作者：
Fangjun XuGuangze TangXinxin MaSun MingrenLiqin WangKen YukimuraG.E.OzurSchool of Material Science & Engineering
Harbin Institute of Technology Harbin 150001 China National Key Laboratory of Science and Technology on Precision Hot Processing of Metals Harbin Institute of Technology Harbin 150001 China State Key Lab of Advanced Welding Production Technology Harbin Institute of Technology Harbin150001China School of Mechatronics Engineering Harbin Institute of Technology Harbin 150001 China School of Material Science & Engineering Harbin Institute of Technology Harbin 150001 China Institute of High Current Electronics 4 Academichesky Av. Tomsk 634055 Russia State Key Lab of Advanced Welding Production Technology
Harbin Institute of Technology Harbin150001China
作者：
Kaijie LinGuangze TangYujiang WangXinxin MaKen YukimuraSchool of Materials Science and Engineering
Harbin Institute of TechnologyHarbin 150001China National Key Laboratory of Science and Technology on Precision Hot Processing of MetalsHarbin Institute of TechnologyHarbin 150001China National Key Laboratory for RemanufacturingAcademy of Armored Forces EngineeringBeijing 100072China State Key Lab of Advanced Welding Production TechnologyHarbin Institute of TechnologyHarbin 150001China
A soft X-ray pulse height analysis (PHA) system has been designed and installed on J-TEXT tokamak for the study of electron temperature and *** system contains three Silicon Drift Detectors (SDD),a multi-channel analy...
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A soft X-ray pulse height analysis (PHA) system has been designed and installed on J-TEXT tokamak for the study of electron temperature and *** system contains three Silicon Drift Detectors (SDD),a multi-channel analyzer (MCA),vacuum chamber,data collection procedure and off-line data processing program.A 60ms temporal resolution of electron temperature and the line radiation from moderate and high Z metallic impurities can be obtained by PHA *** on this SyStcm the performances of electron temperature and impurity have been investigated in J-TEXT ohmic heated plasmas.
The metalized film capacitor can work under a high electric field due to its self-healing characteristic. But when the capacitor is charged rapidly to a specified high voltage (under a high electric field) and then it...
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ISBN:
(纸本)9781457709852
The metalized film capacitor can work under a high electric field due to its self-healing characteristic. But when the capacitor is charged rapidly to a specified high voltage (under a high electric field) and then it is disconnected from the power supply, a significant voltage drop will be observed, so the capacitor energy efficiency will reduce. It can be observed that the general curve of the voltage decay has a rapid initial drop and then the curve can usually be fit to a pure exponential. Firstly, this paper analyses the factors which cause the voltage decay through experimental study. The research results show that electric field strength, operating temperature and hold time play important roles in the voltage decay process. The higher the electric field or operating temperature is, the more significant the voltage drop is. If the voltage of the capacitor is maintained for a specified period of time, the voltage drop will reduce significantly. Through these experimental results, it is revealed that the voltage drop is mainly related to leakage and polarization. So the insulation resistance at various temperatures under high electric field is tested by the special technique. The results of insulation resistances are consistent with the voltage decay at various temperatures. Moreover, the interfacial polarization which exists in the charging process of metalized film capacitor is discussed. The interfacial polarization causes the rapid initial voltage decay.
Titanium nitride （TIN） films were deposited on AISI 304 stainless steel substrates using hollow cathode plasma physical vapor deposition （HC-PVD）. Titanium was introduced by eroding the Ti cathode nozzle and TiN w...
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Titanium nitride （TIN） films were deposited on AISI 304 stainless steel substrates using hollow cathode plasma physical vapor deposition （HC-PVD）. Titanium was introduced by eroding the Ti cathode nozzle and TiN was formed in the presence of a nitrogen plasma excited by radio frequency （RF）. The substrate bias voltage was varied from 0 to -300 V and the uniformity in film thickness, surface roughness, crystal size, microhardness and wear resistance for the film with a diameter of 20 mm was evaluated. Although the central zone of the plasma had the highest ion density, the film thickness did not vary appreciably across the sample. The results from atomic force microscopy （AFM） revealed a low surface roughness dominated by an island-like morphology with a similar crystal size on the entire surface. Higher microhardness was measured at the central zone of the sample. The sample treated at -200 V had excellent tribological properties and uniformity.
Abstract In this paper, a discontinuous projection-based output feedback adaptive robust learning control (OARLC) scheme is constructed for a class of nonlinear systems in a semi-strict feedback form by incorporating ...
Abstract In this paper, a discontinuous projection-based output feedback adaptive robust learning control (OARLC) scheme is constructed for a class of nonlinear systems in a semi-strict feedback form by incorporating an observer and a dynamic normalization signal. Since only output signal is available for measurement, an observer is firstly designed to provide exponentially convergent estimates of the unmeasurable states. Using certain known basis functions to capture the characteristics of unknown general periodic disturbances, the discontinuous projection type adaptation law can then be used to tune the amplitudes of those basis functions on-line to recover the unknown general periodic disturbances asymptotically. The estimation errors due to the unknown initial states, uncompensated disturbances, and the uncertain nonlinearities are also effectively dealt with via certain robust feedback at each step of the proposed OARLC backstepping design. The resulting controller achieves a guaranteed transient and a prescribed final tracking accuracy for output tracking performance. In addition, when the general periodic disturbances fall within the approximation ranges of the periodic basis functions, asymptotic output tracking performance is achieved as well.
Zr-based bulk metallic glasses (BMGs) are a new type of metallic materials with disordered atomic structure that exhibit high strength and high elastic strain,relatively low Young's modulus, and excellent corrosio...
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Zr-based bulk metallic glasses (BMGs) are a new type of metallic materials with disordered atomic structure that exhibit high strength and high elastic strain,relatively low Young's modulus, and excellent corrosion resistance and biocompatibility. The combination of these unique properties makes the Zr-based BMGs very promising for biomaterials applications. In this review article, the authors give an overview of the recent progress in the study of biocompatibility of Zr-based BMGs,especially the relevant work that has been done in the metallic glasses group in Huazhong University of Science and technology (HUST), including the development of Ni-free Zr-based BMGs, the mechanical and wear proper-ties, the bio-corrosion resistance, the in vitro and in vivo biocompatibility and the bioactive surface modification of these newly developed BMGs.
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