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检索条件"机构=R&D and Technology Development"
1036 条 记 录,以下是811-820 订阅
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Mechanical properties of rubber composites with stacked-cup carbon nanotubes
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Carbon 2010年 第2期48卷 571-571页
作者: Mikiko Hashimoto Tetsuya Isshiki Masanori Tomita Takashi Yanagisawa Kazuo Kaneda Hidetaka Takahashi Fujio Okino Faculty of Textile Science and Technology Shinshu University 3-15-1 Tokida Ueda 386-8567 Japan GSI Creos Corporation Nano Bio Development Center (NBDC) 1-12 Minami-Watarida Kawasaki-ku Kawasaki 210-0855 Japan Fujikura Rubber Ltd. R&D Division 1-840 Mihashi Omiya-ku Saitama 330-0856 Japan
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Statistical and scaling behavior of structural relaxation effects in phase-change memory (PCM) devices
Statistical and scaling behavior of structural relaxation ef...
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Annual International Symposium on reliability Physics
作者: Mattia Boniardi daniele Ielmini Simone Lavizzari Andrea L. Lacaita Andrea redaelli Agostino Pirovano Dipartimento di Elettronica e Informazione Politecnico di Milano and IUNET Milan Italy R&D-Technology Development Numonyx Milan Italy
The phase-change memory (PCM) technology represents one of the most attractive concepts for next generation data storage. PCM behavior is mainly limited by the structural relaxation (Sr) and by the crystallization of ... 详细信息
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Granular electron injection and random telegraph noise impact on the programming accuracy of NOr Flash memories
Granular electron injection and random telegraph noise impac...
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Annual International Symposium on reliability Physics
作者: Christian Monzio Compagnoni Luca Chiavarone Marcello Calabrese riccardo Gusmeroli Michele Ghidotti Andrea L. Lacaita Alessandro. S. Spinelli Angelo Visconti Dipartimento di Elettronica e Informazione Politecnico di Milano and IUNET Milan Italy Technology Development R&D Numonyx Milan Italy IFN-CNR Milan Italy
This work investigates for the first time charge-granularity effects during channel hot-electron programming of NOr flash memories, comparing the granular electron injection and the random telegraph noise limitations ... 详细信息
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Comparison of double patterning technologies in NANd flash memory with sub-30nm node
Comparison of double patterning technologies in NAND flash m...
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European Conference on Solid-State device research (ESSdErC)
作者: Byungjoon Hwang Jeehoon Han Myeong-Cheol Kim Sunggon Jung Namsu Lim Sowi Jin Yongsik Yim donghwa Kwak Jaekwan Park Jungdal Choi Kinam Kim Flash Core Technology Lab. Semiconductor R&D Center Samsung Electronics Co. Ltd. Yongin-City Kyungki-Do Korea Process Development Team Semiconductor R&D Center Samsung Electronics Co. Ltd. Yongin-City Kyungki-Do Korea
Fine patterning technologies - e-beam lithography, SPT (spacer patterning technology) and SadPT (self aligned double patterning technology)-have been introduced to develop a single unit of nano-scale MOSFET. However, ... 详细信息
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An estimation method of rotational direction and speed for free running AC machines without speed and voltage sensor
An estimation method of rotational direction and speed for f...
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International Conference on Electrical Machines and Systems (ICEMS)
作者: Hideaki Iura Zhe Chen Kozo Ide Tsuyoshi Hanamoto Inverter Development Department Drive Division Yaskawa Electric Corporation Japan Corporate R&D Center Yaskawa Electric Corporation Japan Graduate school of Life Science & Systems Engineering Kyushu Institute of Technology Japan
This paper presents an estimation method of rotational direction and speed for free running AC machines driven by an inverter without speed and voltage sensor. The method has four estimation modes, and the method util... 详细信息
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Vertical cell array using TCAT(Terabit Cell Array Transistor) technology for ultra high density NANd flash memory
Vertical cell array using TCAT(Terabit Cell Array Transistor...
