Time interval of slow polarization reversal in ferroelectric thin films is broadened over more than two decades to disobey the classical Kolmogorov-A vrami-Ishibashi (KAI) equation as the applied field approaches th...
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Time interval of slow polarization reversal in ferroelectric thin films is broadened over more than two decades to disobey the classical Kolmogorov-A vrami-Ishibashi (KAI) equation as the applied field approaches the coercive field of domain switching. The assumption of a Lorentzian distribution of logarithmic waiting times of reversed domain nucleation in this equation can resolve this dilemma. In our work, we explain this equation from the coercive-voltage distribution in thin films, and derive a similar function to describe slow polarization reversal from the consideration of a long-time imprint effect rather than the KAI model.
A differential LC voltage controlled oscillator (VCO) employing parasitic vertical-NPN (V-NPN) transistors as a negative gm-cell is presented to improve the close-in phase noise. The V-NPN transistors have lower f...
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A differential LC voltage controlled oscillator (VCO) employing parasitic vertical-NPN (V-NPN) transistors as a negative gm-cell is presented to improve the close-in phase noise. The V-NPN transistors have lower flicker noise compared to MOS transistors. DC and AC characteristics of the V-NPN transistors are measured to facilitate the VCO design. The proposed VCO is implemented in a 0.18 μm CMOS RF/mixed signal process, and the measurement results show the close-in phase noise is improved by 3.5-9.1 dB from 100 Hz to 10 kHz offset compared to that of a similar CMOS VCO. The proposed VCO consumes only 0.41 mA from a 1.5 V power supply.
We developed a simplified nanofabrication process for imprint templates by fast speed electron beam lithography(EBL) and a dry etch technique on a SiNx substrate,intended for large area *** this end,the highly sensi...
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We developed a simplified nanofabrication process for imprint templates by fast speed electron beam lithography(EBL) and a dry etch technique on a SiNx substrate,intended for large area *** this end,the highly sensitive chemically amplified resist(CAR),NEB-22,with negative tone was *** EBL process first defines the template pattern in NEB-22,which is then directly used as an etching mask in the subsequent reactive ion etching(RIE) on the SiNx to form the desired *** properties of both e-beam lithography and dry etch of NEB-22 were carefully studied,indicating significant advantages of this process with some drawbacks compared to when Cr was used as an etching ***,our results open up a good opportunity to fabricate high resolution imprint templates with the prospect of wafer scale manufacturing.
We demonstrate electrically-pumped room-temperature continuous-wave lasing in InP-based microdisks lasers with threshold current of 5mA. A defect on the disc circumference is used to extract the light and to achieve h...
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We demonstrate electrically-pumped room-temperature continuous-wave lasing in InP-based microdisks lasers with threshold current of 5mA. A defect on the disc circumference is used to extract the light and to achieve high quality single mode operation.
This paper presents a theoretical study on the possible realization of high frequency ultrasonic phased array transducer (f>100 MHz) using MEMS technologies. A silicon based lithium niobate (LiNbO3) single crystal ...
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ISBN:
(纸本)9781424457977
This paper presents a theoretical study on the possible realization of high frequency ultrasonic phased array transducer (f>100 MHz) using MEMS technologies. A silicon based lithium niobate (LiNbO3) single crystal linear array is considered. Finite element method is employed for the simulation optimization design of such device. Continuous wave beam steering, focusing under different array and matching conditions are simulated and the beam performance is analyzed. The inter-element crosstalking and the element electrical impedance are also calculated.
The electrical levels of defects of high- k dielectric Zr O2 films deposited with different oxygen fluxes have been investigated using x-ray diffraction, x-ray photoelectron spectroscopy, and spectroscopic ellipsometr...
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We report the chemical self-assembly growth of Au nanocrystals on atomic-layer-deposited HfO2 films aminosilanized by (3-Aminopropyl)-trimethoxysilane aforehand for memory applications. The resulting Au nanocrystals...
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We report the chemical self-assembly growth of Au nanocrystals on atomic-layer-deposited HfO2 films aminosilanized by (3-Aminopropyl)-trimethoxysilane aforehand for memory applications. The resulting Au nanocrystals show a density of about 4 × 10^11 cm^-2 and a diameter range of 5-8nm. The metal-oxide-silicon capacitor with double-layer Au nanocrystals embedded in HfO2 dielectric exhibits a large C - V hysteresis window of 11.9 V for ±11 V gate voltage sweeps at 1MHz, a flat-band voltage shift of 1.5 V after the electrical stress under 7 V for 1ms, a leakage current density of 2.9 × 10^-8 A/cm^-2 at 9 V and room temperature. Compared to single-layer Au nanocrystals, the double-layer Au nanocrystals increase the hysteresis window significantly, and the underlying mechanism is thus discussed.
Multilayers of poly(p-xylyleneviologen) (PXV) and calf thymus DNA were constructed on the gold surface by layer-by-layer (LBL) method. The assembly process was examined by quartz crystal microbalance (QCM) measurement...
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This paper presents a novel phase discriminator called robust digital phase discriminator (RDPD) for the one-bit analog-to-digital conversion (ADC) software-defined receivers. Different from existing digital phase dis...
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In this work, a trilayer technique used in the nanoimprint lithography process to replicate the templates is developed. The SU-8/SiO 2/PMMA trilayer was used. The photosensitive epoxy (SU8 resist) which has a low glas...
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