The epitaxial growth of a high-quality silicon layer on double-layer porous silicon by ultra-high vacuum/chemical vapour deposition has been reported. The two-step anodization process results in a double-layer porous ...
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The epitaxial growth of a high-quality silicon layer on double-layer porous silicon by ultra-high vacuum/chemical vapour deposition has been reported. The two-step anodization process results in a double-layer porous silicon structure with a different porosity. This double-layer porous silicon structure and an extended low-temperature annealing in a vacuum system was found to be helpful in subsequent silicon epitaxial growth. X-ray diffraction,cross-sectional transmission electron microscopy and spreading resistance testing were used in this work to study the properties of epitaxial silicon layers grown on the double-layer porous silicon. The results show that the epitaxial silicon layer is of good crystallinity and the same orientation with the silicon substrate and the porous silicon layer.
The equality of the 2ndlaw of thermodynamics had been regarded as the sufficient and necessary condition for a system being in equilibrium for about 150 years. However, such a classical or traditional basic concept sh...
In this paper, a new architecture of configurable analog unit based on switch capacitor technology is presented. The architecture consists of four parts of input expansion, SC building block, self-calibrating OpAmp an...
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In this paper, a new architecture of configurable analog unit based on switch capacitor technology is presented. The architecture consists of four parts of input expansion, SC building block, self-calibrating OpAmp and clock control. The architecture not only achieves linear analog application such as integrator, gain amplifier, filter, etc., but also can be expediently configured to implementing some nonlinear analog applications. A programming mechanism using two programmable selector for parameter selector and function selector are illustrated for the architecture. The architecture is propitious to utilize configuration and technology mapping. As nonlinear analog application, a voltage control oscillator is implemented. Simulation result with HSPICE shows that for 0.6μ CMOS process, the relative error of voltage-frequency is less than 0.2%.
BST thin film is thought as the best candidate to substitute for SiO2thin film in high density DRAM application due to its high dielectric constant and low leakage current property. In this paper, (BaxSr1-x)TiO3(x=0-1...
The current-voltage (I-V) characteristics of nickel mono-silicide/n-Si Schottky diodes fabricated at different temperature and measured over a temperature range of 78 to 299 K have been interpreted on the basis of the...
The solid phase silicidations for the bilayers of Ni/Pt and Pt/Ni sputtered on Si[100] substrates were studied. The effect of Pt addition in the NiSi film on its thermal stability enhancement was investigated. The res...
The equality of the 2nd law of thermodynamics had been regarded as the sufficient and necessary condition for a system being in equilibrium for about 150 years. However,such a classical or tradi
ISBN:
(纸本)0780365208
The equality of the 2nd law of thermodynamics had been regarded as the sufficient and necessary condition for a system being in equilibrium for about 150 years. However,such a classical or tradi
A novel single-crystalline Si/poly-CoSi/sub 2//SiO/sub 2//Sub-Si structure has been successfully formed by silicon wafer bonding and hydrogen implantation induced layer cutting techniques. The hydrogen implanted silic...
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ISBN:
(纸本)0780365208
A novel single-crystalline Si/poly-CoSi/sub 2//SiO/sub 2//Sub-Si structure has been successfully formed by silicon wafer bonding and hydrogen implantation induced layer cutting techniques. The hydrogen implanted silicon wafer were deposited by a thin Co and Si films subsequently and was brought into contact with an. During the oxidized silicon wafer at room temperature. During the subsequent annealing, the hydrogen-implanted wafer was split along the projected range, leaving a thin Si film and the above deposited films on the oxidized wafer to form a multi-layer structure. The following annealing procedure not only increases the bond strength, but also employs solid state reaction of the deposited Co to form a buried poly-crystalline CoSi/sub 2/ layer with a resistivity of about 160 /spl mu//spl Omega//spl middot/cm.
In this paper, a new architecture of configurable analog unit based on switch capacitor technology is presented. The architecture consists of four parts of input expansion, SC building block, self-calibrating OpAmp an...
详细信息
In this paper, a new architecture of configurable analog unit based on switch capacitor technology is presented. The architecture consists of four parts of input expansion, SC building block, self-calibrating OpAmp and clock control. The architecture not only achieves linear analog application such as integrator, gain amplifier, filter, etc., but also can be expediently configured to implementing some nonlinear analog applications. A programming mechanism using two programmable selector for parameter selector and function selector are illustrated for the architecture. The architecture is propitious to utilize configuration and technology mapping. As nonlinear analog application, a voltage control oscillator is implemented. Simulation result with HSPICE shows that for 0.6 /spl mu/ CMOS process, the relative error of voltage-frequency is less than 0.2%.
Driven by the demands of increasing GHz frequency applications, it is a very important target to decrease the delay of VLSI interconnection according to the theory deduction and simulation. The e-shape interconnection...
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Driven by the demands of increasing GHz frequency applications, it is a very important target to decrease the delay of VLSI interconnection according to the theory deduction and simulation. The e-shape interconnection model has been proved to have less delay than the equal-width fine model based on Elmore delay. Considering the difficulties of duducing the theory of the RCL model of e-line, we use an effective way to deal with the RCL model in deducing the transmission mechanism of e-line interconnection by referring to methods used in microwave transmission fine theory and inspired by the technology process. A more applicable RCL e-line model is presented.
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