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Symposium on VLSI technology
作者: Jaehoon Jang Han-Soo Kim Wonseok Cho Hoosung Cho Jinho Kim Sun Il Shim Younggoan Jae-Hun Jeong Byoung-Keun Son dong Woo Kim Kihyun Jae-Joo Shim Jin Soo Lim Kyoung-Hoon Kim Su Youn Yi Ju-Young Lim dewill Chung Hui-Chang Moon Sungmin Hwang Jong-Wook Lee Yong-Hoon Son U-In Chung Won-Seong Lee Samsung Electronics Co. Ltd Giheung-Gu Yongin-City Gyeonggi-Do Korea Memory Research and Development Center Memory Division Samsung Electronics Company Limited Yongin si Gyeonggi South Korea Advanced Technology Development Team 2&Process Development Team Memory R&D Center
Vertical NANd flash memory cell array by TCAT (terabit cell array transistor) technology is proposed. damascened metal gate SONOS type cell in the vertical NANd flash string is realized by a unique dasiagate replaceme... 详细信息
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Ion-irradiation-induced selective bond rearrangements in amorphous GeTe thin films
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Physical review B 2009年 第24期80卷 245205-245205页
作者: r. de Bastiani E. Carria S. Gibilisco M. G. Grimaldi A. r. Pennisi A. Gotti A. Pirovano r. Bez E. rimini Dipartimento di Fisica ed Astronomia Università di Catania and MATIS CNR-INFM 64 via S. Sofia I-95123 Catania Italy Numonyx R&D Technology Development Via Olivetti 2 Agrate Brianza 20041 Milan Italy Dipartimento di Fisica ed Astronomia Università di Catania and CNR-IMM 64 via S. Sofia I-95123 Catania Italy
The change in the local order of amorphous sputter deposited GeTe thin films irradiated with Ge+ ion and its influence on the subsequent thermal induced crystallization has been investigated by means of micro-raman sp... 详细信息
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An assessment of the CO 2 storage potential of the Indian subcontinent
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Energy Procedia 2009年 第1期1卷 2607-2613页
作者: S. Holloway A. Garg M. Kapshe A. deshpande A.S. Pracha S.r. Khan M.A. Mahmood T.N. Singh K.L. Kirk J. Gale British Geological Survey Keyworth Nottingham NG12 5GG UK Indian Institute of Management Ahmedabad Maulana Azad National Institute of Technology Bhopal India Sustainable Development and Policy Institute Islamabad Pakistan Private Consultant Center for Eco-Friendly Mining Alternatives Dhanbad Jharkhand India IEA GHG R&D Programme Orchard Business Centre Stoke Orchard Cheltenham Glos GL52 7RZ UK
Current annual CO 2 emissions from large industrial point sources in India, Pakistan, Bangladesh and Sri Lanka are estimated to be 721, 45, 17 and 3 million tonnes (Mt) CO 2 respectively. rapid growth in annual CO 2 e... 详细信息
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dissolution of Co,Mn and Zn from zinc plant residue in H2O2-H2SO4-H2O medium
Dissolution of Co,Mn and Zn from zinc plant residue in H2O2-...
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第五届国际湿法冶金学术会议(5th International Conference on Hydrometallurgy)
作者: A.r.Eivazi Hollagh N.Heidari E.Keshavarz Alamdari d.darvishi d.Moradkhani Department of Mining Metallurgical and Petroleum Engineering Amirkabir University of Technology Tehran Iran Materials and Energy Research Center P.O.Box 14155-4777 Tehran Iran R&D Center Iranian Zinc Mines Development Company Zanjan Iran R&D Center Iranian Zinc Mines Development Company Zanjan Iran Department of Metallurgy and Materials Engineering University of TehranP.O.Box 11155-4563 Tehran Iran Materials and Energy Research Center P.O.Box 14155-4777 Tehran Iran Materials and Energy Research Center P.O.Box 14155-4777 Tehran Iran Faculty of Engineering Zanjan University Zanjan Iran
Studies have been carried out to determine maximum recovery of Co, Mn and Zn from zinc plant residue in H2O2-H2SO4-H2O *** per oxide is used as a reductive *** leaching parameters such as sulphuric acid concentration,... 详细信息
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A multilevel PWM strategy suitable for high-voltage motor direct drive systems with consideration of the adverse effect of dead time
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ELECTrICAL ENGINEErING IN JAPAN 2008年 第2期165卷 77-88页
作者: Tadano, Yugo Urushibata, Shota Ogura, Kazuya Shigaki, Akira Nomura, Masakatsu Central Research Laboratory R&D Center Meidensha Corporation Japan Meidensha Technology Development Department Japan Meidensha System Device Factory Design Department Japan
recently, high-voltage motor direct drive systems have been put to practical use, and various multilevel PWM strategies have also been proposed. This paper describes a multilevel PWM strategy [our group calls it the C... 详细信息
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