Hydrogenated microcrystalline silicon （μc-Si：H） intrinsic films and solar cells are prepared by plasma enhanced chemical vapor deposition （PECVD） with various hydrogen dilution ratios. The influence of hydrogen ...
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Hydrogenated microcrystalline silicon （μc-Si：H） intrinsic films and solar cells are prepared by plasma enhanced chemical vapor deposition （PECVD） with various hydrogen dilution ratios. The influence of hydrogen dilution ratios on electrical characteristics is investigated to study the phase transition from amorphous to microcrystalline silicon. During the deposition process,the optical emission spectroscopy （OES） from plasma is recorded and compared with the Raman spectra of the films,by which the microstructure evolution of different 1-12 dilution ratios and its influence on the performance of μc-Si： H n-i-p solar cells is investigated.
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma enhanced chemical vapor deposition （VHF-PECVD） at different silane concentrations in a P chamber. Through analysis of the...
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A series of microcrystalline silicon thin films were fabricated by very high frequency plasma enhanced chemical vapor deposition （VHF-PECVD） at different silane concentrations in a P chamber. Through analysis of the structural and electrical properties of these materials,we conclude that the photosensitivity slightly decreased then increased as the silane concentration increased,while the crystalline volume fraction indicates the opposite change. Results of XRD indicate that thin films have a （220） preferable orientation under certain conditions. Microcrystalline silicon solar cells with conversion efficiency 4. 7% and micromorph tandem solar cells 8.5% were fabricated by VHF-PECVD （p layer and i layer of microcrystalline silicon solar cells were deposited in P chamber）, respectively.
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