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检索条件"机构=Science and Technology on Monolithic Intergrated Circuits and Modules Laboratory"
192 条 记 录,以下是51-60 订阅
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Effect of X-ray irradiation on threshold voltage of AlGaN/GaN HEMTs with p-GaN and MIS Gates
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Nanotechnology and Precision Engineering 2020年 第4期3卷 241-243页
作者: Yongle Qi Denggui Wang Jianjun Zhou Kai Zhang Yuechan Kong Suzhen Wu Tangsheng Chen Science and Technology on Monolithic Integrated Circuits and Modules Laboratory Nanjing Electronic Devices InstituteNanjing 210016China China Electronics Technology Group Corporation No.58 Research Institute Wuxi 204035China
Commercially available AlGaN/GaN high-electron-mobility transistors(HEMTs)are beginning to enter the public scene froma range of *** on previous studies,commercial GaN-based electronics are expected to be tolerant to ... 详细信息
来源: 评论
Simulation, fabrication and characterization of 4500v 4H-SiC normallyoff VJFET
Simulation, fabrication and characterization of 4500v 4H-SiC...
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2013 International Conference on Precision Mechanical Instruments and Measurement technology, ICPMIMT 2013
作者: Huang, Run Hua Chen, Gang Bai, Song Li, Rui Li, Yun Tao, Yong Hong Science and Technology on Monolithic Integrated Circuits and Modules Laboratory Nanjing China Nanjing Electronic Devices Institute Nanjing China
Simulation, Fabrication and characteristics of high voltage, normally-off JFETs in 4HSiC are presented. The devices were built on ND= 1.0×1015 cm-3 doped 50μm thick n-type epilayer grown on a n+ 4H-SiC. Paramete... 详细信息
来源: 评论
Development of self-aligned process to decrease gate length in recessed SiC SIT
Development of self-aligned process to decrease gate length ...
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2014 International Conference on Manufacturing technology and Electronics Applications, ICMTEA 2014
作者: Chen, Gang Bai, Song Wang, Lin Tao, Yong Hong Liu, Haiqi Science and Technology on Monolithic Integrated Circuits and Modules Laboratory Nanjing China Nanjing Electronic Devices Institute Nanjing China
Because of difficulty in deep ion implantation, the recessed gate structure has been favored in SiC SIT. In order to improve the frequency, it is a good method to decrease the gate length by eliminating the side wall ... 详细信息
来源: 评论
The performance of thin barrier InAlN/AlN/GaN MIS HEMT with high dielectric insulators
The performance of thin barrier InAlN/AlN/GaN MIS HEMT with ...
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2010 International Conference on Microwave and Millimeter Wave technology, ICMMT 2010
作者: Zhou, J.J. Dong, X. Liu, H.Q. Chen, T.S. Chen, C. National Key Laboratory of Science technology on Monolithic Integrated Circuits and Modules Nanjing Electronic Devices Institute Nanjing 210016 China
High quality thin barrier InAlN/AlN/GaN heterostructure was grown by metal-organic chemical vapor deposition (MOCVD). The metal-insulator- semiconductor (MIS) structure devices were fabricated with high dielectric con... 详细信息
来源: 评论
Fabrication and application of 1.7KV SiC-Schottky diodes
Fabrication and application of 1.7KV SiC-Schottky diodes
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European Conference on Silicon Carbide and Related Materials, ECSCRM 2014
作者: Chen, G. Bai, S. Liu, A. Wang, L. Huang, R.H. Tao, Y.H. Li, Y. Science and Technology on Monolithic Integrated Circuits and Modules Laboratory Nanjing China Nanjing Electronic Devices Institute Nanjing China
High voltage 4H-SiC Ni metal junction barrier schottky (JBS) diode with reverse breakdown voltage of 1700 V and forward current of 5 A has been fabricated. A low reverse leakage current below 3.8×10-5 A/cm2 at th... 详细信息
来源: 评论
W-band AlGaN/GaN MMIC PA with 3.1W output power  14
W-band AlGaN/GaN MMIC PA with 3.1W output power
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14th China International Forum on Solid State Lighting: International Forum on Wide Bandgap Semiconductors China, SSLChina: IFWS 2017
作者: Shaobing, Wu Fangjin, Guo Jianfeng, Gao Weibo, Wang Zhonghui, Li Nianning, Huang Tangsheng, Chen Science and Technology on Monolithic Integrated Circuits and Modules Laboratory Nanjing Electronic Devices Institute East Zhongshan Road Nanjing China
A balanced four-stage W-band GaN MMIC PA with Lange couplers and micro-strips matching elements is reported. Electron-beam lithography has been used to produce a 100 nm T-shaped gate on the AlGaN/GaN HEMT structure wi... 详细信息
来源: 评论
A 2-18 GHz 6-Bit GaAs Positive Voltage Driven Digitally Controlled Attenuator for Phased Array
A 2-18 GHz 6-Bit GaAs Positive Voltage Driven Digitally Cont...
