An analytical model for threshold voltage of the normally-off Ga N-based fin-shaped field-effect transistor(Fin FET) is obtained. Analytical expressions for the threshold voltage and its roll-off effect are *** design...
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ISBN:
(纸本)9781467397209
An analytical model for threshold voltage of the normally-off Ga N-based fin-shaped field-effect transistor(Fin FET) is obtained. Analytical expressions for the threshold voltage and its roll-off effect are *** design insights can be obtained from the results. The explicit expression for threshold voltage makes the model suitable to be embedded in circuit simulation and design tools.
In recent years, the development of miniature gas sensors based on silicon technology is being increasingly emphasized. Most of the devices reported are based on micro-hot plates, but the materials they used are not f...
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This paper presents a 6-bit 800MS/s successive approximation register (SAR) analog-to digital converter (ADC) in 28nm CMOS with grouped digital-to-analog converter (DAC) capacitor array. High-speed operation is achiev...
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In this work, we have explored the automatic design of an operational amplifier using multi-objective optimization technique. The design parameters of the circuit, including transistor sizes, bias current and load cap...
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Gate diffusion input (GDI) is a new technology of digital circuit design for low power. Compared with traditional CMOS technology, GDI technology can reduce the power consumption, the propagation delay and the circuit...
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In this work, we investigate analytically quantum mechanical (QM) effects on the threshold voltage (VTH) shift of the surrounding-gate (SG) MOSFETs. We show how VTH is influenced with QM effects with the consideration...
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This paper reviews our recent work on two novel semiconductor devices built on silicon-on-insulator (SOI) substrate. The Z2-FET, which operates with feedback mechanism, has been demonstrated with extremely sharp switc...
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In this paper, we study the effects of an unintional dopant in the channel on the current-voltage characteristics of a Double Gate (DG) Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET). Non-Equilibrium Green...
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This paper presents a high speed and low distortion sampler with two-channel time-interleaved sampler with track-and-hold amplifier (THA). The THA is based on switched source-follower with active inductor load such th...
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As the channel length of metal-oxide-semiconductor field-effect transistors (MOSFETs) scales into the nanometer regime, quantum mechanical effects are becoming more and more significant. In this work, a model for th...
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As the channel length of metal-oxide-semiconductor field-effect transistors (MOSFETs) scales into the nanometer regime, quantum mechanical effects are becoming more and more significant. In this work, a model for the surrounding-gate (SG) nMOSFET is developed. The SchrSdinger equation is solved analytically. Some of the solutions are verified via results obtained from simulations. It is found that the percentage of the electrons with lighter conductivity mass increases as the silicon body radius decreases, or as the gate voltage reduces, or as the temperature decreases. The eentroid of inversion-layer is driven away from the silicon-oxide interface towards the silicon body, therefore the carriers will suffer less scattering from the interface and the electrons effective mobility of the SG nMOSFETs will be enhanced.
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