The charging characteristics of Sb nanocrystals embedded in organic semiconductor copper phthalocyanine (CuPc) have been studied for the first time. The images from atomic force microscopy show that Sb NCs grown on th...
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A novel tunable three-dimensional (3D) photonic crystals is demonstrated based on the photoinduced deformation of the azobenzene crosslinked liquid-crystalline polymers(CLCPs). A nanoimprinting approach is utilized to...
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Porous organosilica thin films using 1,2-bis(triethoxysily)ethane, triethoxymethylsilane and a poly (ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) triblock copolymer template have been prepared by spin-on...
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Among current outstanding research problems in NoC Design, mapping application onto NoC is one of the core issues to be explored. In this paper, we propose two methods for mapping a pip elined flow chart onto mesh-bas...
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F-doped SiOCN films with low dielectric constant have been prepared using SiH_4, C2F6 and N2O as reactants by PECVD, and characterized by X-ray photoelectron spectroscopy (XPS), capacitance -voltage (C-V) and current-...
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F-doped SiOCN films with low dielectric constant have been prepared using SiH_4, C2F6 and N2O as reactants by PECVD, and characterized by X-ray photoelectron spectroscopy (XPS), capacitance -voltage (C-V) and current-voltage (I-V) measurements, and nanoindenter. With an increment of the flow rate of C2F6, the concentrations of fluorine and carbon incorporated in the films increase, and the concentration of nitrogen decreases. This leads to a decrease in the dielectric constant of the film. When the flow rate of C2F6 is 750 sccm, the percentages of C and F elements amount to 5.2% and 9.9%, respectively. Meanwhile, the resulting dielectric constant is reduced to 2.6, and the leakage current density is lower than 3×10-8 A/cm2 at lMV/cm. The hardness and Young's modulus of the films are higher than 3 GPa and 84 GPa, respectively. It is thus believed that the introduction of carbon and fluorine can lower the dielectric constant of the films, and the presence of N can improve the mechanical properties of film.
A high performance plasmonic thermal emitter with narrow bandwidth emission property were proposed and fabricated. This emitter is based on a metal coated two-dimensional (2D) photonic crystal of air holes in a silico...
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ISBN:
(纸本)9781424457977
A high performance plasmonic thermal emitter with narrow bandwidth emission property were proposed and fabricated. This emitter is based on a metal coated two-dimensional (2D) photonic crystal of air holes in a silicon substrate. The PC structure is found to be highly effective in suppressing the thermal emission, which can yield 2 orders of magnitude more efficient that conventional IR sources. Thermally isolated, uniformly heated emitters, with photonic crystal structure modified surfaces are exploited for narrowband spectral tuning in the infrared wavelength regime. The results show that narrow band spectral tuning is accomplished through control of the lattice constant of the PC patterns.
A model for the Symmetric Double-Gate (SDG) n-MOSFET is presented. Poisson equation is solved analytically and channel potential is obtained. The analytical expression for subthreshold swing is achieved. Model results...
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ISBN:
(纸本)9781424458660;9781424458691
A model for the Symmetric Double-Gate (SDG) n-MOSFET is presented. Poisson equation is solved analytically and channel potential is obtained. The analytical expression for subthreshold swing is achieved. Model results are compared with Medici simulations, good agreement is observed. The subthreshold swing of an SDG MOSFET will be improved by increasing the channel length, by reducing either the silicon body thickness or the gate oxide thickness, and by increasing the silicon body doping concentration.
A specific and high-sensitive immunosensor for detecting pulmonary tuberculosis (TB) markers in human serum is presented by miniaturizing array of microelectrodes via micro electro-mechanical system (MEMS) for multi-c...
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Further scaling of complementary metal-oxide-semiconductor (CMOS) technology in accordance with Moore’s law will require various novel materials such as high-k dielectrics, metal gates, and high-mobility channels. ...
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Further scaling of complementary metal-oxide-semiconductor (CMOS) technology in accordance with Moore’s law will require various novel materials such as high-k dielectrics, metal gates, and high-mobility channels. III-V compound semiconductors such as GaAs and InGaAs have attracted renewed attention for high-speed MOS field-effect transistors (MOSFETs) due to their higher carrier mobility compared with that of Si. However, the performance of GaAs-based MOSFETs is often limited by the high density of interfacial trap states (Dit), which lead to the surface Fermi level pinning at the midgap. It is reported that the Fermi level is pinned by defect levels induced by surface species such as As-O bonds, Ga-O bonds, elemental As, and Ga or As antisites in the GaAs near-surface region. Consequently, there is a great need to develop an efficient GaAs surface passivation technique and a thermally stable dielectric/GaAs interface. For Al2O3 films grown by atomic layer deposition using trimethylaluminum (TMA), a self-cleaning effect on the reduction of the surface oxides was reported. We also have demonstrated a new self-cleaning process for GaAs surface passivation based on dimethylaluminum (DMAH) and investigated the DMAH pretreatment time to influence the interface quality recently. It is still of interest to characterize the effect of pretreatment temperature on the extent of interface reaction. In this work, the evolution of interface between aluminum oxide and GaAs as a function of the DMAH pretreatment temperature is studied by using x-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM).
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