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2023 IEEE International Symposium on Antennas and Propagation, ISAP 2023
作者: Yan, Liwei Peng, Shuang Zhang, Kai Wang, Ziqiang Liu, Chenxi Yang, Fei Wves Southeast University State Key Laboratory of Millimeter Nanjing China Science and Technology on Monolithic Integrated Circuits and Modules Laboratory Nanjing China
In this paper, an ultra-wideband 6-bit digitally controlled attenuator MMIC for the active phased array that integrates positive voltage digital driving circuits was developed, utilizing GaAs enhanced and depletion mo... 详细信息
来源: 评论
Fabrication of L band 4H-SiC SiT devices
Fabrication of L band 4H-SiC SiT devices
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2013 International Conference on Precision Mechanical Instruments and Measurement technology, ICPMIMT 2013
作者: Chen, Gang Jiang, Hao Zhong, Shi Chang Bai, Song Science and Technology on Monolithic Integrated Circuits and Modules Laboratory Nanjing 210016 China Nanjing Electronic Device Institute Nanjing 210016 China
Silicon carbide (SiC) static induction transistors (SITs) were fabricated using homegrown epi structures. The gate is a recessed gate - bottom contact (RG - B). The mesa space designed is 2.5 μm and the gate channel ... 详细信息
来源: 评论
Millimeter-wave design and fabrication of GaAs micromachined patch antenna
Millimeter-wave design and fabrication of GaAs micromachined...
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2012 IEEE MTT-S International Microwave Workshop Series on Millimeter Wave Wireless technology and Applications, IMWS 2012
作者: Pan, Li-Na Jia, Shi-Xing Hou, Fang Zhu, Jian Yu, Yuan-Wei Nanjing Electronic Devices Institute Nanjing 210016 China Science and Technology on Monolithic Integrated Circuits and Modules Laboratory Nanjing 210016 China
A patch antenna at Ka-band frequency based on GaAs micromachined technologies is presented in this paper. The antenna fabricated on 300μm-thick GaAs substrate with a cavity etched in it produces a low effective diele... 详细信息
来源: 评论
Modeling Techniques for MHEMT Devices up to 110GHz  13
Modeling Techniques for MHEMT Devices up to 110GHz
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13th International Conference on Microwave and Millimeter Wave technology, ICMMT 2021
作者: Lu, Haiyan Wu, Shaobin Chen, Jixin Chen, Tangsheng Science And Technology On Monolithic Integrated Circuits And Modules Laboratory Nanjing China Southeast University China Nanjing Electronic Devices Institute China
This paper mainly introduces a method to build a nonlinear model of MHEMT, mainly to solve the problem of short channel effect of MHEMT. In order to accurately characterize the active devices below 110GHz, a LRRM cali... 详细信息
来源: 评论