan
This paper discusses the root causes of the fact that only slight performance improvement of MOSFET with strained-Si substrate has been achieved in short channel region (L < 100 nm). The performance improvement in ... 详细信息
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